Preparation method of large-scale array graphene nanoelectromechanical resonator based on femtosecond laser
A femtosecond laser, nano-electromechanical technology, applied in the process of producing decorative surface effects, manufacturing microstructure devices, decorative arts, etc., can solve the problem of reducing the resonant frequency and quality factor of nano-electromechanical resonators, and graphene secondary pollution to reduce secondary pollution, improve resonance frequency and quality factor, and reduce production costs
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[0017] see figure 1 and figure 2 , the present invention first SiO 2 The surface of / Si substrate 1 is patterned by conventional reactive ion etching (RIE) to form a patterned substrate, and then large-area graphene 5 is transferred to the surface of the patterned substrate, and finally processed by femtosecond laser micromachining technology Etching large-scale arrays of graphene nanoelectromechanical resonators. The specific implementation steps are as follows:
[0018] 1. Thermally grow 300nm thick SiO on the surface of n-type Si substrate 2 insulating layer, forming SiO 2 / Si substrate 1 . Wherein, the resistivity of the n-type Si substrate is 1~10Ωcm.
[0019] 2. In SiO 2 5nm-thick TiW alloy and 100nm-thick Au are sputtered on the surface of Si substrate 1; photolithography is carried out with No. 1 mask plate, and after development, TiW / Au is corroded in a metal corrosion solution to form the TiW / Au connection of the array 2 and an array of Au electrode sheets 3...
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