Preparation method of reaction titanium aluminum zirconium niobium nitride nitrogen-gradient hard reaction film

A titanium-aluminum nitride, nitrogen gradient technology, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problem that the hardness and adhesion are difficult to meet at the same time, affect the use effect and service life, and affect the hardness Thermal shock performance of membranes, etc., to achieve good stability and repeatability, strong thermal shock resistance, and high thermal shock resistance.

Inactive Publication Date: 2015-02-04
SHENYANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] For the single-layer titanium-based multi-component hard reaction film, there are mainly the following disadvantages: 1. Generally, the contradiction between the hardness of the film layer and the adhesion of the film layer is easy to appear, that

Method used

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Examples

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Comparison scheme
Effect test

Embodiment 1

[0015] Preparation of titanium nitride aluminum zirconium niobium nitrogen gradient hard reaction film on commercial high-speed steel (W18Cr4V), the method is:

[0016] 1. Deposition technology and determination of target material composition: Multi-arc ion plating is determined as the preparation technology for titanium nitride aluminum zirconium niobium nitrogen gradient decorative film layer, and two arc sources with different orientations and arranged at 90 degrees are selected to start arc deposition at the same time. One of the arc sources is a commercial titanium-niobium alloy target with a purity of 99.9%, and the atomic ratio of the titanium-niobium alloy target is Ti:Nb=75:25; the other arc source is a commercial titanium-aluminum-zirconium alloy target with a purity of 99.9%. The atomic ratio of the alloy target is Ti:Al:Zr=71:18:11.

[0017] 2. Selection and pre-treatment of workpieces: commercial high-speed steel (W18Cr4V) is selected as the workpiece material, an...

Embodiment 2

[0024] Preparation of titanium nitride aluminum zirconium niobium nitrogen gradient hard reaction film on commercial high-speed steel (W6Mo5Cr4V2), the method is:

[0025] 1. Deposition technology and determination of target material composition: determine multi-arc ion plating as the preparation technology for titanium nitride aluminum zirconium niobium nitrogen gradient hard reaction film, select two arc sources with different orientations and arranged at 90 degrees to start arc deposition at the same time , one of the arc sources is a commercial titanium niobium alloy target with a purity of 99.9%, and the atomic ratio of the titanium niobium alloy target is Ti:Nb=75:25; the other arc source is a commercial titanium aluminum alloy target with a purity of 99.9%, titanium aluminum zirconium The atomic ratio of the alloy target is Ti:Al:Zr=71:18:11.

[0026] 2. Selection and pre-treatment of the workpiece: select commercial high-speed steel (W6Mo5Cr4V2) as the workpiece materi...

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Abstract

The invention relates to a preparation method of a reaction titanium aluminum zirconium niobium nitride nitrogen-gradient hard reaction film, which sequentially comprises the following steps: 1. determination of deposition technique and target components; 2. workpiece selection and pretreatment; 3. determination of pre-bombarding technique; 4. determination of deposition technique; 5. vacuum heating treatment; and 6. workpiece revolution. The method lowers the coating cost, reduces the internal stress of the film on the premise of ensuring the high adhesive force, high hardness and high thermal shock resistance of the film, and has favorable stability and repeatability.

Description

technical field [0001] The invention relates to a method for preparing a nitrogen gradient hard reaction film, especially a method for preparing a multi-arc ion nitrogen-plating gradient hard reaction film by using different alloy targets, such as titanium aluminum zirconium niobium nitride (TiAlZrNb)N nitrogen gradient A method for preparing a hard reactive film. Background technique [0002] Multi-arc ion plating is a vacuum physical deposition technology with multiple cathode arc evaporation sources that can be evaporated simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is suitable for the preparation of hard films and hard reactive gradient films, and has been successfully applied in the preparation of titanium nitride, titanium aluminum nitride, titanium aluminum zirconium nitride and more hard reactive films. Titanium-aluminum-zirconium nitride, titanium-niobium ...

Claims

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Application Information

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IPC IPC(8): C23C14/46C23C14/58C23C14/02C23C14/06
Inventor 张钧张健张业民何贵民孙洋
Owner SHENYANG UNIV
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