Super capacitor based on three-dimensional ZnO@MnO2 composite nano array interdigital electrode and manufacturing method thereof
A technology of supercapacitors and interdigitated electrodes, which is applied in the field of energy storage, can solve the problems that it is difficult to adapt to the development requirements of high-power and high-energy flexible transparent supercapacitors, it is difficult to apply solid-state electronic devices, and the capacitors are low, so as to meet the requirements of high-power , meet the charging and discharging needs, long life effect
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[0044] Example 1
[0045] Preparation of ZnOMnO 2 Composite nano array interdigital electrode
[0046] 1. Substrate selection: PET is selected as the substrate and treated with an oxygen plasma surface treatment machine for 2 minutes.
[0047] 2. Interdigital electrode design: Using semiconductor device micromachining technology, the interdigital electrode pattern is processed on the PET substrate. The design of the interdigital electrode pattern used as a UV lithography mask is as follows figure 1 Shown. It can be seen from the figure that the number of pairs of interdigital electrodes prepared is 8 pairs, and the distance between the interdigital electrodes and the finger width are 100 microns. The operating conditions of the photolithography process are: the photoresist model used in UV lithography is AZ4620, the thickness of the uniform glue is 3 microns, the uniform glue speed is 2000 revolutions per minute, the pre-baking temperature is 105 degrees, the exposure time is 25s, ...
Example Embodiment
[0052] Example 2
[0053] Fabrication of flexible and transparent solid 3D supercapacitors
[0054] Lithium chloride and PVA were dissolved in an appropriate amount of deionized water at a mass ratio of 2:1, and stirred in a water bath at 85°C for 1 hour to obtain a solid electrolyte. Spread the solid electrolyte evenly on the prepared interdigital capacitor and encapsulate it with PMMA to obtain a flexible transparent solid super capacitor, such as Figure 4 As shown, it can be seen from the figure that the solid-state supercapacitor has a length of about 5 cm, high transparency, bendable, and good flexibility. The cyclic voltammetry curve of the prepared flexible transparent solid supercapacitor is as Figure 5 As shown, it can be seen from the figure that at different scanning speeds, the CV curve has a nearly rectangular structure, which is a typical amorphous MnO 2 Capacitance characteristics, the area capacitance of the device can reach 167mF / cm at a scanning speed of 2mV / s -...
Example Embodiment
[0055] Example 3
[0056] Preparation of ZnOMnO 2 Composite nano array interdigital electrode
[0057] 1. Substrate selection: PDMS is selected as the substrate and treated with an oxygen plasma surface treatment machine for 2 minutes.
[0058] 2. Interdigital electrode design: Using semiconductor device micromachining technology, the interdigital electrode pattern is processed on the PDMS substrate. The pitch and finger width of the interdigital electrodes used as the UV lithography mask are 2 microns. The operating conditions of the photolithography process are: the photoresist model used in UV lithography is AZ4620, the thickness of the gel is 4 microns, the speed of the gel is 1000 rpm, the pre-baking temperature is 80 degrees, the exposure time is 15s, and the development time For 65s, the interdigital electrode pattern was prepared on the PDMS substrate.
[0059] 3. Preparation of collector electrode and ZnO seed layer: Using magnetron sputtering, a 60nm Pt film and a 10nm ZnO...
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