Surface texturing processing method of monocrystalline silicon solar cell

Abstract

The invention discloses a surface texturing processing method of a monocrystalline silicon solar cell. The processing method comprises the following steps: cleaning oil stains and finger prints on a surface of a monocrystalline silicon wafer by ultrasonic; surface texturing, which comprises putting the ultrasonic cleaned monocrystalline silicon wafer into a texturing tank which contains a sodium hydroxide solution having a mass volume percentage of 2%, performing surface corrosion texturing processing; and adding TS4 as a texturing catalyst into the sodium hydroxide solution to increase a silicon surface corrosion speed and uniformity of surface corrosion; removing an oxide from the surface of the monocrystalline silicon wafer, and cleaning the monocrystalline silicon wafer by using a hydrofluoric acid solution (a concentration of 49%) with a volume percentage of 16%; removing metal ions, and cleaning the monocrystalline silicon wafer by using a hydrochloric acid solution (a concentration of 37%) with a volume percentage of 28%; and drying the final monocrystalline silicon wafer with a pyramid-shaped surface. According to the invention, a surface texturing speed of the monocrystalline silicon wafer is increased; uniformity of surface texturing of the monocrystalline silicon wafer is improved; and then monocrystalline silicon solar cell prepared by the method is higher in photoelectric conversion efficiency of the solar cell and good in stability. The surface texturing processing method is a better choice for application of photovoltaic power generation.

Description

technical field [0001] The invention relates to the technical field of monocrystalline silicon solar cell manufacturing, in particular to a method for texturizing the surface of a monocrystalline silicon solar cell. Background technique [0002] The preparation of the suede surface of monocrystalline silicon wafers for solar cells is to use the anisotropic etching of silicon to form millions of tetrahedral pyramids, that is, pyramid structures, on the surface of silicon per square centimeter. Due to the multiple reflections of incident light on the surface And refraction, increase the absorption of light, improve the short-circuit current and conversion efficiency of the battery. [0003] The anisotropic etching solution of silicon usually uses a hot alkaline solution. The available alkalis include sodium hydroxide, potassium hydroxide, lithium hydroxide and ethylenediamine, etc. Most of them use cheap sodium hydroxide with a concentration of about 1%. Solution to prepare ...

AI Technical Summary

Problems solved by technology

[0004] The above-mentioned preparation method of monocrystalline silicon wafers is used to make the suede surface of monocrystalline silicon wafers, and when it is finally used in solar power generation, there will be a large differ