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Electric conduction slurry and application of electric conduction slurry in N type silicon wafer solar cells

A technology for solar cells and conductive pastes, applied in conductive materials, circuits, photovoltaic power generation and other directions dispersed in non-conductive inorganic materials, can solve the problem of increasing the doping concentration of N-type silicon wafers, reducing photoelectric conversion efficiency, and reducing contact resistance. and other problems, to achieve the effect of reducing the recombination rate, increasing the open circuit voltage and short circuit current, and reducing the contact resistance

Inactive Publication Date: 2015-07-22
DK ELECTRONICS MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, if the surface doping concentration of the entire emitter is too high, the recombination of minority carriers in the emitter will increase, and the photoelectric conversion efficiency will decrease.
Therefore, the effect of reducing the contact resistance cannot be achieved by simply increasing the doping concentration on the surface of the N-type silicon wafer.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] This embodiment provides a kind of conductive paste, composition by weight percentage is:

[0051] components weight percentage silver powder 78.0% Second metal powder: aluminum powder 2.5% Dopant: boron powder 0.8% Glass powder: Bi 2 o 3 -B 2 o 3 -ZnO-SiO 2 -Al 2 o 3 -BaO system 9.5% Organic carrier: ethyl cellulose + terpineol 8.7% Additives: Viscosity modifiers 0.5%

[0052] Among them, the particle diameter of the spherical silver powder is 1-2 μm, the particle diameter of the second metal powder aluminum powder is 3-4 μm, the particle diameter of the dopant boron powder is less than 1 μm, and the glass powder is Bi 2 o 3 -B 2 o 3 -ZnO-SiO 2 -Al 2 o 3 - lead-free glass powder of BaO system, and the particle diameter of the lead-free glass powder is 2-6 μm.

[0053] Preparation process: weigh the above-mentioned components of the conductive paste in proportion. Disperse lead-free glass powder, sil...

Embodiment 2

[0055] This embodiment provides a kind of conductive paste, composition by weight percentage is:

[0056] components weight percentage silver powder 80.2% Second metal powder: 20% gold powder + 80% aluminum powder 1.5% Dopant: GaN powder 0.8% Glass powder: PbO-B 2 o 3 -SiO 2 -Al 2 o 3 system 8.0% Organic carrier: ethyl cellulose + terpineol 9.0% Additives: Viscosity modifiers 0.5%

[0057] Among them, the particle diameter of the spherical silver powder is 1-2 μm, the second metal powder is a mixture of gold powder and aluminum powder, the particle diameter is 3-4 μm, the dopant is gallium nitride powder, and the glass powder is PbO-B 2 o 3 -SiO 2 -Al 2 o 3 The lead-containing glass powder of the system has a particle diameter of 2-6 μm.

[0058] Preparation process: weigh the above-mentioned components of the conductive paste in proportion. Disperse lead-containing glass powder, silver powder and additives into ...

Embodiment 3

[0060] This embodiment provides a kind of conductive paste, composition by weight percentage is:

[0061] components weight percentage silver powder 84.0% Second metal powder: aluminum powder 2.0% Dopant: silicon boride powder 0.6% Glass powder: PbO-B 2 o 3 -SiO 2 -Al 2 o 3 system 4.0% Organic Vehicle: Methylcellulose + Turpentine 8.9% Additives: Viscosity modifiers 0.5%

[0062] Among them, the particle diameter of spherical silver powder is 1-2 μm, the second metal powder is aluminum powder, the particle diameter is 3-4 μm, the dopant is silicon boride powder with particle diameter less than 1 μm, and the glass powder is PbO-B 2 o 3 -SiO 2 -Al 2 o 3 The lead-containing glass powder of the system has a particle diameter of 2-6 μm.

[0063] Preparation process: weigh the above-mentioned components of the conductive paste in proportion. Disperse lead-containing glass powder, silver powder and additives into an org...

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Abstract

The invention discloses electric conduction slurry and application of the electric conduction slurry in N type silicon wafer solar cells. The electric conduction slurry is composed of, by weight, 65% to 94% of silver powder, 0.1% to 20% of second metal powder, 0.1% to 10% of doping agents, 0.6% to 12% of glass powder, 0.1% to 4% of additives and 4% to 20% of organic carriers, wherein the sum of the weight percents of all the components of the electric conduction slurry is 100%, and the eutectic point temperature of the second metal powder and silicon is smaller than the sintering temperature peak value of silicon wafers. P type transmitters of the N type silicon wafer solar cells are prepared through the electric conduction slurry, and then the N type silicon wafer solar cells are formed. The electric conduction slurry can make contact with the silicon wafers in a self-doping mode, and therefore the contact resistance is lowered, the filling factor is increased, the composition speed of minority carriers on the lower surface of the electric conduction slurry is decreased, the open-circuit voltage and the short-circuit current of the cells are improved, and therefore the conversion efficiency of the N type silicon wafer solar cells is improved.

Description

technical field [0001] The invention relates to the technical field of conductive paste and solar cells, in particular to a conductive paste and its application in N-type silicon wafer solar cells. Background technique [0002] A solar cell is a semiconductor device that converts the sun's light energy directly into electrical energy. Because it is a green product, does not cause environmental pollution, and uses renewable resources, solar cells have broad prospects for development in today's energy shortage situation. [0003] There are various types of solar cells, among which, N-type solar cells have attracted more and more attention from people in the industry because of their high conversion efficiency. The "boron-oxygen pair" of the P-type silicon substrate will cause the problem of efficiency attenuation, but the use of the N-type silicon substrate does not have this problem. Generally, the minority carrier lifetime of N-type silicon is longer, generally above 100 μ...

Claims

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Application Information

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IPC IPC(8): H01B1/22H01L31/0224H01L31/18H01L31/068
CPCY02E10/547Y02P70/50
Inventor 史卫利朱亮
Owner DK ELECTRONICS MATERIALS INC
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