Preparation method for plasma excimer enhanced quantum dot optical film
A plasma and quantum dot film technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, semiconductor devices, etc., can solve difficult problems such as difficult to meet, achieve precise and controllable thickness, increase light field intensity, and improve overall luminous performance Effect
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[0034] The invention provides a method for preparing a plasmon-enhanced quantum dot optical film, which is realized according to the following steps:
[0035]S1: Using ITO glass as the substrate, the metal quantum dot film layer is prepared by spin-coating film forming process, and the metal quantum dot film layer is used as the plasmonic enhancement layer;
[0036] S2: preparing an organic insulating spacer layer on the ITO glass sample covered with the metal quantum dot film layer;
[0037] S3: Prepare a CdSe quantum dot film layer on the ITO glass sample covered with the metal quantum dot film layer and the organic insulating spacer layer, and compound the CdSe quantum dot film layer and the organic insulating spacer layer The film layer is used as a photoluminescent layer;
[0038] S4: preparing the plasmon-enhanced quantum dot optical film by organic spin-coating and encapsulation processes.
[0039] In this embodiment, the step S1 also includes the following steps:
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Embodiment 1
[0064](1) Weigh 0.0207g of cadmium oxide powder, 0.112g of 1-tetradecylphosphoric acid and 2.0g of tri-n-butylphosphine oxide into a 50ml three-necked flask, first evacuate with argon for 30min, and then under argon protection Heat to 240°C until the solute is completely dissolved to form a transparent solution to prepare a cadmium precursor solution; then mix the cadmium precursor solution reactor and treat it under vacuum at 100°C for 0.5 hours, then adjust the reactor temperature to 250°C.
[0065] (2) Weigh 0.0316g of selenium powder and 1.0g of tributylphosphine into another 50ml three-necked flask, and then heat to 100°C under the protection of argon until the solute is completely dissolved to form a transparent solution to prepare the selenium precursor solution.
[0066] (3) Rapidly inject the selenium precursor solution into the cadmium precursor solution, then lower the temperature of the mixed solution to 220 °C, and keep it at this temperature for 1 min; then remove...
Embodiment 2
[0073] (1) Weigh 0.0825g of cadmium oxide powder, 0.336g of 1-tetradecylphosphoric acid and 1.5g of tri-n-butylphosphine oxide into a 50ml three-necked flask, first evacuate with argon for 80min, and then under argon protection Heat to 310°C until the solute is completely dissolved to form a transparent solution to prepare a cadmium precursor solution; then mix the cadmium precursor solution reactor and treat it under vacuum at 120°C for 2.4 hours, then adjust the reactor temperature to 315°C.
[0074] (2) Weigh 0.0948g of selenium powder and 2.5g of tributylphosphine into another 50ml three-necked flask, and then heat to 160°C under the protection of argon until the solute is completely dissolved to form a transparent solution to prepare the selenium precursor solution.
[0075] (3) Rapidly inject the selenium precursor solution into the cadmium precursor solution, then lower the temperature of the mixed solution to 250 °C, and keep it at this temperature for 15 minutes; then ...
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