Reactive self-delustering waterborne polyurethane resin, and preparation method and application thereof

A water-based polyurethane and matting technology, which is applied in the field of reactive self-dulling water-based polyurethane resin and its preparation, can solve the problems of easy volatilization of organic matter, resistance to rubbing, bending and decreased friction resistance, and differences in coating gloss. The production process is simple, the gloss of the body is low, and the effect of the paint film coating is uniform

Inactive Publication Date: 2015-10-14
NANXIONG MATERIAL PRODION BASE OF CHINESE ACADEMY OF SCI GUANGZHOU CHEM +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this way of adding a matting agent can achieve the purpose of matting, its disadvantages are also obvious: the cost of using a large amount of matting agent is high; the composition coagulates resulting in a multi-seed appearance; the coating is more brittle and easy to break and fall off ; Precipitation of matting agent leads to uneven mixing before application, resulting in differences in gloss throughout the coating; Reduced resistance to rubbing, flexing and rubbing
In order to avoid some defects caused by externally added matting agent, Chinese patent CN104193946A discloses a preparation method of self-dulling polyurethane resin, which includes the use of light-absorbing acrylic grafted substances for sealing, a large amount of acetone for viscosity reduction, and the use of Distillation treatment, acetone is difficult to remove, easy to have residue
CN103626930A describes a method for preparing a

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] (1) 20 g (20 mmol) of PTMG with a molecular weight of 1000 and 1 g (7.5 mmol) of DMPA were vacuum dehydrated at 120° C. in a reaction kettle. After the vacuum was stopped, the temperature was lowered to 60° C., a small amount of dibutyltin dilaurate catalyst and 11 g IPDI (50 mmol) were added, the temperature was raised to 80° C., and the reaction was carried out for 3 hours.

[0047] (2) Cool down to 50° C., add 0.7 g (7 mmol) triethylamine to the product of step (1) for neutralization reaction for 30 min.

[0048] (3) Continue to lower the temperature to below 30°C, dissolve 0.5g (2.6mmol) of 2-(2-aminoethyl) sodium taurine in an aqueous solution (the amount of water used for dilution accounts for the total amount of water in the reaction self-extinction type water-based polyurethane resin) 80% of the water demand) into the reactor for emulsification and chain extension for 10 minutes.

[0049] (4) Add an aqueous solution containing 0.6 g of hydrazine hydrate to perfor...

Embodiment 2

[0052] (1) 20 g (20 mmol) of PTMG with a molecular weight of 1000 and 1.5 g (11 mmol) of DMPA were vacuum dehydrated at 105° C. in a reaction kettle. After the vacuum was stopped, the temperature was lowered to 60°C, a small amount of dibutyltin dilaurate catalyst and 6.67g IPDI (30mmol) were added, the temperature was raised to 85°C, and the reaction was carried out for 3h.

[0053] (2) Cool down to 50° C., add 1.5 g (10 mmol) TEA to the product of step (1) for neutralization reaction for 30 min.

[0054] (3) Continue to lower the temperature to below 30°C, dissolve 0.5g (2.6mmol) of 2-(2-aminoethyl) sodium taurine in an aqueous solution (the amount of water used for dilution accounts for the total amount of water in the reaction self-extinction type water-based polyurethane resin) 80% of the water demand) into the reactor for emulsification and chain extension for 10 minutes.

[0055] (4) Add an aqueous solution containing 0.7 g of ethylenediamine to perform secondary chain...

Embodiment 3

[0058] (1) 10g (10mmol) PTMG (molecular weight 1000), 20g (10mmol) PTMG (molecular weight 2000), 1.2g (9mmol) DMPA were dehydrated under vacuum at 120°C in a reactor. After the vacuum was stopped, the temperature was lowered to 60°C, a small amount of organic bismuth catalyst was added, 6g (27mmol) IPDI and 4g (24mmol) HDI were added, the temperature was raised to 80°C, and the reaction was carried out for 4h.

[0059] (2) Cool down to 50° C., add 1.2 g (8.4 mmol) tripropylamine to the product of step (1) for neutralization reaction for 30 min.

[0060] (3) Continue to cool down to below 30°C, dissolve 0.76g (4mmol) 2-(2-aminoethyl) sodium taurine aqueous solution (the amount of water used for dilution accounts for the total amount of water required in the entire reaction from the extinction type water-based polyurethane resin) 90% of the amount of water) into the reactor for emulsification and chain extension for 10 minutes.

[0061] (4) Add an aqueous solution containing 0....

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Abstract

The invention discloses a reactive self-delustering waterborne polyurethane resin, and a preparation method and application thereof. The reactive self-delustering waterborne polyurethane resin has luster of no more than 20 at 60 DEG C when in a dry state and is prepared through reaction among the following components: 1, at least one aliphatic diisocyanate; 2, at least one carboxylic acid type hydrophilic dihydric alcohol; 3, at least one polymerized dihydric alcohol containing a water-dispersable group; 4, a catalyst used for synthesis of waterborne polyurethane; 5, at least one neutralizer; 6, at least one sulfonic acid type hydrophilic chain extender containing active hydrogen; and 7, at least one small molecule compound containing active hydrogen. The reactive self-delustering waterborne polyurethane resin has solid content of 25 to 40% and an average particle size of 500 to 5000 nm; no delustering agent is needed, and controllable generation of particles in certain particle size distribution can be realized in the process of synthesis; and the particles shrink after drying and dehydration of a film, which leads to increase of microscopic surface roughness and reduction in glossiness.

Description

technical field [0001] The invention relates to a novel self-delustering coating and a preparation method thereof, in particular to a reaction self-delustering water-based polyurethane resin and a preparation method and application thereof. Background technique [0002] Matting resin generally refers to the resin with obvious atomization and low gloss (matte) on the surface after film formation, which is mainly used in coating. Existing matting resins are mainly obtained by reacting self-matting and externally adding matting agents. Gloss is related to the ability of a surface to reflect more light in some directions than others. High-gloss surfaces reflect most of the light that hits them, while low-gloss surfaces reflect very little of the light that hits them, mostly internal refraction, absorption. The directions associated with mirror reflections generally have the highest reflectivity, and measurements by this test method correlate with visual observations of surface...

Claims

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Application Information

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IPC IPC(8): C08G18/12C08G18/48C08G18/34C08G18/75C08G18/73C08G18/66C08G18/42C09D175/08C09D175/06
CPCC08G18/12C08G18/348C08G18/4018C08G18/4277C08G18/4808C08G18/4854C08G18/6692C08G18/73C08G18/755C09D175/06C09D175/08C08G18/3857C08G18/3231C08G18/3228C08G18/3206
Inventor 庞浩雍奇文廖兵黄健恒王璐黄利平
Owner NANXIONG MATERIAL PRODION BASE OF CHINESE ACADEMY OF SCI GUANGZHOU CHEM
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