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Preparation method of zinc oxide evaporation target with skeleton network structure

A network structure, zinc oxide technology, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problems of inability to achieve cracking, insufficient bonding strength, etc.

Active Publication Date: 2017-06-23
广州市尤特新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, by simply reducing the density of the vapor deposition material, although part of the thermal stress can be released and the possibility of cracking of ceramics when bombarded by high-energy electron beams can be reduced, the requirement of completely avoiding cracking cannot be met due to insufficient bonding strength.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Calcinate 100g of zinc hydroxide powder at 1000°C for 12 hours to obtain ZnO powder with a particle size of about 2 μm, add ZnO nano powder with a total mass of 2%, mix evenly, and then add PVA (polyvinyl alcohol) viscous with a concentration of 2wt%. Add agent, stir again to mix well. The powder was dry-pressed at 20MPa into a cylinder with a diameter of 27mm and a height of 12mm. Debinding at 400°C, and then sintering at 1400°C for 4 hours to obtain bulk ZnO evaporation materials. After being bombarded with an electron beam (high voltage 8kV, beam current 50mA), the bulk material remains intact without cracking and microcracks exist. In this example, zinc-gallium hydroxide, zinc-aluminum hydroxide, zinc-titanium hydroxide or zinc-indium hydroxide can be used as micron-sized powders to obtain similar effects.

Embodiment 2

[0027] Calcinate 100g of zinc hydroxide powder at 1300°C for 12h to obtain ZnO powder with a particle size of about 6μm, add ZnO nano powder with a total mass of 20%, mix evenly, then add PVA adhesive with a concentration of 2wt%, and stir again well mixed. The powder was dry-pressed at 20MPa into a cylinder with a diameter of 27mm and a height of 12mm. Debinding at 600°C, and then sintering at 1400°C to obtain a bulk zinc oxide evaporation material. After being bombarded with an electron beam (high voltage 8kV, beam current 60mA), the bulk material remained intact without cracking or cracking.

Embodiment 3

[0029] Calcinate 100g of zinc hydroxide powder at 1300°C for 12 hours to obtain ZnO powder with a particle size of about 6 μm, and crush the bulk zinc oxide evaporation material obtained in Example 1 and sieve it through a 40-mesh sieve, and take the broken particles under the sieve, accounting for 1% of the total mass of the ZnO powder, mix evenly and then add a PVA adhesive with a concentration of 2wt%, and stir and mix evenly again. The powder was dry-pressed at 20MPa into a cylinder with a diameter of 27mm and a height of 12mm. Debinding at 600°C, and then sintering at 1350°C to obtain a bulk zinc oxide evaporation material. After being bombarded with an electron beam (high voltage 8kV, beam current 60mA), the bulk material remained intact without cracking or cracking. In this example, zinc-gallium hydroxide, zinc-aluminum hydroxide, zinc-titanium hydroxide or zinc-indium hydroxide can be used as micron-sized powders to obtain similar effects.

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Abstract

The invention discloses a method for preparing a zinc oxide evaporation target material with a skeleton network structure: firing at high temperature to obtain a micron-sized powder, adding one or more of nano-sized powder, crushed particles, and hydroxide slurry The mixture is mixed, and then the adhesive is added to press and molded, and the evaporation target is obtained after high-temperature sintering. The invention realizes structural strengthening of low-density evaporation materials by constructing a structure with a three-dimensional skeleton network, and the prepared zinc oxide evaporation material has high strength and good thermal shock resistance, and completely solves the problem of cracking when bombarded by high-energy electron beams question.

Description

technical field [0001] The invention relates to the field of photoelectric thin film functional materials, in particular to a method for preparing a zinc oxide evaporation target material with a skeleton network structure. Background technique [0002] The types of transparent conductive films mainly include metal films, oxide films, multilayer composite films and polymer films, among which oxide transparent conductive films occupy a dominant position. Oxide systems suitable for transparent conductive films include In 2 o 3 , ZnO, SnO 2 , CdO, etc., the most studied and most common is Sn-doped In 2 o 3 (ITO), and Al, Ga, In doped ZnO (AZO, GZO, IZO). The preparation of transparent conductive oxide thin films includes physical methods such as molecular beam epitaxy, pulsed laser deposition, magnetron sputtering, electron beam evaporation, reactive plasma deposition (RPD), etc. In the process of preparing oxide thin films by physical methods, corresponding The oxide mate...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C23C14/08C04B35/453C04B35/622
Inventor 许积文周贤界王华杨玲徐华蕊朱归胜
Owner 广州市尤特新材料有限公司
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