Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Preparation method of nanometer nickel protoxide-nickel-silicon alloy lithium ion battery negative electrode material

A lithium-ion battery, nickel-silicon alloy technology, applied in the direction of battery electrodes, nanotechnology, nanotechnology, etc., can solve the problems of lithium battery capacity attenuation, large volume change, etc., to achieve increased storage capacity, low resistivity, and low cost Effect

Inactive Publication Date: 2015-11-11
QIQIHAR UNIVERSITY
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the course of the research, it was found that a large volume change (>30%) occurred when the lithium was intercalated and extracted in the lithium-ion battery based on it, resulting in a rapid decline in the capacity of the lithium battery.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of nanometer nickel protoxide-nickel-silicon alloy lithium ion battery negative electrode material
  • Preparation method of nanometer nickel protoxide-nickel-silicon alloy lithium ion battery negative electrode material
  • Preparation method of nanometer nickel protoxide-nickel-silicon alloy lithium ion battery negative electrode material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] 1. Preparation of silicon microchannel substrate:

[0031] The preparation process of the electrochemical etching microchannel based on the MEMS process compatible with the traditional integrated circuit process has been elaborated in the patent application 200610025900. This program improves heavily doped low resistivity p-type silicon wafers, after standard cleaning process, dry oxidation at 1100 ℃ for 10 minutes, wet oxidation for 15 minutes, to generate 2000? SiO 2 Buffer layer; electrochemical etching temperature -20°C, light-assisted hole induction into LED lamps (blue light, 5W, 3 pieces), programmable power supply precisely controls the etching current density at 100mAcm -2 . The microchannel wells are square, with a side length of about 5 microns, a wall thickness of about 1 micron, and a depth of about 150 microns. The etching depth and width can be controlled by etching time, etchant, and temperature.

[0032] 2. Preparation of NiO / Si microchannel plate: ...

Embodiment 2

[0046] 1. Preparation of silicon microchannels:

[0047] The preparation process of the electrochemical etching microchannel based on the MEMS process has been described in detail in the patent application 200610025900.7. The microchannel wells are square, with a side length of about 5 microns, a wall thickness of about 1 micron, and a depth of about 150 microns. Its etching depth and width can be controlled by etching time, etchant and temperature.

[0048] 2. Preparation of NiO / Si microchannel plate:

[0049] Firstly, the silicon microchannel plate is cut into rectangular pieces with a size of about 1cm×1cm, and secondly, an electroplating solution is prepared, which is composed of sodium acetate, nickel sulfate, and sodium sulfate. Nickel sulfate is used as a source of nickel ions, sodium acetate is used as a complexing agent, and sodium sulfate is used as a buffer solvent. The plating solution was allowed to stand at room temperature. During the electroplating process,...

Embodiment 3

[0053] 1. Preparation of silicon microchannels:

[0054] The preparation process of the electrochemical etching microchannel based on the MEMS process has been described in detail in the patent application 200610025900.7. The microchannel hole is a square with a side length of about 5 microns, a wall thickness of about 1 micron, and a depth of about 150 microns. The etching depth and width can be controlled by etching time, etchant, and temperature.

[0055] 2. Preparation of NiO / Si microchannel plate

[0056] Firstly, the silicon microchannel plate is cut into rectangular pieces with a size of about 1cm×1cm, and secondly, an electroplating solution is prepared, which is composed of sodium acetate, nickel sulfate, and sodium sulfate. Nickel sulfate is used as a source of nickel ions, sodium acetate is used as a complexing agent, and sodium sulfate is used as a buffer solvent. The plating solution was allowed to stand at room temperature. During electroplating, the pH of the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method of a nanometer nickel protoxide-nickel-silicon alloy lithium ion battery negative electrode material and belongs to the technical field of preparing lithium ion battery electrode material. The feature of the lithium battery negative electrode material is that the lithium battery negative electrode material has a highly-ordered micro-nano silicon micro-channel substrate, and an excellent conductive NiSi layer electric charge collecting layer, and a NiO nanometer active layer has large specific surface area and an electrode orderly porous channel is suitable for an electrolyte solution to immerge. The preparation method of the battery cathode material is highly compatible with a traditional integrated circuit manufacturing process, and mainly comprises three main processes of etching to form the highly-ordered micro-nano silicon micro-channel substrate by using a photoinduced low temperature electrochemical pulse voltage wet method, depositing metallic nickel via an electroless plating process and rapid thermal annealing and oxidizing. The highly-ordered three-dimensional micro-nano porous NiO / Si-MCP (nickel protoxide / silicon microchannel) negative electrode material has excellent physical and electrochemical support for immerging the electrolyte, transporting charges and embedding and de-embedding lithium ions, and could be used for preparing the integratable lithium ion battery electrode material.

Description

technical field [0001] The invention relates to a method for preparing a negative electrode material of a nano-nickel oxide-nickel-silicon alloy lithium ion battery, belonging to the technical field of lithium ion battery electrode material preparation. Background technique [0002] With the continuous expansion of the application range of lithium-ion batteries, especially the popularization of Internet of Things technology, more mobile terminals, embedded devices and portable devices require high-performance and miniaturized lithium-ion batteries. In particular, it is compatible with traditional integrated circuit technology, and the on-chip micro-integrable lithium-ion battery manufactured jointly with integrated circuits is a technical challenge, has greater application requirements, and is of great significance to the research and development of equipment miniaturization and intelligence. [0003] A large number of scientific studies have shown that the development of ne...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01M4/36H01M4/52H01M4/38H01M10/0525B82Y30/00
CPCB82Y30/00H01M4/366H01M4/38H01M4/386H01M4/52H01M10/0525Y02E60/10
Inventor 苗凤娟陶佰睿苗瑞李倩倩高玉峰张嘉张冬冬
Owner QIQIHAR UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com