Environmentally-friendly monocrystalline silicon wafer texturing liquor and preparation method thereof
A monocrystalline silicon wafer, green and environmentally friendly technology, applied in the direction of chemical instruments and methods, crystal growth, post-processing details, etc., can solve the problems of easy volatilization of IPA, adverse effects on the environment, and harm to the human body, so as to improve product quality and effectively Good for environmental protection and easy to degrade
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0015] Non-limiting examples of the present invention are as follows:
[0016] A kind of green environment-friendly monocrystalline silicon wafer texturizing liquid, is prepared from the following component raw materials of weight (kg):
[0017] Sodium hydroxide 0.5, xylitol 3, sodium lactate 2, gum arabic 0.3, sodium lauryl amphoacetate 0.5, caprylic / capric triglyceride 0.1, castor oil polyoxyethylene ether 0.1, additive 3, water 80;
[0018] Among them, the auxiliary agent is made of the following raw materials by weight (kg): saponin 10, nano-titanium dioxide 0.1, ammonium persulfate 0.1, vinyl acetate 1, sodium bicarbonate 0.2, dodecyl glucoside 1, water 100; The preparation method of the agent is to grind the saponins into powder, add the obtained saponins powder, sodium bicarbonate and lauryl glucoside into water at 80°C and 200r / min and stir for 4h, filter after cooling, and add acetic acid to the filtrate Vinyl ester and nano-titanium dioxide were dispersed ultrasonic...
PUM
Property | Measurement | Unit |
---|---|---|
size | aaaaa | aaaaa |
reflectance | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com