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A kind of carbon fluoride film and its preparation method and use

A technology of carbon fluoride and carbon fluoride, which is applied in the direction of gaseous chemical plating, semiconductor/solid-state device manufacturing, coating, etc., can solve the problems of slow preparation speed, long cycle, poor physical and chemical properties of the film, and achieve the preparation cycle Short, easy-to-operate, low-cost effects

Active Publication Date: 2018-07-27
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, these methods have complex preparation processes, slow preparation speeds, long cycles, and poor physical and chemical properties of the films, which greatly affect the practical application of the films.

Method used

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  • A kind of carbon fluoride film and its preparation method and use
  • A kind of carbon fluoride film and its preparation method and use
  • A kind of carbon fluoride film and its preparation method and use

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] Prepare a carbon fluoride film on the surface of n-Si, the preparation method is as follows:

[0051] (1) Apply thermal oil on the back of n-Si to make the substrate fully contact with the tray;

[0052] (2) Send the substrate into the ICP high-density plasma etching system with a background vacuum of 10 -5 Pa, into the working gas CHF 3 , CHF 3 The flow rate is 60sccm, the processing temperature is 0°C, the working pressure is 0.4Pa, the ICP power of the upper electrode is 200W, the RF power of the lower electrode is 10W, and the processing time is 160s;

[0053] (3) The treated substrate was ultrasonically cleaned in isopropanol for 5 min, and cleaned with N 2 Blow dry to obtain a 50nm thick carbon fluoride film on the n-Si surface.

[0054] Energy spectrum analysis was carried out on the treated substrate surface, and the results were as follows: figure 2 shown, from figure 2 It can be seen that the number ratio of fluorine and carbon atoms in the material ob...

Embodiment 2

[0057] Prepare carbon fluoride film on the surface of the glass (Glass / AR) coated with anti-reflection film, the preparation method is the same as embodiment 1, the difference is:

[0058] The substrate described in step (1) is glass (Glass / AR) coated with an anti-reflection film, and the material of the outermost layer of the anti-reflection film is MgF 2 ;

[0059] In step (2), the working air pressure is 0.8Pa, and the processing time is 250s.

[0060] Figure 4 is the comparison of water contact angles before and after F-based treatment on the Glass / AR surface, determined by Figure 4 It can be seen that the F-based treatment can change the contact angle of the Glass / AR surface from 44° (such as Figure 4 a) Increased to 108° (such as Figure 4 b), it can be seen that the contact angle of the Glass / AR surface treated with F group is greater than 90°, achieving a hydrophobic effect.

Embodiment 3

[0062] Prepare carbon fluoride film on the glass (Glass / HR) surface that is coated with metal high reflection film, preparation method is the same as embodiment 1, and difference is:

[0063] The substrate used in the step (1) is glass (Glass / HR) coated with a highly reflective metal film, and the metal film is an aluminum film;

[0064] In step (2), the working air pressure is 0.8Pa, and the processing time is 250s.

[0065] Figure 5 It is a comparison diagram of the water contact angle after F-based treatment on the surface of Glass / HR. It can be seen from the figure that the F-based treatment can increase the water contact angle of the Glass / HR surface to 110.4°, which is greater than 90°, achieving a hydrophobic effect .

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Abstract

The invention provides a carbon fluoride film (CFx) and its preparation method and application. The preparation method of the carbon fluoride film (CFx) is: placing an inert substrate in an ICP etching system, and the molecular formula contains The gas of fluorine atoms and carbon atoms is used as the working gas to perform fluorine-based treatment on the surface of the substrate, that is, a carbon fluoride film is obtained on the surface of the substrate. The preparation method of the carbon fluoride film provided by the present invention can form a carbon fluoride passivation film on the surface of various substrates, so that the substrate can achieve a hydrophobic effect, and can combine optical properties such as transparency and high reflection with waterproof, anti-fog and Self-cleaning and other functions are effectively combined, and its preparation cycle is short, and the whole process is carried out in a high vacuum state, with less pollution, low cost, easy operation and large-scale production. Significance.

Description

technical field [0001] The invention belongs to the technical field of surface physics and chemistry, and relates to a carbon fluoride membrane and its preparation method and application, in particular to a preparation method of a hydrophobic surface. Background technique [0002] Optical properties and self-cleaning are two important characteristics of materials, which have important application value in waterproof, anti-fogging, self-cleaning and special optical properties (transparency, anti-reflection). Nowadays, optical materials are developing in the direction of anti-reflection (increased reflection), self-cleaning, anti-fogging, and high hardness. The preparation of self-cleaning films with satisfactory optical properties and durability is currently the research focus and hotspot in related fields at home and abroad, such as the preparation of self-cleaning mirrors, solar cell surfaces, and window glass. [0003] In recent years, there have been a few reports on the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/30C23C16/02H01L21/314H01L31/0216
Inventor 闫兰琴褚卫国徐丽华张先锋
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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