Novel cleaning fluid special for diode semiconductor

Abstract

The invention relates to novel cleaning fluid special for a diode semiconductor. The novel cleaning fluid comprises the following components in parts by weight: 2-4 parts of quaternary ammonium hydroxide, 4-14 parts of a polyacrylic anticorrosive solution, 6-8 parts of an alkyl diol aryl ether, 2-6 parts of a surfactant, 9-11 parts of alkyl benzyl dimethyl ammonium chloride, 9-11 parts of a synergist, 9-11 parts of ethanol and 37-57 parts of deionized water. The novel cleaning fluid disclosed by the invention has the advantages that the amount of various effective components and solvents is reasonably configured in the novel cleaning fluid special for the diode semiconductor disclosed by the invention, and the surface tension of the cleaning fluid can be rapidly and completely reduced at room temperature, so that the cleaning fluid has the characteristics of high water solubility and high seepage force; and moreover, each selected formula component does not pollute the environment and does not have any risk, the atmosphere is not damaged, the cleaned waste solution is convenient to treat and emit, and the environment friendliness is guaranteed.

Description

technical field [0001] The invention belongs to the technical field of the semiconductor industry, and in particular relates to a novel special cleaning liquid for diode semiconductors. Background technique [0002] Diodes are the basis for the development of the modern microelectronics industry. As early as the last century, the diode manufacturing process has been very mature and widely used in various fields of the electronics industry. In industries with low profit and low technical content, in order to ensure a certain profit, a large number of substances harmful to human body are used as cleaning liquids for cleaning the surface of diodes in the diode industry. How to develop low-cost, pollution-free products while ensuring the effect? A new type of cleaning fluid has become an urgent requirement. [0003] So far, among various cleaning methods, chemical cleaning is mostly used, that is, using chemical cleaning agents to clean electronic components, especially diodes,...

AI Technical Summary

Problems solved by technology

[0004] Alkyl glycol aryl ether 5-8%, surfactant 3-5%, alkyl benzyl dimethyl ammonium chloride 8-10%, synergist 8-10%, ethanol 8-10%, remove The remaining amount of ionized water; reasonable allocation of the effective components and the amount of solvent can quickly and thoroughly reduce the surface tension of the cleaning solution itself at room temperature, so that the cleaning solution has the characteristics of good water solubility, strong penetration, and no pollution environment; but it cannot effectively reduce the corrosion of wafers and substrates, which in turn will affect the quality of products