Preparation method of molybdenum-niobium alloy sputtering target

Abstract

The invention discloses a preparation method of a molybdenum-niobium alloy sputtering target. The method comprises the following steps: (1) molybdenum powder and niobium powder are put in a mixing tank of a mixing machine for uniformly mixing to obtain mixed powder; (2) the cold isostatic pressing is performed for the mixed powder to obtain a slab; and the slab is pre-sintered under the vacuum or hydrogen atmosphere protection condition to obtain a molybdenum-niobium alloy prefabricated blank; (3) the surface of the molybdenum-niobium alloy prefabricated blank is turned and milled; and the hot isostatic pressing is performed to obtain a molybdenum-niobium alloy part; and (4) the mechanical processing and the surface grinding are performed for the molybdenum-niobium alloy part to obtain the molybdenum-niobium alloy sputtering target. The preparation method is simple in process, and saves raw materials; the introduction of impurity elements can be reduced in the preparation process; the prepared molybdenum-niobium alloy sputtering target is uniform in components, free of segregation and fine in grains; the theoretic density can reach above 99%; the oxygen mass content is lower than 500 ppm; and the requirements of the sputtering target can be preferably satisfied.

Description

technical field [0001] The invention belongs to the technical field of alloy target preparation, and in particular relates to a method for preparing a molybdenum-niobium alloy sputtering target. Background technique [0002] With the rapid development of the information age, the speed of information dissemination is getting higher and higher. As the main carriers of information dissemination, touch screens and display screens have strong market demand, and people have higher and higher requirements for them. Most of the important wiring film materials in the touch screen are formed by target sputtering. After molybdenum metal is used as a sputtering film material, its specific resistance and film stress are only 1 / 2 of that of chromium, but there are problems in corrosion resistance (discoloration) and adhesion (film peeling). Therefore, adding metals such as tungsten, vanadium, niobium, and tantalum to molybdenum can balance the specific impedance, stress, and corrosion re...

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Problems solved by technology

In the sintering process of molybdenum-niobium targets, the requirements for the particle size of raw materials are very high, and the sintering process is strict. This method can quickly realize densified forming and sintering, but the sintering density is low, the oxygen content is high, and impurity elements are difficult to control; A hot isostatic pressing method, which does not have high requirements on the particle size of the raw material powder. This method needs to prepare an outer casing according to the size of the compact, put the compact (cold isostatic pressing or oil pressure) into the casing, and pump After vacuum welding and sealing, put it into a hot isostatic press, and press and sinter it under the combined action of high-pressure gas and high temperature. This method can obtain a dense and uniform structure, but the operation is more complicated, and cold isostatic pressing is required. Or hydraulic pressing, green compact trimming, green compact packing into a metal sheath, vacuuming, welding and sealing, hot isostatic pressing, sheath removal, machining and other processes, and the green compact is put into a sheath before storage, In the process of processing and handling, it is easy to break, and it is difficult to remove the sheath after hot isostatic pressing. The waste of materials in the process of processing is serious and the cost is high.

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