Preparation method of molybdenum-niobium alloy sputtering target

A molybdenum-niobium alloy and sputtering target technology, which is applied in sputtering coating, metal material coating process, ion implantation plating, etc., can solve the problems of complex operation, low sintering density, easy breakage, etc., and reduce impurities The introduction of elements, the preparation process is simple, and the effect of fine grains

Active Publication Date: 2016-03-30
JINDUICHENG MOLYBDENUM CO LTD
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the sintering process of molybdenum-niobium targets, the requirements for the particle size of raw materials are very high, and the sintering process is strict. This method can quickly realize densified forming and sintering, but the sintering density is low, the oxygen content is high, and impurity elements are difficult to control; A hot isostatic pressing method, which does not have high requirements on the particle size of the raw material powder. This method needs to prepare an outer casing according to the size of the compact, put the compact (cold isostatic pressing or oil pressure) into the casing, and pump After vacuum welding and sealing, put it into a hot isostatic press, a

Method used

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  • Preparation method of molybdenum-niobium alloy sputtering target

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Example Embodiment

[0025] Example 1

[0026] This embodiment includes the following steps:

[0027] Step 1. Place the molybdenum powder and niobium powder in the mixing tank of the drum mixer, seal the mixing tank and evacuate until the vacuum degree in the tank is 10 -1 Pa, then stir and mix the molybdenum powder and niobium powder uniformly under the protection of argon to obtain a mixed powder; the mass ratio of the molybdenum powder to the niobium powder is 19:1, and the rotating speed of the drum mixer is preferably 120r / min, the mixing time is preferably 6h; the mass purity of the molybdenum powder is not less than 99.9%, the mass content of potassium in the molybdenum powder is 11ppm, the mass content of iron is 19ppm, and the mass content of carbon is 18ppm, the mass content of oxygen is 460ppm; the average Fischer particle size of the molybdenum powder is 3.2μm, the average Fischer particle size of the niobium powder is 7.0μm; the mass purity of the niobium powder is not less than 99.9%, pre...

Example Embodiment

[0032] Example 2

[0033] This embodiment includes the following steps:

[0034] Step 1. Place the molybdenum powder and niobium powder in the mixing tank of the drum mixer, seal the mixing tank and evacuate until the vacuum degree in the tank is 10 -2 Pa, then stir and mix the molybdenum powder and niobium powder uniformly under the protection of argon to obtain a mixed powder; the mass ratio of the molybdenum powder and the niobium powder is 9:1, and the rotating speed of the drum mixer is preferably It is 130r / min, the mixing time is preferably 5h; the mass purity of the molybdenum powder is not less than 99.9%, the mass content of potassium in the molybdenum powder is 10ppm, the mass content of iron is 18ppm, and the mass content of carbon is 19ppm, the mass content of oxygen is 430ppm; the average Fischer particle size of the molybdenum powder is 4.1 μm, the average Fischer particle size of the niobium powder is 5.8 μm; the mass purity of the niobium powder is not less than 99...

Example Embodiment

[0039] Example 3

[0040] This embodiment includes the following steps:

[0041] Step 1. Place the molybdenum powder and niobium powder in the mixing tank of the drum mixer, seal the mixing tank and evacuate until the vacuum degree in the tank is 10 -1 Pa, then stir and mix the molybdenum powder and niobium powder uniformly under the protection of argon to obtain a mixed powder; the mass ratio of the molybdenum powder to the niobium powder is 15:1, and the rotating speed of the drum mixer is preferably 150r / min, the mixing time is preferably 4h; the mass purity of the molybdenum powder is not less than 99.9%, the mass content of potassium in the molybdenum powder is 10ppm, the mass content of iron is 19ppm, and the mass content of carbon is 16ppm, the mass content of oxygen is 380ppm; the average Fischer particle size of the molybdenum powder is 4.6μm, the average Fischer particle size of the niobium powder is 6.2μm; the mass purity of the niobium powder is not less than 99.9%, pre...

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Abstract

The invention discloses a preparation method of a molybdenum-niobium alloy sputtering target. The method comprises the following steps: (1) molybdenum powder and niobium powder are put in a mixing tank of a mixing machine for uniformly mixing to obtain mixed powder; (2) the cold isostatic pressing is performed for the mixed powder to obtain a slab; and the slab is pre-sintered under the vacuum or hydrogen atmosphere protection condition to obtain a molybdenum-niobium alloy prefabricated blank; (3) the surface of the molybdenum-niobium alloy prefabricated blank is turned and milled; and the hot isostatic pressing is performed to obtain a molybdenum-niobium alloy part; and (4) the mechanical processing and the surface grinding are performed for the molybdenum-niobium alloy part to obtain the molybdenum-niobium alloy sputtering target. The preparation method is simple in process, and saves raw materials; the introduction of impurity elements can be reduced in the preparation process; the prepared molybdenum-niobium alloy sputtering target is uniform in components, free of segregation and fine in grains; the theoretic density can reach above 99%; the oxygen mass content is lower than 500 ppm; and the requirements of the sputtering target can be preferably satisfied.

Description

technical field [0001] The invention belongs to the technical field of alloy target preparation, and in particular relates to a method for preparing a molybdenum-niobium alloy sputtering target. Background technique [0002] With the rapid development of the information age, the speed of information dissemination is getting higher and higher. As the main carriers of information dissemination, touch screens and display screens have strong market demand, and people have higher and higher requirements for them. Most of the important wiring film materials in the touch screen are formed by target sputtering. After molybdenum metal is used as a sputtering film material, its specific resistance and film stress are only 1 / 2 of that of chromium, but there are problems in corrosion resistance (discoloration) and adhesion (film peeling). Therefore, adding metals such as tungsten, vanadium, niobium, and tantalum to molybdenum can balance the specific impedance, stress, and corrosion re...

Claims

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Application Information

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IPC IPC(8): C23C14/34B22F3/16
CPCB22F3/162C23C14/3414
Inventor 党晓明安耿李晶席莎赵虎刘仁智
Owner JINDUICHENG MOLYBDENUM CO LTD
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