Organic inorganic hybrid perovskite film and manufacturing method of perovskite solar cell
A perovskite and inorganic technology, applied in the field of solar cells, can solve the problems of complex preparation process, rough film surface, and many film grain boundaries, and achieve the effects of simple reaction device, less harmful gas emission, and smooth film surface.
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[0034] The invention adopts sublimation-assisted in-situ gas-solid phase reaction method to prepare hybrid perovskite film, and the chemical formula of the perovskite film is ABX 3 . where A is a cation of an organic amine, including but not limited to CH 3 NH 3 + ,NH 2 -CH=NH 2 + , C 4 h 9 NH 3 + Wait. B=Pb 2+ ,Sn 2+ , Ge 2+ ,Co 2+ , Fe2+ , Mn 2+ , Cu 2+ , and Ni 2+ at least one of the That is, the B site may be one of these ions, or may be a mixed structure of any two or more of these ions. In one example, ABX 3 ASn 1-x Pb x x 3 (0- , Br - , I - at least one of the That is, X may be a single halogen or a mixed halogen such as a mixture of any two halogens. For example, the perovskite film includes but is not limited to lead iodide methylamine, lead iodide formamidine, and the like. Specifically, as an example, its preparation method may include the following steps.
[0035] 1) Spin coating the halide solution of B on the substrate to obtain the ha...
Embodiment 1
[0068](1) Clean the substrate. Use acetone, alkaline detergent, deionized water, and acetone to ultrasonically clean for ten minutes, and finally blow dry with high-pressure gas;
[0069] (2) Preparation of lead iodide film. Absorb 1mol / L lead iodide (PbI 2 ) of N,N-dimethylformamide (DMF) solution was added dropwise on the substrate in step (1), so that the solution covered the entire surface of the substrate, and the spin coating speed was 6500 rpm for 5 s. Then bake on a hot plate at 90°C for 4 minutes;
[0070] (3) Preparation of organic-inorganic hybrid perovskite CH 3 NH 3 PB 3 film. Put a certain amount of CH at the bottom of the vacuum oven 3 NH 3 I powder; PbI after drying in step (2) 2 The thin film is placed on the support so that the PbI 2 Thin film facing CH 3 NH 3 I powder, the distance between the two is 15 mm, and CH is grown at 90 °C and 0.5 kPa 3 NH 3 PB 3 Film, holding time is 1.5 hours.
Embodiment 2
[0072] (1) Clean the transparent conductive substrate. Use alkaline detergent, deionized water, acetone, and ethanol to ultrasonically clean the FTO for ten minutes, then dry;
[0073] (2) Preparation of a hole blocking layer. The precursor solution solvent is ethanol, which includes the following components: tetraisopropyl titanate (0.3mol / L), acetylacetone (0.45mol / L), hydrochloric acid (0.09mol / L), water (1.8mol / L). Take the precursor solution and add it dropwise on the FTO in step (1), so that the solution covers the entire surface of the FTO, spin coating at a speed of 3000 rpm for 20 s. Then sinter at 510°C for 30min in a muffle furnace;
[0074] (3) Preparation of organic-inorganic hybrid perovskite CH 3 NH 3 PB 3 absorbent layer. Spin-coat 578 mg / mL of PbI on the sample sintered in step (2) 2 The dimethylimide solution, the rotation speed is 6500rpm, and the time is 5s. After drying at 90°C for 5 minutes, the PbI 2 The thin film sample is placed at the bottom ...
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