Analysis method for B impurity elements in electronic wet chemicals

A technology of impurity elements and analysis methods, applied in the field of chemical analysis and testing, can solve the problems of large phase difference, large test error, and reduction of blank background, etc., and achieve the effect of wide linear range, low detection limit, and good linear relationship

Inactive Publication Date: 2016-05-25
ZHEJIANG KAISN FLUOROCHEM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since B impurity elements widely exist in nature, including dust particles in the air, when ICP-MS is used for detection, the general detection background has about 10 μg / L of B impurities, resulting in large test errors. By adjusting the test The method of instrument parameters makes it very difficult to reduce the blank background
The above reasons are the main reasons for the large difference between the test value and the actual value of B impurity elements in electronic wet chemicals detected by ICP-MS.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Experimental Materials:

[0015] Main instruments and working parameters:

[0016] (Agilent 7700) inductively coupled plasma atomic emission spectrometer, power 1.5kW, carrier gas flow rate 0.75L / min, compensation gas flow rate 0.41L / min, sampling depth 8mm.

[0017] Ultrapure water device (model: millipore, brand: merk).

[0018] Electronic balance (model: ms204s, brand: Mettler).

[0019] Main reagents:

[0020] High-purity nitric acid (manufacturer: BASF, specification: metal ion <10ppt).

[0021] Standard stock solution: The standard stock solution of element B is 10 mg / L, purchased from Sinopharm Chemical Reagent Co., Ltd.

[0022] High-purity hydrofluoric acid sample to be tested: produced by Zhejiang Kaisheng Fluorine Chemical Co., Ltd.

[0023] experiment method:

[0024] 1. Preparation of standard solution

[0025] Standard solution: Dilute the 10mg / L standard stock solution with ultrapure water to prepare a standard solution with a B standard solution c...

Embodiment 2

[0043] Experimental Materials

[0044] Main instruments and working parameters

[0045] (Agilent 7700) inductively coupled plasma atomic emission spectrometer, power 1.5kW, carrier gas flow rate 0.75L / min, compensation gas flow rate 0.41L / min, sampling depth 8mm.

[0046] Ultrapure water device (model: millipore, brand: merk).

[0047] Electronic balance (ms204s, Mettler).

[0048] main reagent

[0049] High-purity hydrofluoric acid (manufacturer: BASF specification: metal ion <10ppt).

[0050] Standard stock solution: The standard stock solution of element B is 10 mg / L, purchased from Sinopharm Chemical Reagent Co., Ltd.

[0051] High-purity sulfuric acid sample to be tested: produced by Zhejiang Kaisheng Fluorine Chemical Co., Ltd.

[0052] experiment method

[0053] 1. Preparation of standard solution

[0054] Standard solution: Dilute the 10mg / L standard stock solution with ultrapure water to prepare a standard solution with a B standard solution concentration of 10...

Embodiment 3

[0072] Experimental Materials

[0073] Main instruments and working parameters

[0074] (Agilent 7700) inductively coupled plasma atomic emission spectrometer, power 1.5kW, carrier gas flow rate 0.75L / min, compensation gas flow rate 0.41L / min, sampling depth 8mm.

[0075] Ultrapure water device (model: millipore, brand: merk).

[0076] Electronic balance (model: ms204s, brand: Mettler).

[0077] main reagent

[0078] High-purity nitric acid (manufacturer: BASF specification: metal ion <10ppt), high-purity hydrofluoric acid (manufacturer: BASF specification: metal ion <10ppt).

[0079] Standard stock solution: The standard stock solution of element B is 10 mg / L, purchased from Sinopharm Chemical Reagent Co., Ltd.

[0080] High-purity hydrochloric acid sample to be tested: produced by Zhejiang Kaisheng Fluorine Chemical Co., Ltd.

[0081] 1. Preparation of standard solution

[0082] Standard solution: Dilute the 10mg / L standard stock solution with ultrapure water to prepar...

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PUM

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Abstract

The invention discloses an analysis method for B impurity elements in electronic wet chemicals. An inductively coupled plasma atomic emission spectrometer is adopted for analysis, the method is characterized in that a sampling system of the inductively coupled plasma atomic emission spectrometer is washed with high-purity inorganic acid for 48-72 h before sampling after startup and then washed with ultrapure water for 6-18 h without midway shutdown. The method can eliminate interference caused by the B elements in a detection background, and is accurate and quick in measurement, high in measurement precision, low in detection limit and wide in linear range.

Description

technical field [0001] The invention relates to the technical field of chemical analysis and testing, in particular to an analysis method for B impurity elements in electronic wet chemicals. Background technique [0002] Electronic wet chemicals are widely used in VLSI manufacturing, mainly for wafer surface cleaning, cleaning and corrosion during chip processing. In addition, electronic wet chemicals are used in glass substrate cleaning, silicon nitride, silicon dioxide etchant, etc. in the liquid crystal display industry; in photovoltaic and LED manufacturing, they are used for silicon wafer surface cleaning, etchant. The purity and cleanliness of electronic wet chemicals have a very important impact on the yield, electrical performance and reliability of integrated circuits. Among them, the impurity elements in electronic chemicals will harm the electrical properties of electronic components. Different types of impurity elements have different hazards to devices and circ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/73
CPCG01N21/73
Inventor 傅明星赵晓亚曹文兵汪靖曾朵清王海
Owner ZHEJIANG KAISN FLUOROCHEM
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