A kind of preparation method of copper-zinc-tin-sulfur film
A copper-zinc-tin-sulfur and thin-film technology, which is applied in the fields of final product manufacturing, sustainable manufacturing/processing, photovoltaic power generation, etc., can solve the problems of evaporation source pollution, low utilization rate of evaporation source materials, poor reproducibility, etc.
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Embodiment 1
[0023] (1) Substrate cleaning: Clean the soda-lime glass sequentially with detergent, acetone, alcohol, deionized water, soak in potassium dichromate solution for 30 minutes, and dry it with nitrogen for later use;
[0024] (2) Put the cleaned soda-lime glass into the sputtering chamber, and vacuum the background to 5.0×10 -4 Pa, direct current sputtering of Mo electrodes with a multilayer structure, the substrate temperature is room temperature, the sputtering power is 200W, and the sputtering pressure is 1.5Pa (20 minutes), 0.3Pa (60 minutes), and 1μm is obtained on the soda lime glass. Thick Mo electrodes. After plating the Mo electrodes, raise the temperature to 220°C and bake for 30 minutes.
[0025] (3) Preparation of copper-zinc-tin-sulfur prefabricated layer: three-target RF sputtering using CuS target with Cu:S=1:1, SnS target with Sn:S=1:1 and ZnS target with Zn:S=1:1 Injection, background vacuum 5.0×10 -4 Pa, sputtering power 50W, substrate temperature at room te...
Embodiment 2
[0029] (1) Substrate cleaning: Clean the soda-lime glass sequentially with detergent, acetone, alcohol, deionized water, soak in potassium dichromate solution for 30 minutes, and dry it with nitrogen for later use;
[0030] (2) Put the cleaned soda-lime glass into the sputtering chamber, and vacuum the background to 5.0×10 -4 Pa, direct current sputtering of Mo electrodes with a multilayer structure, the substrate temperature is room temperature, the sputtering power is 200W, and the sputtering pressure is 1.5Pa (20 minutes), 0.3Pa (60 minutes), and 1μm is obtained on the soda lime glass. Thick Mo electrodes. After plating the Mo electrodes, raise the temperature to 220°C and bake for 30 minutes.
[0031] (3) Preparation of copper-zinc-tin-sulfur prefabricated layer: three-target RF sputtering using CuS target with Cu:S=1:1, SnS target with Sn:S=1:1 and ZnS target with Zn:S=1:1 Injection, background vacuum 5.0×10 -4 Pa, sputtering power 50W, substrate temperature at room te...
Embodiment 3
[0035] (1) Substrate cleaning: Clean the soda-lime glass sequentially with detergent, acetone, alcohol, deionized water, soak in potassium dichromate solution for 30 minutes, and dry it with nitrogen for later use;
[0036] (2) Put the cleaned soda-lime glass into the sputtering chamber, and vacuum the background to 5.0×10 -4Pa, direct current sputtering of Mo electrodes with a multilayer structure, the substrate temperature is room temperature, the sputtering power is 200W, and the sputtering pressure is 1.5Pa (20 minutes), 0.3Pa (60 minutes), and 1μm is obtained on the soda lime glass. Thick Mo electrodes. After plating the Mo electrodes, raise the temperature to 220°C and bake for 30 minutes.
[0037] (3) Preparation of copper-zinc-tin-sulfur prefabricated layer: three-target RF sputtering using CuS target with Cu:S=1:1, SnS target with Sn:S=1:1 and ZnS target with Zn:S=1:1 Injection, background vacuum 5.0×10 -4 Pa, sputtering power 50W, substrate temperature at room tem...
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