Multi-stage magnetic field arc ion plating method for lining positive bias straight pipe

An arc ion plating and positive bias technology, applied in the field of material surface treatment, can solve problems such as large particle defects and low arc plasma transmission efficiency, improve crystal structure and stress state, avoid large particle defects, and improve bonding strength. Effect

Inactive Publication Date: 2016-09-07
魏永强
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-stage magnetic field straight tube magnetic filtering method to eliminate the large particle defects contained in the arc plasma, and at the same time ensure that the arc

Method used

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  • Multi-stage magnetic field arc ion plating method for lining positive bias straight pipe

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Example Embodiment

[0015] Specific embodiment one: the following combination figure 1 This embodiment will be described. The device used in the multi-stage magnetic field arc ion plating method lined with a positive bias straight tube in this embodiment includes a bias power source 1, an arc power source 2, an arc ion plating target source 3, a multi-stage magnetic field device 4, and a multi-stage magnetic field device. Level magnetic field power supply 5, lined positive bias straight tube device 6, positive bias power supply 7, sample stage 8, bias power supply waveform oscilloscope 9 and vacuum chamber 10;

[0016] The method includes the following steps:

[0017] Step 1. Place the workpiece to be processed on the sample stage 8 in the vacuum chamber 10, the workpiece is connected to the output end of the bias power supply 1, and the arc ion plating target source 3 installed on the vacuum chamber 10 is connected to the output end of the arc power supply 2. , The magnetic fields of all levels...

Example Embodiment

[0026] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the method further includes:

[0027] Step 3: The pure metal thin film can be prepared by combining traditional DC magnetron sputtering, pulsed magnetron sputtering, traditional arc ion plating and pulse cathode arc with DC bias, pulse bias or DC pulse compound bias for film deposition , Compound ceramic films with different element ratios, functional films and high-quality films with nano-multilayer or gradient structure.

Example Embodiment

[0028] Embodiment 3: The difference between this embodiment and Embodiment 2 is that steps 1 to 3 are repeatedly performed to prepare multilayer structure films with different stress states, microstructures and element ratios. Others are the same as Embodiment 2.

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Abstract

The invention discloses a multi-stage magnetic field arc ion plating method for a lining positive bias straight pipe, and belongs to the technical field of material surface treatment. The problems that in a multi-stage magnetic field filtering device, pollution to the inner wall of a pipeline due to macroparticles needs to be removed, and losses are caused in the plasma transmitting process need to be solved. The method comprises the steps that firstly, a workpiece to be coated is arranged on a sample table in a vacuum chamber, and a related power source is powered on; and secondly, film deposition is conducted, when the vacuum degree in the vacuum chamber is smaller than 10-4Pa, work gas is guided in, the air pressure is adjusted, a coating power source is started, meanwhile, energy of plasmas is adjusted through a grid bias power supply, the macroparticle defect is further eliminated through a lining positive bias straight pipe device, the transmission efficiency of the arc plasmas is guaranteed through the lining positive bias straight pipe device, needed technology parameters are set, and film deposition is conducted.

Description

technical field [0001] The invention relates to a multi-stage magnetic field arc ion plating method for a lined positive bias straight pipe, belonging to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (Boxman RL, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit time is greate...

Claims

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Application Information

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IPC IPC(8): C23C14/32
CPCC23C14/325
Inventor 魏永强宗晓亚侯军兴刘源刘学申蒋志强符寒光
Owner 魏永强
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