Multi-stage magnetic field arc ion plating method for lining positive bias straight pipe

Abstract

The invention discloses a multi-stage magnetic field arc ion plating method for a lining positive bias straight pipe, and belongs to the technical field of material surface treatment. The problems that in a multi-stage magnetic field filtering device, pollution to the inner wall of a pipeline due to macroparticles needs to be removed, and losses are caused in the plasma transmitting process need to be solved. The method comprises the steps that firstly, a workpiece to be coated is arranged on a sample table in a vacuum chamber, and a related power source is powered on; and secondly, film deposition is conducted, when the vacuum degree in the vacuum chamber is smaller than 10-4Pa, work gas is guided in, the air pressure is adjusted, a coating power source is started, meanwhile, energy of plasmas is adjusted through a grid bias power supply, the macroparticle defect is further eliminated through a lining positive bias straight pipe device, the transmission efficiency of the arc plasmas is guaranteed through the lining positive bias straight pipe device, needed technology parameters are set, and film deposition is conducted.

Description

technical field [0001] The invention relates to a multi-stage magnetic field arc ion plating method for a lined positive bias straight pipe, belonging to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (Boxman RL, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit time is greate...

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Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-stage magnetic field straight tube magnetic filtering method to eliminate the large particle defects contained in the arc plasma, and at the same time ensure that the arc plasma passes through the multi-stage magnetic field filter device with a high transmission efficiency, so that the workpiece surface is negatively biased In the case of continuous and dense preparation of high-quality films, at the same time, it can control the addition of elements in the film, reduce the production cost of using alloy targets, improve the deposition efficiency of the film, and reduce the adverse effects of large particle defects on the growth and performance of the film. Multistage Magnetic Field Arc Ion Plating Method for Straight Tubes Lined with Positive Bias

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