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Construction method of intelligent thin film photodetector capable of identifying detection wavelength

A light detector and thin film technology, applied in the field of light detection, can solve the problems of unknown intensity and inability to distinguish wavelength, etc., and achieve the effect of simple preparation process, low cost and good practical value

Inactive Publication Date: 2016-09-07
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when light detection is performed in a real environment, we do not know the intensity of the detected light, so we cannot distinguish the wavelength of the detected light from the obtained photocurrent
In addition, there is no experiment to show that the response time of the photodetector is related to the wavelength of the detected light.

Method used

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Experimental program
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Effect test

Embodiment Construction

[0015] A method for constructing an intelligent thin-film photodetector capable of identifying detection wavelengths, comprising the following steps:

[0016] (1) Preparation of ZnS / CdS film: first on SiO 2 On the Si substrate, CdS with a thickness of 30 nm was evaporated by electron beam evaporation, and then ZnS with different thicknesses of 30 nm, 60 nm, 90 nm and 120 nm was evaporated on the CdS film;

[0017] (2) Graphene growth and transfer: Graphene is grown on the copper foil by CVD method, and PMMA with a concentration of 80-110 mg / ml is spin-coated on the surface of the copper sheet with graphene, and placed in a heating Bake at 170°C for 5 minutes, then put FeCl with a concentration of 1.0-2.0 mol / L 3 After the copper foil is etched, place the PMMA / graphene film in dilute hydrochloric acid and water to clean the remaining FeCl on the surface. 3 Etching solution, and then SiO coated with CdS / ZnS film 2 Pick up the PMMA / graphene film from the / Si substrate, wait fo...

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PUM

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Abstract

The invention discloses a construction method of an intelligent thin film photodetector capable of identifying the detection wavelength. The method comprises the following steps: (1) firstly, evaporating CdS on an SiO2 / Si substrate and then evaporating ZnS on a CdS thin film; (2) growing graphene on copper foil, coating a copper sheet surface on which the graphene grows with PMMA in a spinning manner, baking the product, putting the product into an FeCl3 solution for etching, after the copper foil is etched, putting a PMMA / graphene thin film into diluted hydrochloric acid and water for cleaning residual FeCl3 etching liquid on the surface respectively, fishing up the PMMA / graphene thin film by an SiO2 / Si substrate coated with the CdS / ZnS thin film, airing the PMMA / graphene thin film and then removing the PMMA by a low-pressure vacuum annealing method; and (3) obtaining a graphene / ZnS / CdS heterojunction thin film on the SiO2 / Si substrate, and depositing 10nm Cr / 100nm of Au by an electron beam vapor deposition method to manufacture an electrode of a device through a mask plate. Semiconductors with different band gaps are compounded, so that ultraviolet light and visible light can be distinguished through a characteristic parameter of response time; and the construction method is simple in process and low in cost and has relatively good practical value.

Description

technical field [0001] The invention belongs to the field of light detection, and in particular relates to a construction method of an intelligent thin-film light detector capable of identifying detection wavelengths. Background technique [0002] Due to their applications in communication, sensing, environmental monitoring, imaging, etc., photodetectors have been extensively studied in recent years. When the photosensitive material is excited by light greater than its band gap energy, hole-electron pairs are generated in the photosensitive material, and the current passing through its external circuit will increase, and this signal can be used as a photodetection. This shows that the wavelength range of light detected by the photosensitive material is determined by its forbidden band width. Therefore, ultraviolet light detectors, visible light detectors, infrared light detectors and other light detectors all need to select photosensitive materials with corresponding band g...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCH01L31/1828Y02P70/50
Inventor 王敏贾飞翔黄帆许智豪蔡曹元吴从军马杨
Owner HEFEI UNIV OF TECH