Construction method of intelligent thin film photodetector capable of identifying detection wavelength
A light detector and thin film technology, applied in the field of light detection, can solve the problems of unknown intensity and inability to distinguish wavelength, etc., and achieve the effect of simple preparation process, low cost and good practical value
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[0015] A method for constructing an intelligent thin-film photodetector capable of identifying detection wavelengths, comprising the following steps:
[0016] (1) Preparation of ZnS / CdS film: first on SiO 2 On the Si substrate, CdS with a thickness of 30 nm was evaporated by electron beam evaporation, and then ZnS with different thicknesses of 30 nm, 60 nm, 90 nm and 120 nm was evaporated on the CdS film;
[0017] (2) Graphene growth and transfer: Graphene is grown on the copper foil by CVD method, and PMMA with a concentration of 80-110 mg / ml is spin-coated on the surface of the copper sheet with graphene, and placed in a heating Bake at 170°C for 5 minutes, then put FeCl with a concentration of 1.0-2.0 mol / L 3 After the copper foil is etched, place the PMMA / graphene film in dilute hydrochloric acid and water to clean the remaining FeCl on the surface. 3 Etching solution, and then SiO coated with CdS / ZnS film 2 Pick up the PMMA / graphene film from the / Si substrate, wait fo...
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