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A silicon-based optical waveguide integrated photodetector for visible and near-infrared bands

A silicon-based optical waveguide and photodetector technology, which is applied in semiconductor devices, circuits, electrical components, etc., can solve the problems of complex structure and process of optical waveguide integrated photodetectors, difficulty in achieving integration and low cost, and achieve The effect of convenient design, simple structure and easy production

Active Publication Date: 2017-08-04
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this monolithic integration is not easy. The difficulty lies in: for the passive input optical waveguide of the sensing unit and photodetector, the optical waveguide buffer layer must be thick enough to prevent silicon substrate leakage loss; In the light absorption region of the photodetector, the optical waveguide buffer layer should be as small as possible, so that the light field can quickly leak to the substrate and be absorbed by the silicon substrate to form a photocurrent
Therefore, if the traditional optical waveguide technology is used, the difference in the thickness of the buffer layer makes the structure and process of the optical waveguide integrated photodetector more complex, and it is difficult to achieve integration and low cost.

Method used

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  • A silicon-based optical waveguide integrated photodetector for visible and near-infrared bands
  • A silicon-based optical waveguide integrated photodetector for visible and near-infrared bands
  • A silicon-based optical waveguide integrated photodetector for visible and near-infrared bands

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Embodiment 1

[0033] In this embodiment, Si3N4 is selected as the material of the strip waveguide 13 and the diffraction grating 23 . The manufacturing process is: using a high-temperature oxidation process to grow a layer of SiO with a thickness of about 3 μm on the silicon substrate. 2 Thin film, the core layer does not need to be doped, so a simple thermal oxidation process can be used, and this process is suitable for mass production, so the cost is very low. Silicon nitride is then formed to a thickness of 0.25 µm. For the passive area, the strip waveguide is fabricated by photolithography and dry etching.

[0034] For the active light absorption region 2 of the photodetector, the strip waveguide is etched into a diffraction grating 23 with a certain period by photolithography and dry etching, and then the upper cladding layer 14, 24 with a thickness of about 1.2 μm is deposited. , and sputtering reflective mirror Au on the upper cladding, with a thickness of 100nm, on both sides of ...

Embodiment 2

[0038] In this embodiment, polymer material SU-8 strip waveguide 13 and diffraction grating 23 are selected. The manufacturing process is: on the silicon substrate, a layer of SiO is grown on the silicon substrate using a high-temperature oxidation process. 2 Thin film, the core layer does not need to be doped, the SU-8 plate is formed by spin-coating process, and the passive input optical waveguide 13 is formed by photolithography process.

[0039] For the active light absorption region 2 of the photodetector, the strip waveguide is etched into a diffraction grating 23 with a certain period by photolithography and dry etching processes, and then the upper cladding layers 14 and 24 with a thickness of about 0.2 μm are deposited. , and sputter gold reflective mirror surface on the upper cladding layer 24, the Au thickness is 100nm, on both sides of the active light absorption region 2 diffraction grating 23, use dry or wet process to remove SiO 2 thin film, and then deposit go...

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Abstract

The invention discloses a visible light and near-infrared band silicon-based optical waveguide-integrated photoelectric detector. A passive input optical waveguide comprises a first silicon substrate, a passive region waveguide lower cladding layer, a core-layer strip waveguide and a passive region waveguide upper cladding layer, wherein the passive region waveguide lower cladding layer, the core-layer strip waveguide and the passive region waveguide upper cladding layer are laminated from top to bottom; the passive region waveguide upper cladding layer coats the core-layer strip waveguide; an active light absorption region comprises a second silicon substrate, a diffraction laminate structure, a metal reflective mirror and metal electrodes; the diffraction laminate structure, the metal reflective mirror and the metal electrodes are laminated from top to bottom; the diffraction laminate structure covers the second silicon substrate; the metal reflective mirror covers the diffraction laminate structure; the metal electrodes cover the second silicon substrate at two sides of the diffraction laminate structure; and the diffraction laminate structure comprises an active region waveguide lower cladding layer, diffraction gratings and an active region waveguide upper cladding layer. The visible light and near-infrared band silicon-based optical waveguide-integrated photoelectric detector can be conveniently integrated with other integrated optical waveguide devices only through a simple optical waveguide structure, and implementation of an integrated, miniaturized, portable and low-cost photoelectric detection receiving system is facilitated.

Description

technical field [0001] The invention relates to a silicon-based photodetector, in particular to a silicon-based optical waveguide integrated photodetector for visible light and near-infrared bands. Background technique [0002] In the fields of drug development, environmental monitoring, food safety testing and other fields, reliable testing methods are indispensable, and sensing technology is its core technology. Using advanced sensing technology, qualitative or quantitative analysis can be performed on the composition / concentration of substances. Optical sensing is an important branch of sensing technology, which usually includes two parts: sensing unit and photodetector. [0003] For an integrated optical waveguide sensing system, a photodetector is an essential component for converting optical signals into electrical signals for subsequent signal processing. For visible and near-infrared bands, silicon-based photodetectors are a good choice, and their structure include...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0232H01L31/09H01L31/18
CPCH01L31/02327H01L31/09H01L31/1804Y02P70/50
Inventor 戴道锌张明
Owner ZHEJIANG UNIV