Perovskite solar cell based on silicon-based micro-nano structure and production method of perovskite solar cell
A micro-nano structure, solar cell technology, applied in the field of solar cells, can solve the problems that the perovskite light absorption layer cannot fully absorb incident light, affect the photo-generated current, and the loss of incident light, so as to promote separation and transport, increase optical Absorb and improve battery performance
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Embodiment 1
[0045] Step 1: Prepare the crystal cone structure by irradiating the surface of p-type single crystal silicon with laser pulses, the pulse width is 100-100ps, the wavelength is 1064nm, the power is 5mW, the spot is 30μm, and the irradiation method is continuous marking line by line. The height of the crystal cone is 60 μm, and the width at half maximum is 10 μm.
[0046] Step 2: Using corrosion solution (HF: HNO 3 :H 2 O=2:2:3) Clean the single crystal silicon and the surface crystal cone structure, and the cleaning time is 180s.
[0047] Step 3: Prepare NiO on the surface of the cone by magnetron sputtering 2 The thin film acts as a hole transport layer with a thickness of 50 nm.
[0048] Step 4: Prepare the perovskite light absorbing layer by dual-source co-evaporation on the hole transport layer, and the evaporation source is PbI 2 with CH 3 NH 3 1, the dosage ratio is 1:3. The two react to form CH 3 NH 3 PB 3 The film thickness is 400 nm.
[0049] Step 5: Prepar...
Embodiment 2
[0053] Step 1: Prepare a porous structure on the surface of p-type single crystal silicon by metal-catalyzed chemical etching, the catalyst is 0.05mM HAuCl 4 solution, the corrosion solution is HF and H 2 o 2 deionized aqueous solution (HF: H 2 o 2 :H 2 O=1:5:2), the etching was carried out in an ultrasonic water bath, the etching time was 180s, and the prepared porous silicon had a depth of 20nm and a pore diameter of 50nm.
[0054] Step 2: Using corrosion solution (HF: HNO 3 :H 2 O=2:2:3) Clean the single crystal silicon and the surface crystal cone structure, and the cleaning time is 150s.
[0055] Step 3: Prepare NiO on the surface of the cone by magnetron sputtering 2 The thin film acts as a hole transport layer with a thickness of 50 nm.
[0056] Step 4: Prepare the perovskite light absorbing layer by dual-source co-evaporation on the hole transport layer, and the evaporation source is PbI 2 with CH 3 NH 3 1, the dosage ratio is 1:3. The two react to form CH ...
Embodiment 3
[0061] Step 1: Use laser pulses to irradiate the surface of p-type single crystal silicon to prepare crystal cone structures. The pulse width is 1-100ns, the wavelength is 870nm, the power is 30mW, and the irradiation method is continuous marking line by line. The height of the prepared crystal cones is 0.05μm, the full width at half maximum is 0.05μm.
[0062] Step 2: Using corrosion solution (HF: HNO 3 :H 2 O=3:2:3) Clean the single crystal silicon and the surface crystal cone structure, and the cleaning time is 120s.
[0063] Step 3: Prepare NiO on the surface of the cone by magnetron sputtering 2 The thin film acts as a hole transport layer with a thickness of 100 nm.
[0064] Step 4: Prepare the perovskite light absorbing layer by dual-source co-evaporation on the hole transport layer, and the evaporation source is PbI 2 with CH 3 NH 3 1, the dosage ratio is 1:1. The two react to form CH 3 NH 3 PB 3 The film thickness is 300 nm.
[0065] Step 5: On the perovski...
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