Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Chelate resin, preparation method thereof and application thereof in nickel-copper containing solution deep copper removal

A chelating resin and solution technology, applied in chemical instruments and methods, other chemical processes, photographic technology, etc., can solve the problems of poor selectivity of copper-nickel separation

Active Publication Date: 2016-12-07
WIDE WATER TREATMENT TECH CO LTD
View PDF3 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] For existing chelating resins, there is the poor problem of copper-nickel separation selectivity in nickel electrolyte copper removal process, the first purpose of the present invention is to provide a kind of 2-containing tertiary amino group and ester group simultaneously A resin with aminomethylpyridine functional groups, which has a highly selective chelation effect on copper, but no chelation effect on nickel, and can be used for deep purification of copper in nickel-containing copper solutions

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chelate resin, preparation method thereof and application thereof in nickel-copper containing solution deep copper removal
  • Chelate resin, preparation method thereof and application thereof in nickel-copper containing solution deep copper removal
  • Chelate resin, preparation method thereof and application thereof in nickel-copper containing solution deep copper removal

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～4

[0083] (a) Preparation of N-(tert-butoxycarbonyl methylene)-2-aminomethylpyridine

[0084] Under the protection of an inert atmosphere, mix 2-aminomethylpyridine, triethylamine, potassium iodide, and absolute ethanol evenly, then add tert-butyl bromoacetate drop by drop, react at room temperature for 8-20 hours, and add 2M Sodium chloride was extracted with ethyl acetate, then anhydrous magnesium sulfate was added and left to stand overnight, filtered, and the filtrate was purified by column chromatography after rotary evaporation to obtain N-(tert-butoxycarbonylmethylene)-2-ammonia picoline (AMPY-1). Table 1 adopts the relationship between N-(tert-butoxycarbonylmethylene)-2-aminomethylpyridine and productive rate prepared by different raw material ratios

[0085]

[0086]

Embodiment 5～8

[0088] (a) Preparation of N-(tert-butoxycarbonyl methylene)-2-aminomethylpyridine

[0089] Under the protection of an inert atmosphere, after mixing 10.23mL 2-aminomethylpyridine, 16.73mL triethylamine, 0.053g potassium iodide, and 150mL absolute ethanol, add 14.41mL tert-butyl bromoacetate drop by drop, and react at room temperature 8 to 20 hours, after the reaction is complete, add 2M sodium chloride and extract with ethyl acetate, then add anhydrous magnesium sulfate and let it stand overnight, filter, and the filtrate is purified by column chromatography after rotary evaporation to obtain N-(tert-butoxy Carbonylmethylene)-2-aminomethylpyridine (AMPY-1) in 55% yield.

[0090] (b) Preparation of 2-aminomethylpyridine modified silane coupling agent containing both tertiary amine groups and ester groups

[0091] Under the protection of an inert atmosphere, after mixing 3-chloropropyltrimethoxysilane, triethylamine, and N,N-dimethylformamide (DMF) evenly, add N-(tert-butoxycar...

Embodiment 9～12

[0096] (a) Preparation of N-(tert-butoxycarbonyl methylene)-2-aminomethylpyridine

[0097] Under the protection of an inert atmosphere, after mixing 10.23mL 2-aminomethylpyridine, 16.73mL triethylamine, 0.053g potassium iodide, and 150mL absolute ethanol, add 14.41mL tert-butyl bromoacetate drop by drop, and react at room temperature 8 to 20 hours, after the reaction is complete, add 2M sodium chloride and extract with ethyl acetate, then add anhydrous magnesium sulfate and let it stand overnight, filter, and the filtrate is purified by column chromatography after rotary evaporation to obtain N-(tert-butoxy Carbonylmethylene)-2-aminomethylpyridine (AMPY-1) in 55% yield.

[0098] (b) Preparation of chelating resin with functional groups grafted on silica gel matrix

[0099] Under the protection of an inert atmosphere, after mixing 3-chloropropyltrimethoxysilane, triethylamine, and N,N-dimethylformamide (DMF) evenly, add N-(tert-butoxycarbonylmethylene base)-2-aminomethylpyrid...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses chelate resin, a preparation method of the chelate resin and application of the chelate resin in nickel-copper containing solution deep copper removal. The chelate resin is grafted with a 2-amino methyl pyridine functional group containing a tertiary amine group and an ester group at the same time; the functional group only causes physical absorption with nickel (II) and causes a chemical chelation effect with copper (II), special functions of the functional group are sufficiently utilized and grafted to matrixes such as silica gel and polystyrene, a series of chelate resin is obtained, the chelate resin reserves special selective copper chelation function of the functional group, can be easily separated from a solution, can be applied in selectively removing copper in the nickel-copper containing solution and is particularly applicable to high-selectivity deep-purification copper removal of nickel anodic electrolyte in a chloride system and a chloride-sulfate mixed system, and the copper content in the solution with copper removed and the copper-nickel mass ratio of the desorbed solution can both meet industrial requirement for deeply removing copper through nickel anodic electrolyte.

Description

technical field [0001] The present invention relates to a kind of chelating resin and preparation method thereof, particularly a kind of chelating resin containing 2-aminomethylpyridine functional group of tertiary amino group and ester group at the same time, and chelating resin is used for chloride salt system, The invention discloses a method for purifying and removing copper in a nickel electrolysis anolyte of a chloride-sulfate mixed system; it belongs to the field of nonferrous metal hydrometallurgy. Background technique [0002] In order to obtain high-purity nickel metal, in the process of producing electrolytic nickel, it is necessary to purify and remove impurities and remove impurity ions. In particular, copper is the main impurity element in nickel electrolytic anolyte, its standard potential (+0.337V) is much higher than that of nickel (-0.25V), and it is very easy to preferentially precipitate at the cathode, seriously affecting the quality of electrolytic nick...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/26B01J20/30C02F1/28C25C1/08C25C7/06C08F12/14C08F8/30
CPCB01J20/26B01J20/30C02F1/28C08F8/30C08F12/14C25C1/08C25C7/06B01J20/264C02F1/285C02F2101/20C02F2103/16
Inventor 胡慧萍王彩霞邱雪景程泽英
Owner WIDE WATER TREATMENT TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com