A kind of preparation method of solar cell high transmittance anti-reflection film

A technology of anti-reflection film and solar cell, which is applied in the direction of circuits, electrical components, photovoltaic power generation, etc., can solve the problems of complex preparation process, surface etching of battery structure, large pore size, etc., to improve luminous flux, improve conversion efficiency, and improve Effect of short circuit current

Active Publication Date: 2019-04-16
TIANJIN LANTIAN SOLAR TECH
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Problems solved by technology

However, because the selective etching process of the thin film material is required to obtain the porous structure, the preparation process is complicated, and the surface of the battery structure may be etched at the same time, and the size of the pores is slightly larger

Method used

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  • A kind of preparation method of solar cell high transmittance anti-reflection film
  • A kind of preparation method of solar cell high transmittance anti-reflection film
  • A kind of preparation method of solar cell high transmittance anti-reflection film

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preparation example Construction

[0032] The preparation method of the high transmittance anti-reflection film for the above solar cell comprises the following steps:

[0033] (1) Under the protective atmosphere of inert gas, the ambient temperature is 12-28 degrees Celsius: select any one of chloroform, ethanol, acetone or propanol and mix it with nonane to obtain a solvent;

[0034] (2) Under the protective atmosphere of inert gas, select any one, any two or all three of acrylic resin, polyethylene acetate or polyvinyl alcohol as a polymer, add it to the solvent prepared in step (1), and stir for 1~ After 4 hours, let stand for 15 to 120 minutes and filter out the precipitate to obtain a solution;

[0035] (3) Under a protective atmosphere of inert gas, use a spin coating machine to evenly coat the solution in step (3) on the upper surface of the solar cell at a speed of 5000-12000r / min. The spin-coating time is 15-60 seconds. The temperature is kept at 20-125 degrees Celsius, and then the anti-reflection f...

Embodiment

[0038] 1. In N 2 Under the protective atmosphere of the environment temperature of 20 degrees Celsius, acetone and nonane are mixed uniformly according to the volume of 1:0.015;

[0039]2. Add PMMA granular material to the solvent at a volume ratio of 1:2, mix and stir for 2 hours, then let it stand for 40 minutes, the existing residue precipitates out, and the solution is obtained after filtration;

[0040] 3. Use the glue coating machine to evenly coat the solution on the amorphous silicon battery at a speed of 9000r / min. The spin coating time is kept at 30 seconds. After coating, the solar battery is vacuum-dried at 100 degrees Celsius for 40 minutes. Finally, a stable and cured anti-reflection film is formed.

[0041] figure 1 It is a schematic diagram of the structure of a solar cell with a nanoporous anti-reflection film. The layered structure of the anti-reflection film is between the two black filled lines. When irradiated on the solar cell, the transmittance is imp...

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Abstract

The invention relates to a high-transmittance anti-reflection membrane of a solar cell. The thickness of the anti-reflection membrane is 70-90 nanometers, the pore size of the anti-reflection membrane is smaller than 200 nanometers, and the raw material of the anti-reflection membrane comprises a solvent and a polymer. In the anti-reflection membrane, uniformly coating is performed on the solar cell by a rotation gluing machine, and the anti-reflection membrane with relatively thin thickness and relatively small pore size is formed. By means of mobility performance of an organic polymer material, the agglomeration of the polymer material is achieved; meanwhile, the solvent liable to volatilize is separated during the high-speed rotation process, and pores are formed in the anti-reflection membrane; by adjusting the rotational speed, the time and a solvent formula, the adjustment of the sizes of nanometer pores is achieved, and finally, the reflectivity of the anti-reflection membrane is changed; and through a test, the short-circuit current of the cell is effectively increased, the luminous flux of sunlight on a cell surface is improved, and the conversion efficiency is improved.

Description

technical field [0001] The invention belongs to the technical improvement field of solar cell anti-reflection film, in particular to a preparation method of solar cell anti-reflection film with high transmittance. Background technique [0002] With the rapid development of science and technology, economy and population, people have developed more and more new energy sources, including wind energy, solar energy, nuclear energy, etc. Compared with traditional chemical energy, they have the advantages of being renewable and clean. Solar cells are conversion devices that convert light energy into electrical energy. In the solar cell structure, the anti-reflection film has an important influence on the efficient and reasonable use of the solar spectrum by the cell, and can directly affect the photoelectric conversion efficiency of the cell. [0003] In a traditional monocrystalline silicon cell, under normal sunlight, the light reflectance of the silicon surface is 30-35%. The ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0216H01L31/18
CPCH01L31/02168Y02E10/50Y02P70/50
Inventor 万荣华方亮高伟高慧张宝裴东
Owner TIANJIN LANTIAN SOLAR TECH
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