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MEMS micro-heating chip of composite structure and manufacturing method and application of chip

A composite structure and micro-heating technology, applied in micro-structure technology, micro-structure device, manufacturing micro-structure device, etc., can solve the problems of support strength and impact resistance constraints, difficult application of membrane support, and stress-prone devices, etc. Achieve the effect of improving mechanical properties, high yield and increasing thickness

Active Publication Date: 2017-05-31
安徽芯淮电子有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Although the above two main types of micro-heating chips based on MEMS processing technology have solved the defects of large volume and high power consumption of traditional micro-heating devices to a certain extent, due to the fact that single-sided film composites are mainly used in the processing process The preparation of heat insulation layer, insulating layer, heating electrode layer, and test electrode layer can be realized by means of different methods. Therefore, due to too many film layers, it is easy to generate stress and cause device failure; and especially the above two types of micro-heating chips are still based on planar film For the support structure, due to the limitation of the single-sided film preparation process itself, the thickness of the film can only be within a certain range, so its support strength and impact resistance are also subject to certain constraints, especially for low-power micro-heating chips, it is difficult to realize the application of film support
Although the literature titled "Design and Fabrication of Micro-heating Plate Based on MEMS Technology" also reported a micro-heating chip based on a support beam, it also has the defects of large film stress and insufficient thickness, and it is difficult to achieve low power consumption at the same time. High energy consumption, high mechanical strength, good product yield and other advantages

Method used

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  • MEMS micro-heating chip of composite structure and manufacturing method and application of chip
  • MEMS micro-heating chip of composite structure and manufacturing method and application of chip
  • MEMS micro-heating chip of composite structure and manufacturing method and application of chip

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Effect test

Embodiment 1

[0113] The manufacturing method of the MEMS micro-heating chip of a kind of composite structure in the present embodiment is as follows:

[0114] The first part is to prepare the lower half structure of the micro-heating chip:

[0115] First, on a single crystal silicon substrate with a thickness of 300um, 100nm of silicon oxide is grown on its surface by thermal oxidation, as the lower insulating layer 2 of the micro-heating chip;

[0116] Then, by means of spin coating and solidification, a polyimide (PI) film layer with a thickness of 1um is covered on the lower insulating layer as the thermal insulation layer 3 of the micro-heating chip;

[0117] Subsequently, a silicon oxide thin film layer with a thickness of 150 nm is grown on the heat insulating layer by plasma vapor deposition as the lower adhesion layer 4 of the micro-heating chip;

[0118] On the top of the lower adhesion layer 4, a metal Pt heating electrode layer 5 with a thickness of 200 nm is formed through pho...

Embodiment 2

[0133] The first part is to prepare the lower half structure of the micro-heating chip:

[0134] First, on a single crystal silicon substrate with a thickness of 200um, deposit 100nm of silicon oxide on its surface by means of plasma chemical vapor deposition, as the lower insulating layer 2 of the micro-heating chip;

[0135] Then, by spin coating and curing, the lower insulating layer is covered with a polyester (PET) film layer with a thickness of 1um, as the heat insulation layer 3 of the micro-heating chip;

[0136] Subsequently, a silicon oxide thin film layer with a thickness of 200nm is grown on the heat insulating layer by plasma vapor deposition as the lower adhesion layer 4 of the micro-heating chip;

[0137] On the upper surface of the lower adhesion layer, a metal W heating electrode layer 5 with a thickness of 200nm is formed through photolithography, sputtering, etching and other process steps in the semiconductor processing technology;

[0138] Then by plasma ...

Embodiment 3

[0152] The first part is to prepare the lower half structure of the micro-heating chip:

[0153] First, on a single crystal silicon substrate with a thickness of 400um, 100nm of silicon oxide is deposited on its surface by means of low-pressure chemical vapor deposition, as the lower insulating layer 2 of the micro-heating chip;

[0154] Then, by means of chemical vapor deposition, a layer of aluminum oxide with a thickness of 200nm is deposited on the lower insulating layer as the thermal insulation layer 3 of the micro-heating chip;

[0155] Subsequently, a silicon nitride thin film layer with a thickness of 200nm is grown on the heat insulating layer by plasma vapor deposition as the lower adhesion layer 4 of the micro-heating chip;

[0156] On the lower adhesion layer, a polysilicon heating electrode layer 5 with a thickness of 200nm is formed through photolithography, sputtering, etching and other process steps in the semiconductor processing technology;

[0157] Then by...

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Abstract

The invention discloses an MEMS micro-heating chip of a composite structure and a manufacturing method of the chip. The MEMS micro-heating chip comprises a supporting frame and a composite film arranged in the supporting frame in a suspended mode. The composite film comprises a lower insulating layer, a heat insulation layer, a heating electrode layer, a middle insulating layer, a heat conductive layer, a testing electrode layer and an upper insulating layer in sequence in a set direction. The lower insulating layer is used for electrically isolating the heating electrode layer from the supporting frame, the heat insulation layer is used for thermally isolating the heating electrode layer from the supporting frame, the middle insulating layer is used for optically isolating the heating electrode layer from the testing electrode layer, and the upper insulating layer is used for electrically isolating the testing electrode layer from the supporting frame. The micro-heating chip has good thermal stability, and a polymer serves as the heat insulation layer and can improve thermal sensitivity. Meanwhile, the process of bonding the heating electrode layer with the testing electrode layer is utilized, device failure caused by film stress in the single-side preparing technical process can be effectively avoided, and the device yield is increased.

Description

technical field [0001] The invention relates to a MEMS micro-heating chip and a manufacturing method thereof, in particular to a multilayer film micro-heating chip of a composite structure, a manufacturing method and an application thereof, belonging to the technical field of semiconductor micro-nano processing. Background technique [0002] The micro-heating chip has the advantages of small size, low heating power, fast response time, small heat loss, compatibility with semiconductor technology, and easy integration, so it has become an important part of the micro-heating sensor, causing extensive research at home and abroad, especially Miniaturized micro-heating chips are currently widely used in the fields of gas sensors, gas flow meters, micro-calorimeters, infrared light sources, etc., and have great potential for development. [0003] The traditional heating chip preparation method is mainly to directly print the resistance paste on the ceramic blank, bake it at a cert...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81B7/02B81C1/00
CPCB81B7/02B81B2201/00B81C1/00134B81C1/0015
Inventor 刘瑞李晓波邓敏
Owner 安徽芯淮电子有限公司
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