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Photoresist and application method thereof

An application method and photoresist technology, applied in the fields of electronic information technology and biomedicine, can solve the problems of great harm to the human body, poor environmental friendliness, poor biocompatibility and degradability, etc., and achieve excellent mechanical properties and biological phase. Good capacitance and good etch selectivity

Inactive Publication Date: 2017-05-31
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a photoresist and its application method, which are used to solve the problem of poor environmental friendliness, great harm to human body, poor biocompatibility and degradability in the prior art. and a series of questions

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  • Photoresist and application method thereof
  • Photoresist and application method thereof
  • Photoresist and application method thereof

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Embodiment 1

[0037] This embodiment provides a method for applying a photoresist, and the photoresist is a genetically recombinant spider silk protein MaSp1. In this embodiment, the photoresist is processed by electron beam exposure, image 3 with Figure 4 It is a scanning electron micrograph of the processed genetically recombined spider silk protein structure, wherein image 3 For positive glue, Figure 4 For negative glue, the specific steps are:

[0038] First, step S1 is performed, dissolving the recombinant spider silk protein in water to form an aqueous solution of the recombinant spider silk protein.

[0039] In this embodiment, the genetically recombinant spider silk protein has a molecular weight of 125 KDa and is a solid powder, the water is ultrapure water, and the resistivity is 18.25 MΩ·cm.

[0040]Executing step S2, providing a substrate, coating the aqueous solution of the genetically recombined spider silk protein on the substrate, drying and curing to form a genetica...

Embodiment 2

[0049] This embodiment provides a method for applying a photoresist, and the photoresist is a genetically recombinant spider silk protein MaSp2. In this embodiment, the photoresist is processed by ion beam exposure. Figure 5 with Image 6 It is a scanning electron micrograph of the processed genetically recombined spider silk protein structure, wherein Figure 5 For positive glue, Image 6 For negative glue, the specific steps are:

[0050] First, step S1 is performed, dissolving the recombinant spider silk protein in water to form an aqueous solution of the recombinant spider silk protein.

[0051] In this embodiment, the genetically recombinant spider silk protein has a molecular weight of 100 KDa and is a solid powder, the water is ultrapure water, and the resistivity is 18.25 MΩ·cm.

[0052] Execute step S2, coating the aqueous solution of gene recombinant spider silk protein on the substrate, drying and curing to form a gene recombinant spider silk protein film.

[...

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Abstract

The invention provides a photoresist and an application method thereof. The photoresist is genetic recombinant spider silk protein. Compared with a conventional photoresist, the genetic recombinant spider silk protein serving as the photoresist has a series of outstanding advantages of being good in biocompatibility, excellent in mechanical performance, good in etching-resistant selectivity, easy in functionalization and controllable in degradation, and the like. According to the photoresist provided by the invention, in a use process, only water is used as a solvent and a developing solution; the compatibility and the environmental friendliness of a processing technique are furthest guaranteed; in addition, through changing the cross-linking extent of the genetic recombinant spider silk protein; positive and negative dual purposes, that is, the genetic recombinant spider silk protein not only can be used as a positive photoresist but also can be used as a negative photoresist, can be realized; by associating with different processing methods, the compound processing from top to bottom and from bottom to top can be realized; multi-dimension and across-scale biological micro / nano structures are prepared; the photoresist has better application and development prospects.

Description

technical field [0001] The invention belongs to the fields of electronic information technology and biomedical technology, and relates to a photoresist and an application method thereof, in particular to a gene recombined spider silk protein photoresist and an application method thereof. Background technique [0002] Photolithography technology is the foundation of modern semiconductor, microelectronics, and information industries. Photoresist is a key material in lithography technology, and is mainly used in the microprocessing of integrated circuits and semiconductor discrete devices. Through electron beam, ion beam, ultraviolet light, deep ultraviolet light, X-ray and other light or radiation, the solubility of photoresist in the developer solution changes through photochemical reaction, after exposure, the solubility of photoresist in the developer solution Increase, the same pattern as the mask plate is called positive photoresist; after exposure, the solubility of the ...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/20
CPCG03F7/004G03F7/20
Inventor 陶虎秦楠姜建娟夏小霞钱志刚
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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