Alumina based dielectric film for high energy storage density capacitor and preparation method
A technology of high energy storage density and dielectric thin film, which is applied in the direction of fixed capacitor dielectric, capacitor, fixed capacitor, etc., can solve the problems affecting the electrical performance of capacitors, and achieve the effects of easy mass production, short time period and simple preparation process
Inactive Publication Date: 2017-06-23
TONGJI UNIV
6 Cites 4 Cited by
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Abstract
The invention relates to an alumina based dielectric film for high energy storage density capacitor and a preparation method. The chemical composition is Al2Bi2-xSiyOz, where: x = 0.005 - 0.1, y = 0.02, the sol-gel method is used to produce the alumina-based dielectric film. Compared with the prior art, the alumina-based dielectric film prepared by the invention has the breakdown voltage between 80V and 200V, the leakage conductance less than 1[mu]A before breakdown, and the dielectric constant higher than that of the traditional alumina film, and can be applied to various high energy density and high voltage capacitors. Compared with the prior art, the preparation process of the invention is simple, the film is compact and uniform, and the dielectric properties are excellent.
Application Domain
Thin/thick film capacitorFixed capacitor dielectric +1
Technology Topic
High voltage capacitorsHigh energy +9
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PUM
Property | Measurement | Unit |
Thickness | 180.0 ~ 300.0 | nm |
Thickness | 180.0 | nm |
Thickness | 300.0 | nm |
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