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Metal-electroplating enhanced transparent conductive film and preparation method thereof

A technology of transparent conductive film and electroplating metal, which is applied in the direction of cable/conductor manufacturing, conductive layer on insulating carrier, circuit, etc., which can solve the problem that the structure cannot be well maintained, thermal stability is not ideal, and silver nanowires are damaged and other issues, to achieve good industrial application prospects, enhance light transmittance and electrical conductivity, and eliminate the effect of contact resistance

Active Publication Date: 2017-06-30
HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the other hand, the thermal stability of silver nanowires alone is not ideal. Usually, when the temperature exceeds 160°C, the silver nanowires will be destroyed, and the 1D structure cannot be well maintained.
In the existing technology, the main idea to solve the stability problem of silver nanowires is to coat a layer of oxide on the surface of silver wires, such as ZnO, etc., but this technology needs to use more expensive equipment and the process is more complicated , and takes a long time

Method used

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  • Metal-electroplating enhanced transparent conductive film and preparation method thereof
  • Metal-electroplating enhanced transparent conductive film and preparation method thereof
  • Metal-electroplating enhanced transparent conductive film and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0045] Select glass as the substrate, and use the spin coating method. First, spin-coating a layer of silane coupling agent KH-560 on the glass, and then spin-coating a layer of silver nanowires on the glass to obtain a transparent conductive layer with visible light transmittance It is about 98.6%, the sheet resistance is about 600Ω / sq, and the rotation speed used in the spin coating process is 2000r / min.

[0046] Then, electroplating is used to plate the samples obtained above with nickel. The specific formulation of the electroplating solution used in this embodiment is: 100g / L nickel sulfate, 18g / L nickel chloride, 11g / L boric acid, 1ml / L main light agent HN-8, 1ml / L wetting agent HN-19, adjust The pH is about 3.5. During the electroplating process, the current density used is about 3mA / cm 2 , The plating time is 5min.

[0047] After electroplating, the sample is washed with deionized water and ethanol, and dried naturally to obtain a transparent conductive film product. figu...

Embodiment 2

[0049] Select glass as the substrate, and use the spin coating method. First, spin-coating a layer of silane coupling agent KH-560 on the glass, and then spin-coating a layer of silver nanowires on the glass to obtain a transparent conductive layer with visible light transmittance It is about 98.6%, and the sheet resistance is about 600Ω / sq. The speed used in the spin coating process is 2000r / min.

[0050] Then, electroplating is used to plate the samples obtained above with nickel. The specific formulation of the electroplating solution used in this embodiment is: 50g / L nickel sulfate, 9g / L nickel chloride, 6g / L boric acid, 1ml / L main light agent HN-8, 1ml / L wetting agent HN-19, adjust The pH is about 3.5. During the electroplating process, the current density used is about 8mA / cm 2 , The plating time is 15s.

[0051] The sample obtained after electroplating is washed with deionized water and ethanol to finally obtain a transparent conductive film product. figure 2 A scanning ...

Embodiment 3

[0053] PET is selected as the substrate, and a layer of silver nanowires is directly pulled on the PET by the pulling method to obtain a transparent conductive layer with a visible light transmittance of about 99.0% and a sheet resistance of about 1200Ω / sq.

[0054] Then electroplating is used to plate the samples obtained above with copper. The specific formulation of the electroplating solution used in this embodiment is: 200 g / L copper sulfate, 70 g / L sulfuric acid, 0.06 g / L hydrochloric acid, 0.1 g / L sodium lauryl sulfate, and 0.0001 g / L tetrahydrothiazolthione. During the electroplating process, the current density used is about 10mA / cm 2 , The plating time is 10s.

[0055] The sample obtained after electroplating is washed with deionized water and ethanol, and finally freeze-dried in vacuum to obtain a transparent conductive film product. image 3 A scanning electron microscope picture of the prepared transparent conductive film is given. It can be seen that the silver nanowi...

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Abstract

The invention provides a metal-electroplating enhanced transparent conductive film and a preparation method thereof. The preparation method comprises: a transparent conductive layer is prepared on the surface of a substrate; a metal layer is deposited on the transparent conductive layer by an electroplating method and post-processing is carried out to obtain a metal-electroplating enhanced transparent conductive film. The mass ratio of the metal of the metal layer to the material of the transparent conductive layer is 0.001-500: 1. The surface of the substrate is a planar, curved or irregular surface. According to the invention, with the electroplating technology, the contact resistance can be eliminated, the ohmic contact can be realized, and the light-transmitting property and conductive property of the transparent conductive film can be enhanced obviously. Moreover, the temperature-resistance performance of the film is excellent and the adhesive force is good; the process is simple; the cost is low; the repeatability and efficiency are high; and the transparent conductive film has the broad industrial application prospects.

Description

Technical field [0001] The invention belongs to the technical field of photoelectric functional materials, and in particular relates to an electroplated metal reinforced transparent conductive film and a preparation method thereof. Background technique [0002] Transparent conductive film is a kind of functional film with good conductivity and good visible light transmittance. It is a very important optoelectronic material. It is used in the electronic information industry, energy industry, transportation, machinery industry and military It has been widely used in the field, such as flat panel displays, touch screens, solar cells, transparent electromagnetic wave shielding materials, gas sensors, antistatic coatings, and semiconductor / insulator / semiconductor (SIS) heterojunctions, windows for modern fighters and cruise missiles , Car window thermal conductive glass, etc. [0003] The traditional conductive material used as a transparent conductive film is indium tin oxide (ITO), b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01B13/00C25D3/12C25D3/38C25D3/46
CPCC25D3/12C25D3/38C25D3/46H01B5/14H01B13/00
Inventor 邱业君季洋
Owner HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL
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