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High-transparency low-radiation coated glass manufacturing method

A low-radiation coating, high transmittance technology, applied in the coating and other directions, can solve the problems of affecting the deep processing performance of coated glass, affecting the optical performance of coated glass, poor optical performance of coated glass, etc. Improved stability and thermal stability, long service life effect

Inactive Publication Date: 2017-07-21
DONGGUAN TAISHENG GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, low-emissivity coated glass has been widely used in the construction field. The increase of transmittance is generally realized by the anti-reflection effect of the dielectric layer and the reduction of the thickness of the metal layer. Oxidation affects the optical properties of coated glass, thus affecting the deep processing performance of coated glass
Currently commercially available coated glass has poor optical performance, the visible light transmittance is lower than 80%, and most of them use pure silver functional layer, which is easy to be oxidized and loses its effect quickly

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] A method for manufacturing high-transmittance low-emissivity coated glass, comprising the following steps:

[0028] (1) Surface treatment of the glass substrate:

[0029] a. Use a neutral detergent to clean the surface of the glass substrate, and rinse it with deionized water for 3 times;

[0030] b. Dry with blower for 15 minutes to dry the water stains;

[0031] (2) Coating high light transmittance and low radiation glass film layer: once sputtering the inner dielectric layer, functional layer, outer dielectric layer and protective layer on the glass substrate, the specific process conditions are as follows;

[0032] a. Using magnetron sputtering deposition process, the vacuum degree is 2.4×10 -3 In mbar nitrogen and argon atmosphere, ZnSnNi alloy target is used to sputter the inner dielectric layer on the glass substrate, the deposition thickness is 20nm, the volume ratio of nitrogen and argon is 1:2.5, and the deposition power is 25kW;

[0033] b. In a vacuum of ...

Embodiment 2

[0040] A method for manufacturing high-transmittance low-emissivity coated glass, comprising the following steps:

[0041] (1) Surface treatment of the glass substrate:

[0042] a. Use a neutral detergent to clean the surface of the glass substrate, and rinse it with deionized water 4 times;

[0043] b. Dry with blower for 17 minutes to dry the water stains;

[0044] (2) Coating high light transmittance and low radiation glass film layer: once sputtering the inner dielectric layer, functional layer, outer dielectric layer and protective layer on the glass substrate, the specific process conditions are as follows;

[0045] a. Using magnetron sputtering deposition process, the vacuum degree is 3.5×10 -3 In mbar nitrogen and argon atmosphere, use ZnSnNi alloy target to sputter the inner dielectric layer on the glass substrate, the deposition thickness is 30nm, the volume ratio of nitrogen and argon is 1:3, and the deposition power is 35kW;

[0046] b. In a vacuum of 2×10 -3 I...

Embodiment 3

[0053] A method for manufacturing high-transmittance low-emissivity coated glass, comprising the following steps:

[0054] (1) Surface treatment of the glass substrate:

[0055] a. Use a neutral detergent to clean the surface of the glass substrate, and rinse it with deionized water for 5 times;

[0056] b. Blower to dry for 20 minutes, dry water stains;

[0057] (2) Coating high light transmittance and low radiation glass film layer: once sputtering the inner dielectric layer, functional layer, outer dielectric layer and protective layer on the glass substrate, the specific process conditions are as follows;

[0058] a. Using magnetron sputtering deposition process, the vacuum degree is 4.5×10 -3 In mbar nitrogen and argon atmosphere, ZnSnNi alloy target is used to sputter the inner dielectric layer on the glass substrate, the deposition thickness is 40nm, the volume ratio of nitrogen and argon is 1:3.5, and the deposition power is 45kW;

[0059] b. At a vacuum degree of 3...

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Abstract

The invention provides a high-transparency low-radiation coated glass manufacturing method, and relates to the technical field of coated glass. The manufacturing method mainly includes the steps: (1) treating the surface of a glass substrate and cleaning and drying the glass substrate; (2) coating a high-transparency low-radiation glass film: sequentially sputtering an inner medium layer, a functional layer, an outer medium layer and a protective layer on the glass substrate by a magnetron sputtering deposition process; (3) cutting an edge film layer and polishing edges; (4) tempering: enabling a coated surface of the high-transparency low-radiation coated glass to face a heat conducting transmission roller, and keeping the coated surface facing the heat conducting transmission roller at the temperature of 680-750 DEG C to obtain a finished product. The low-radiation coated glass prepared by the manufacturing method has good low-radiation performance, high visible light transmittance and good service performance.

Description

[0001] field of invention [0002] The invention belongs to the technical field of coated glass, and in particular relates to a method for manufacturing coated glass with high light transmittance and low radiation. Background technique [0003] Low-emissivity coated glass ("Low-E" glass) is a kind of coated glass with a high reflectance to infrared rays with a wavelength of 4.5-25 μm. Low-E glass is to use physical or chemical methods to coat the glass surface with a metal film or metal oxide film containing one or two or even multi-layer films to reduce the heat transfer caused by the temperature difference between indoor and outdoor, so as to ensure life, Work comfort. [0004] Low-E glass has the characteristics of low heat transfer coefficient and infrared reflection. Its main function is to reduce the radiant energy transfer of indoor and outdoor far-infrared rays, and allow solar radiation to enter the room as much as possible, thereby maintaining the indoor temperatur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/36
CPCC03C17/36C03C17/3618C03C17/3626C03C17/3642C03C17/3644C03C17/3652C03C17/366C03C2218/154
Inventor 万永宁李明飞
Owner DONGGUAN TAISHENG GLASS CO LTD
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