Vertical orientation strong magnetic dielectric film and preparation method thereof

A technology of vertical orientation and dielectric thin film, applied in the application of magnetic film to substrate, magnetic layer, inductor/transformer/magnet manufacturing, etc. High substrate cost and other issues, to achieve the effect of small grain size, small volume and large coercive force

Active Publication Date: 2017-09-05
NORTHEASTERN UNIV
View PDF4 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But this in-plane oriented film is not suitable for perpendicular magnetic recording
[0005] In order to prepare Sm-Co thin films grown along the phase orientation of the substrate, expensive Al 2 o 3 (0001) single crystal substrate and use precious metal Ru as buffer layer, take epitaxial growth method; but the coercive force of the film prepared by this method is low, only 1.35T room temperature coercive force, the most important is Al 2 o 3 (0001) The cost of single crystal substrate is very high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vertical orientation strong magnetic dielectric film and preparation method thereof
  • Vertical orientation strong magnetic dielectric film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] A preparation method of the above-mentioned vertical orientation ferromagnetic thin film, comprising the steps of: (1) cleaning and drying the thermally oxidized Si substrate;

[0024] (2) Under vacuum conditions, the AlN buffer layer was prepared on the surface of thermally oxidized Si substrate by radio frequency reactive sputtering, and the atmosphere in the sputtering chamber was 0.05-50Pa N 2 and 0.05-50Pa Ar mixed atmosphere, the target material is an Al target with a purity higher than 99.99%, the temperature is 100°C, and the thickness of the AlN buffer layer is 1-100nm;

[0025] (3) Under vacuum conditions, the magnetron sputtering method is used to prepare a vertically oriented ferromagnetic layer on the surface of the AlN buffer layer. The composition of the vertically oriented ferromagnetic layer is SmCo 3.5 Cu 0.5 , the atmosphere is 0.05-50Pa Ar gas with a purity higher than 99.9%, the temperature is 350°C, the deposition time is determined according to t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a strong magnetic dielectric film, and in particular relates to a vertical orientation strong magnetic dielectric film and a preparation method thereof. The technical scheme is as follows: the vertical orientation strong magnetic dielectric film comprises a substrate, a buffer layer, a vertical orientation strong magnetic dielectric protective layer and a protective layer sequentially stacked, wherein the substrate is a single crystal, polycrystal or amorphous base plate; the buffering layer is made of inorganic nonmetal nitride ceramic with a hexagonal crystal structure; the vertical orientation strong magnetic dielectric protective layer is a samarium-cobalt diaphragm, an aluminum-nickel-cobalt diaphragm, an iron-platinum diaphragm, an iron-palladium nitride, a cobalt-platinum diaphragm or a cobalt-palladium diaphragm; the protective layer is made of transition metal, nitride diaphragm material or oxide diaphragm material. The vertical orientation strong magnetic dielectric film and the preparation method thereof provided by the invention have the advantages of being small in volume, vertical in magnetization direction, small in size of grains serving as a storage unit, large in coercivity and high in stability, and is simple in production technology and wider in application range.

Description

technical field [0001] The invention relates to a ferromagnetic medium film, in particular to a vertically oriented ferromagnetic medium film and a preparation method thereof. Background technique [0002] Materials with high magnetocrystalline anisotropy have the function of mutual conversion between mechanical energy and electromagnetic energy. Using its energy conversion function and various physical effects of magnetism, such as magnetic resonance effect, magnetomechanical effect, magnetochemical effect, magnetic biological effect, magnetoresistance effect, Hall effect, etc., high magnetic crystal anisotropy materials can be made into Various forms of functional devices. These functional devices have become the core functional devices in high-tech fields such as computers, communication networks, aerospace, transportation, home appliances and information records. [0003] In the field of information storage, increasing the density of perpendicular magnetic recording me...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01F10/14H01F10/16H01F10/28H01F10/30H01F41/14H01F41/18H01F41/20H01F41/22
CPCH01F10/14H01F10/16H01F10/28H01F10/30H01F41/14H01F41/18H01F41/20H01F41/205H01F41/22
Inventor 崔伟斌王强张同博钟辉周小倩付艳请于德东
Owner NORTHEASTERN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products