A method for improving the optical properties of silica through surface crystallization

Abstract

A method for improving the silicon dioxide optical property through surface crystallization comprises following steps: firstly, a silicon wafer is evenly coated with chemically-modified colloidal silica sol particles; secondly, the silicon wafer, coated with the silicon dioxide, in the first step is subject to high-pressure inert gas heat treatment in a furnace, the heat treatment temperature ranges from 100 DEG C to 1800 DEG C, the gas pressure ranges from 0.1 MPa to 6 MPa, the heat treatment time ranges from 1 h to 10 h, and a uniform silicon dioxide film layer with the particle surface partly crystallized is obtained. The optical property of the silicon dioxide film layer subject to high-pressure inert atmosphere rapid temperature increasing and decreasing heat treatment is improved, the refractive index is improved, and is continuously adjusted, the film layer can serve as an ideal material of a solar cell gradient refractive index antireflection layer, and the film layer is simple in preparing process, low in raw material cost and beneficial to large-scale industrial production.

Description

technical field [0001] The invention belongs to the field of inorganic non-metallic materials, and specifically relates to a method for improving the optical properties of a silicon dioxide film layer through surface crystallization, in particular to a process for promoting the surface crystallization of silicon dioxide particles through rapid heating and cooling in a high-pressure inert atmosphere. Background technique [0002] Solar energy is by far the cleanest and most sustainable energy source. In 2015, the newly installed capacity of photovoltaics in the world reached 36GW, and it will continue to increase in the next few years. By then, photovoltaic power generation will largely solve the world's energy shortage problem. [0003] For high-efficiency solar cells, the light absorption process is the key first step in photoelectric conversion, which directly affects the efficiency of photoelectric conversion. Therefore, increasing light absorption and reducing light ref...

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Problems solved by technology

[0006] In 2007, Xi.J.Q. et al. prepared five layers of nano-microstructure anti-reflection coatings with gradient refractive index distribution on Si wafers by using inclined vapor deposition technology, and achieved very good gradient refractive index broadband anti-reflection. It is hoped that this excellent The technology can be applied to the anti-reflection of crystalline Si solar cells in the future, but this technology has strict requirements on equipment, high cost, and it is difficult to realize industrial production

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