Perovskite-type lanthanum-titanium oxynitride semiconductor photocatalyst and its preparation and application

A technology of nitrogen oxide and perovskite type, applied in the field of perovskite type lanthanum titanium nitride oxide semiconductor photocatalyst and its preparation, to achieve the effect of realizing photocatalytic activity, improving photocatalytic activity and increasing defect concentration

Active Publication Date: 2020-01-17
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] For La 2 TiO 5 Preparation of LaTiO as a precursor 2 The problem of the lower activity of the catalytic oxidation of N to produce oxygen in water, the present invention provides a method based on La 2 TiO 5 A method of obtaining a semiconductor catalyst as a precursor, which includes an activation step, so that La 2 TiO 5 After nitriding as a precursor, the semiconductor catalyst obtained by annealing and activating in an inert atmosphere has a remarkable effect of catalytic oxidation of water and oxygen generation, and can be compared with La 2 Ti 2 o 7 LaTiO obtained as a precursor 2 The effect of N catalyst is the same or higher, and the defect concentration can be easily adjusted by changing the annealing parameters to realize the optimization of photocatalytic activity

Method used

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  • Perovskite-type lanthanum-titanium oxynitride semiconductor photocatalyst and its preparation and application
  • Perovskite-type lanthanum-titanium oxynitride semiconductor photocatalyst and its preparation and application
  • Perovskite-type lanthanum-titanium oxynitride semiconductor photocatalyst and its preparation and application

Examples

Experimental program
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Effect test

Embodiment 1

[0027] La 2 TiO 5 It is stored in a corundum boat, sealed in a horizontal tube furnace, and after the air is exhausted, it is fed into NH 3 , keep NH 3 The flow rate is 1.25 standard liters per minute per gram of precursor, the temperature is raised to 975°C at a rate of 5°C / min, kept for 15 hours, and the temperature is naturally cooled to 60°C and taken out. The product was washed with 0.01mol / L sulfuric acid, filtered and washed with water, and dried to obtain LaTiO 2 N.

[0028] As a comparison, take La 2 Ti 2 o 7 Prepare LaTiO as the raw material with the above operation 2 N.

Embodiment 2

[0030] to La 2 TiO 5 LaTiO prepared as precursor 2 N (see Example 1) was filled in a corundum boat, sealed in a horizontal tube furnace, exhausted, replaced by Ar 3 times, passed through Ar, heated to 675 °C at a rate of 5 °C / min, kept for 60 minutes, and naturally cooled to 50 °C take out.

Embodiment 3

[0032] Same as Example 2, the Ar atmosphere heat treatment temperature was changed to 700°C.

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Abstract

Take La 2 TiO 5 As a single precursor, thermal ammonolytic nitridation was performed in a high temperature ammonia atmosphere to prepare LaTiO with absorption band edges around 600 nm without defects detectable by EPR and UV‑Vis‑NIR spectroscopy 2 N semiconductor, annealed in inert atmosphere to obtain LaTiO with adjustable defect concentration 2 N, increasing LaTiO 2 N photocatalytic activity. or with La 2 Ti 2 O 7 As a single precursor, thermal ammonolysis nitridation under high temperature ammonia atmosphere to prepare LaTiO with defects 2 N semiconductor, inert atmosphere annealing treatment further increases defect concentration and improves LaTiO 2 N photocatalytic activity. In this method, La 2 TiO 5 As a precursor, it can effectively inhibit the reduction of Ti in the high-temperature nitridation process, inhibit the formation of low-valent Ti defects or impurity phases, and provide a comprehensive basis for the regulation of defect concentration; simple inert atmosphere annealing is used to form anion vacancy defects, and by changing the annealing process, anion vacancy defects are formed. The parameters can easily adjust the defect concentration to realize the optimization of photocatalytic activity.

Description

technical field [0001] The invention relates to a perovskite type lanthanum titanium nitride oxide semiconductor photocatalyst, a preparation method and application thereof. Background technique [0002] TiO 2 N is a metal oxynitride semiconductor with a perovskite crystal structure. Its forbidden band width is 2.1eV, the absorption edge reaches 600nm, and it has a wide range of visible light response (J. Phys. Chem. A 2002, 106, 6750-6753). TiO 2 As a light-absorbing active semiconductor material, N is excited by light to generate electrons and holes, which can be used to drive the oxidation of water to produce oxygen and reduce to produce H 2 and other chemical reactions (J.Phys.Chem.B 2003, 107, 791-797; J.Am.Chem.Soc., 2012, 134, 8348–8351; Chem.Sci., 2013, 4, 1120–1124; Nano Energy, 2015, 12, 775–784). It has very attractive potential applications in the application of photocatalysis, photoelectrocatalysis and other methods for absorbing and converting solar energy...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/24C01B13/02
Inventor 杨明辉熊锋强万里鹏李悦焦雨桐
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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