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Process method for modifying preservative treatment material based on nanometer silicon dioxide and emulsified wax

A technology of nano-silica and process methods, applied in wood treatment, pretreatment equipment, wood processing appliances, etc., to achieve the effects of simple treatment process, improved flame retardancy and weather resistance, and low cost

Inactive Publication Date: 2018-05-15
TIANJIN UNIVERSITY OF SCIENCE AND TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are few reports on improving the photodegradation resistance of anti-corrosion treated materials at home and abroad.

Method used

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  • Process method for modifying preservative treatment material based on nanometer silicon dioxide and emulsified wax
  • Process method for modifying preservative treatment material based on nanometer silicon dioxide and emulsified wax
  • Process method for modifying preservative treatment material based on nanometer silicon dioxide and emulsified wax

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] First of all, pre-treatment: after peeling and sawing the southern pine into required size specifications, dry it at 40°C and 40% relative humidity for 24 hours to control the moisture content of the wood to 8-10%.

[0029] Secondly, prepare nano-silica modifier: sodium hexametaphosphate (SHMP), trisodium phosphate (TSP), disodium ethylenediaminetetraacetic acid (EDTA-2Na), sodium polyphosphate and Dissolve 3 parts by mass of sodium pyrophosphate (TSPP) in 500 parts by mass of distilled water under the action of a magnetic stirrer, then add 1 part by mass of nano-silica, stir at 200r / min for 60min, and then disperse by ultrasonic at 20°C After 60 minutes, the nano-silicon dioxide modifier used was prepared, and the particle diameter of the nano-silicon dioxide was 20nm.

[0030] Again, prepare emulsified wax / amine-dissolved quaternary ammonium copper (ACQ) preservative modified solution: 2 mass parts of emulsified wax solution are dissolved in 800 mass parts of ACQ pres...

Embodiment 2

[0040] First of all, pre-treatment: Peel the Pinus sylvestris sylvestris, saw and cut it into the required size specifications, then dry it at 50°C and 50% relative humidity for 12 hours, and control the moisture content of the wood to 8-10%;

[0041] Secondly, prepare nano-silica modifier: sodium hexametaphosphate (SHMP), trisodium phosphate (TSP), disodium ethylenediaminetetraacetic acid (EDTA-2Na), sodium polyphosphate and Dissolve 6 parts by mass of sodium pyrophosphate (TSPP) in 600 parts by mass of distilled water under the action of a magnetic stirrer, then add 3 parts by mass of nano-silica, stir at 220r / min for 90min, and then disperse by ultrasonic at 40°C 15min, the nano-silicon dioxide modifier used is prepared, and the particle diameter of the nano-silicon dioxide is 30nm;

[0042] Again, prepare emulsified wax / preservative modified solution: 4 mass parts of emulsified wax solution are dissolved in 900 mass parts of amine-dissolved quaternary ammonium copper (ACQ) p...

Embodiment 3

[0054] First of all, pre-treatment: after peeling and sawing the Chinese fir to the required size, dry it for 8 hours at 60°C and 60% relative humidity to control the moisture content of the wood to 8-10%;

[0055] Secondly, prepare nano-silica modifier: sodium hexametaphosphate (SHMP), trisodium phosphate (TSP), disodium ethylenediaminetetraacetic acid (EDTA-2Na), sodium polyphosphate and Dissolve 10 parts by mass of sodium pyrophosphate (TSPP) in 600 parts by mass of distilled water under the action of a magnetic stirrer, then add 2 parts by mass of nano-silica, stir at 300r / min for 150min, and then disperse by ultrasonic at 50°C 40min, the nano-silicon dioxide modifier used is prepared, and the particle diameter of the nano-silicon dioxide is 40nm;

[0056] Again, prepare emulsified wax / preservative modified solution: 6 parts by mass of emulsified wax solution are dissolved in 1000 parts by mass of copper azole (CA) preservative solution, and stirred for 30 min with a rotat...

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Abstract

The invention relates to the technical field of preservative treatment material production, and discloses a process method for modifying preservative treatment material based on nanometer silicon dioxide and emulsified wax. The process method mainly comprises the following steps of firstly, performing pretreatment, secondly, preparing a nanometer silicon dioxide modifier, next, preparing emulsified wax or preservative modification liquid, then carrying out three-time dipping treatment, and finally drying. According to the process method for modifying the preservative treatment material based on the nanometer silicon dioxide and the emulsified wax, the preservative treatment material has no obvious appearance change after being subjected to the treatment, however, size stability, density, surface hardness, anti-loss performance, fire resistance and weather resistance of the preservative treatment material are greatly improved.

Description

technical field [0001] The invention relates to the technical field of production of anti-corrosion treatment materials, in particular to a process method for modifying anti-corrosion treatment materials based on nano silicon dioxide and emulsified wax. Background technique [0002] Wood preservative treatment is an effective way to save wood and prolong its service life. At present, water-borne anti-corrosion treatment materials are more and more widely used in my country, but their photodegradation resistance and hydrophobicity are poor, resulting in great loss during outdoor use. Looking at the research results in recent years, it can be found that the research on anti-corrosion treatment materials mainly focuses on the research and development of hydrophobic agents. However, only applying hydrophobic agents to wood preservatives alone can improve some physical properties of treated materials, such as reducing The degree of cracking and warping of treated materials when ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B27K3/02B27K3/00B27K3/52B27K3/08B27K5/04B27K3/50
CPCB27K3/0214B27K3/007B27K3/02B27K3/08B27K3/50B27K3/52B27K5/04B27K2240/00B27K2240/20B27K2240/30
Inventor 于丽丽马晓军朱礼智杨红梅朱俊艳刘辛燕孙光瑞
Owner TIANJIN UNIVERSITY OF SCIENCE AND TECHNOLOGY
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