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PAG (photoacid generator) as well as preparation method and application thereof

A technology of photoacid generator and acid activity, which is applied in the field of materials and can solve the problems of low diffusion efficiency of acid produced by quantum efficiency

Active Publication Date: 2018-06-19
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Traditional polymerizable PAG, because its active unit positions are randomly distributed on the polymer main chain, it is easy to be wrapped by polymer chains, so its quantum efficiency and acid diffusion efficiency are relatively low

Method used

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  • PAG (photoacid generator) as well as preparation method and application thereof
  • PAG (photoacid generator) as well as preparation method and application thereof
  • PAG (photoacid generator) as well as preparation method and application thereof

Examples

Experimental program
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preparation example Construction

[0104] The present invention also provides a method for preparing the photoacid generator, comprising the steps of:

[0105] In an inert solvent, the polymer skeleton compound A is reacted with a covalently bonded precursor of an acid-generating active group, thereby forming the photoacid generator:

[0106] The covalently bonded precursor of polymer skeleton compound A+acid-generating active group→photoacid generator.

[0107] In the present invention, a polymer backbone with controllable structure and molecular weight is prepared by living polymerization, and its terminal reaction site is used to connect with various photoacid generators containing bonding sites, so as to obtain terminal photoacid generators. Reagent-terminated polymer photoacid generator.

[0108] application

[0109] The present invention also provides a composite material, which contains or consists of the photoacid generator.

[0110] In another preferred example, the composite material is photoresist...

Embodiment 1

[0121] Embodiment 1 prepares photoacid generator 1

[0122] Preparation of PMMA-Br:

[0123] Add 0.08 mmol of methyl bromophenylacetate and 0.04 mmol of CuBr to a 25 ml test tube, freeze-thaw and degas three times, and finally protect with argon. Then, 24 mmol of MMA and 0.04 mmol of pentamethyldiethylenetriamine were added to another test tube, and transferred to the aforementioned argon-protected test tube after two freeze-thaw degassing cycles. The temperature of the reaction system was raised to 90°C and kept for 4 hours. After the reaction, the rubber stopper was opened, and the system was cooled to room temperature. The reaction solution was diluted with tetrahydrofuran and passed through a neutral alumina column. The obtained polymer was repeatedly dissolved and precipitated with tetrahydrofuran and n-hexane three times. After filtering and drying, a white powdery PMMA-Br polymer can be obtained.

[0124] Preparation of capped intermediate 1:

[0125] To Eaton's r...

Embodiment 2

[0131] Embodiment 2 prepares photoresist 1

[0132] Using the photoacid generator 1 obtained in Example 1, a photoresist 1 was prepared according to a conventional method, wherein in the photoresist 1, the weight content of the photoacid generator 1 was 20 wt%.

[0133] It is determined that the roughness of the lines obtained by photolithography of the photoresist 1 is ≤4%.

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PUM

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Abstract

The invention relates to a PAG (photoacid generator) as well as a preparation method and an application thereof and particularly discloses the PAG. The PAG contains a polymeric scaffold as well as acid producing active groups binding to the polymeric scaffold, wherein in the PAG, 50wt%-100wt% of the acid producing active groups are located at the terminal of the polymeric scaffold. The invention further discloses the preparation method and the application of the PAG. The PAG adopts the polymeric scaffold and the acid producing active groups are basically located at the terminal of the polymeric scaffold, so that the PAG has the advantages of high quantum efficiency, high acid production efficiency, low diffusion and low decomposition product volatility.

Description

technical field [0001] The invention relates to the field of materials, in particular to a photoacid generator and its preparation method and application. Background technique [0002] Photoresist is a multi-component mixture that can change solubility after being illuminated with a specific wavelength. One of the exposed and unexposed parts is easily removed by the developer, exposing the surface that needs to be further etched or modified. Chemically amplified photoresist (CAR), which contains a substance capable of photolysis and acid generation - photoacid generator (PAG). One important class is the onium salt. After being illuminated, iodonium or sulfonium ions are degraded, and the anion part obtains protons to form an acid, which catalyzes the decomposition of the enester structure in the photoresist. [0003] Photoacid generator is the most important component of photoresist besides photosensitive resin. The design of photoresist is inseparable from the design and...

Claims

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Application Information

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IPC IPC(8): C08F8/34C08F120/14G03F7/004
CPCG03F7/004C08F8/34C08F120/14
Inventor 邓海彭彧
Owner FUDAN UNIV