High performance organic transistor photodetector based on bulk heterojunction-layered structure
A photodetector, organic transistor technology, applied in photovoltaic power generation, semiconductor devices, electro-solid devices, etc., can solve the problems of OPTs photocurrent drop, inability to achieve efficient transport, hole transport obstacles, etc., to improve light detection. Sensitivity, reduce the probability of recombination, and ensure the effect of efficient transmission
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[0048] The present invention also provides a method for preparing a high-performance organic transistor photodetector, comprising the following steps:
[0049] 1) Prepare the gate and gate dielectric layers sequentially on the substrate, place the substrate in acetone, isopropanol or ethanol, and deionized water in order to ultrasonically clean the substrate for 10 minutes, and clean the substrate with N 2 gun dry;
[0050] 2) Subject the substrate to UV / ozone or O 2 plasma treatment;
[0051] 3) Perform surface monomolecular layer self-assembly processing on the gate dielectric layer to generate a monomolecular self-assembly layer;
[0052] 4) Depositing a channel semiconductor layer on the monomolecular self-assembled layer;
[0053] 5) forming a charge transport layer on the channel semiconductor layer;
[0054] 6) Vacuum-evaporating a source electrode and a drain electrode on both sides of the charge transport layer, wherein a channel region is formed between the sourc...
Embodiment 1
[0057] This embodiment is used to illustrate the high-performance organic transistor ultraviolet photodetector provided by the present invention and its preparation method.
[0058] In this embodiment, a silicon wafer is used as the substrate, C8-BTBT is used as the organic semiconductor material, and MoO 3 As a charge transport layer, PC 61 BM is used as the charge acceptor material, Au is used as the source and drain electrodes, and the photodetector prepared is an ultraviolet photodetector. The silicon wafer used is heavily doped p-type Si as the gate and a layer of thermally oxidized SiO with a thickness of 200nm on the surface 2 as a gate dielectric.
[0059] A method for preparing a high-performance organic transistor ultraviolet photodetector based on a bulk heterojunction-layered structure, comprising the following steps:
[0060] (1) Place the silicon substrate successively in acetone, isopropanol, and deionized water for 10 min, and use N 2 The gun is blown dry, ...
Embodiment 2
[0079] This embodiment is used to illustrate the high-performance organic transistor ultraviolet photodetector provided by the present invention and its preparation method.
[0080] In this embodiment, a silicon wafer is used as the substrate, C8-BTBT is used as the organic semiconductor material, and MoO3 As a charge transport layer, PC 61 BM is used as the charge acceptor material, Au is used as the source and drain electrodes, and the photodetector prepared is an ultraviolet photodetector. The silicon wafer used is heavily doped p-type Si as the gate and a layer of thermally oxidized SiO with a thickness of 200nm on the surface 2 as a gate dielectric.
[0081] A method for preparing a high-performance organic transistor ultraviolet photodetector based on a bulk heterojunction-layered structure, comprising the following steps:
[0082] (1) Place the silicon substrate successively in acetone, isopropanol, and deionized water for 10 min, and use N 2 The gun is blown dry, an...
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Abstract
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