Preparation method of ruthenium/boron carbide multilayer film mirror for monochromator

Abstract

The invention relates to a preparation method of a ruthenium / boron carbide multilayer film reflector for a monochromator. The preparation method comprises the following steps that a base is placed ona sample frame in a sputtering film-coating cavity, and the sputtering film-coating cavity is vacuumized to form a sputtering film-coating vacuum cavity; the sputtering film-coating vacuum cavity is filled with mixed gas, the mixed gas is formed by mixing argon and nitrogen, the mixing proportion range of the mixed gas is 16%-30%, and the mixing proportion refers to the percentage of the nitrogenpartial pressure accounting for the total pressure intensity of the mixed gas; pre-sputtering of a ruthenium target material and a boron carbide target material are executed; and coating preparation of the ruthenium / boron carbide multilayer film reflector with an alternating ruthenium film layer and boron carbide film layer. Compared with the prior art, the stress of a ruthenium / boron carbide multilayer film prepared through the preparation method is greatly reduced, and the reflectivity is not decreased; and the method is high in process repeatability and controllability, and the preparationmethod has important application in the fields of high-throughput multilayer film monochromators and corresponding X-ray optical instruments.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and in particular relates to a method for preparing a ruthenium / boron carbide multilayer film reflector for a monochromator. Background technique [0002] Monochromators are central components in fields such as X-ray imaging and spectroscopy. In order to meet the relevant experimental requirements in fields such as high-sensitivity X-ray imaging and spectroscopy, the development of monochromators with high-throughput performance is required. Compared with crystal monochromator and grating monochromator, multilayer film monochromator has two advantages. First, by changing the periodic thickness of the multilayer film, the multilayer film can be applied to a wide band; second, the reflectivity of the multilayer monochromator is high and the integrated luminous flux is large (the ratio of the multilayer monochromator to The spectral bandwidth of the crystal monochromator is 2 orders of ...

AI Technical Summary

Problems solved by technology

Larger film layer stress will cause two serious effects on the film. First, it will lead to cracking, separation or shedding of the film layer, which will affect the microstructure of the film material and reduce the actual optical performance of the film; Existence affects the bonding degree of the film and the substrate material, and the stress acting on the substrate will cause the deformation of the substrate surface shape, increase the surface shape error of the optical element, affect the shape of the incident wavefront, and seriously reduce the actual reflection of the multilayer monochromator High efficiency and light transmission efficiency greatly shorten its service life, which hinders the application of thin films in actual production

At present, there is no international research on how to reduce the film stress of ruthenium / boron carbide multilayer films

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