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Preparation method of oil-removing surface membrane base material

A film substrate and oil surface technology, which is applied in the field of daily chemical materials, can solve the problems of poor oil removal effect, liquid absorption effect and mechanical properties, and achieve improved oil removal effect, improved mechanical properties, and good adsorption performance Effect

Inactive Publication Date: 2018-10-23
高昕文
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main technical problem to be solved by the present invention is to provide a method for preparing an oil-removing mask base material in view of the disadvantages of traditional mask base material such as poor degreasing effect, liquid absorption effect and poor mechanical properties.

Method used

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  • Preparation method of oil-removing surface membrane base material

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example 1

[0022]Mix graphene oxide and water at a mass ratio of 1:300, and ultrasonically disperse them for min at a frequency of 55 kHz to obtain a graphene oxide solution; mix 2-(N-morphine)ethanesulfonic acid and ultrapure water by mass ratio Mix at 1:15, and adjust the pH of the mixture of 2-(N-morphine)ethanesulfonic acid and ultrapure water to 7.6 with 8% ammonia water to obtain 2-(N-morphine)ethanesulfonic acid buffer; -(N-morphine) ethanesulfonic acid buffer and carbon nanotubes were mixed in a beaker at a mass ratio of 800:1, and after ultrasonic dispersion for 30min at a frequency of 55kHz, 2-(N-morphine) was added to the beaker first. The carbodiimide hydrochloride with 0.2 times the mass of the ethanesulfonic acid buffer was stirred and mixed for 20 min at a temperature of 40 °C and a rotation speed of 400 r / min, and then added 2-(N-morphine) ethanesulfonic acid to the beaker. The N-hydroxysuccinimide with 0.10 times the mass of the acid buffer is stirred and mixed for 40 mi...

example 2

[0024] Mix graphene oxide and water at a mass ratio of 1:300, and ultrasonically disperse them for min at a frequency of 55 kHz to obtain a graphene oxide solution; mix 2-(N-morphine)ethanesulfonic acid and ultrapure water by mass ratio Mix at 1:15, and adjust the pH of the mixture of 2-(N-morphine)ethanesulfonic acid and ultrapure water to 7.6 with 8% ammonia water to obtain 2-(N-morphine)ethanesulfonic acid buffer; -(N-morphine) ethanesulfonic acid buffer and carbon nanotubes were mixed in a beaker at a mass ratio of 800:1, and after ultrasonic dispersion for 30min at a frequency of 55kHz, 2-(N-morphine) was added to the beaker first. The carbodiimide hydrochloride with 0.2 times the mass of the ethanesulfonic acid buffer was stirred and mixed for 20 min at a temperature of 40 °C and a rotation speed of 400 r / min, and then added 2-(N-morphine) ethanesulfonic acid to the beaker. N-hydroxysuccinimide with a mass of 0.10 times the acid buffer solution was stirred and mixed for ...

example 3

[0026] Mix graphene oxide and water at a mass ratio of 1:300, and ultrasonically disperse them for min at a frequency of 55 kHz to obtain a graphene oxide solution; mix 2-(N-morphine)ethanesulfonic acid and ultrapure water by mass ratio Mix at 1:15, and adjust the pH of the mixture of 2-(N-morphine)ethanesulfonic acid and ultrapure water to 7.6 with 8% ammonia water to obtain 2-(N-morphine)ethanesulfonic acid buffer; -(N-morphine) ethanesulfonic acid buffer and carbon nanotubes were mixed in a beaker at a mass ratio of 800:1, and after ultrasonic dispersion for 30min at a frequency of 55kHz, 2-(N-morphine) was added to the beaker first. The carbodiimide hydrochloride with 0.2 times the mass of the ethanesulfonic acid buffer was stirred and mixed for 20 min at a temperature of 40 °C and a rotation speed of 400 r / min, and then added 2-(N-morphine) ethanesulfonic acid to the beaker. The N-hydroxysuccinimide with 0.10 times the mass of the acid buffer is stirred and mixed for 40 m...

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Abstract

The invention discloses a preparation method of an oil-removing surface membrane base material, and belongs to the technical field of daily-use chemical materials. The preparation method comprises thesteps of mixing acetobacter xylinum and a culture medium according to the mass ratio being 1:1000 to 1:1500 in a sterilizing mold, adding a pretreatment additive with the mass being 20 to 50 times ofthe acetobacter xylinum into the sterilizing mold, stirring and mixing for 30 to 50min at the temperature of 30 to 40 DEG C and at the rotating speed of 200 to 350r / min, culturing for 5 to 6 days atthe constant temperature of 35 DEG C, removing a membrane, and obtaining a pretreated surface membrane base material; washing the pretreated surface membrane base material for 2 to 3 times through a dodecyl dimethyl benzyl ammonium chloride solution with the mass fraction being 3 to 5 percent, washing through deionized water for 8 to 10 times, and obtaining a pretreated oil-removing surface membrane base material; drying the pretreated oil-removing surface membrane base material for 1 to 2 hours at the temperature being 40 to 45 DEG C, and obtaining the oil-removing surface membrane base material.

Description

technical field [0001] The invention discloses a preparation method of a base material for a degreasing mask, belonging to the technical field of daily chemical materials. Background technique [0002] Mask products have special effects such as eliminating fatigue and relieving stress, and are an important application field of modern textile materials. Mask products include disposable mask, washable mask cream, mask powder and other products in different shapes, and their functions cover nutrition, anti-wrinkle, freezing, sun protection, freckle removal, fat removal, acne removal, whitening, etc. Based on its easy-to-use characteristics, facial mask products that use spunlace non-woven fabrics as substrates to load essence are the mainstream products in the facial mask industry. At present, the variety of facial masks on the market has increased sharply, and they are generally divided into peeling (film) facial masks, powder facial masks, clay facial masks, foam facial ...

Claims

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Application Information

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IPC IPC(8): A61K8/19A61K8/66A61K8/41A61K8/02A61Q19/00
CPCA61K8/19A61K8/0212A61K8/41A61K8/66A61K2800/413A61Q19/008
Inventor 高昕文刘侠宋宇星
Owner 高昕文