Cleaning method of semi-finished product tantalum thread in tantalum target production process

A technology of production process and semi-finished products, which is applied in the cleaning field of semi-finished tantalum threads in the production process of tantalum targets. It can solve the problems of slow reaction speed, affecting the welding yield of tantalum targets, and high bit error rate, so as to achieve mild operating conditions and improve follow-up The effect of using performance and reducing bit error rate

Inactive Publication Date: 2018-11-16
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

One of the processes in the production process of tantalum targets is tantalum thread cleaning, which will directly affect the welding yield of tantalum targets
However, the existing target production process does not pay attention to the improvement of the performance of the target itself, resulting in high bit error rate and slow response speed in the sputtering process.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] The cleaning method of semi-finished tantalum threads in the production process of tantalum targets includes the following steps:

[0047] 1) Inject water into the ultrasonic wave to the specification line, put the tantalum threaded product into the ultrasonic machine and vibrate for 5 minutes;

[0048] 2) After shaking for 5 minutes, take out the product in the ultrasonic wave, put it in the designated position, and apply 200-300ml of detergent evenly on the surface of the product;

[0049] 3) Use a brush to repeatedly brush 3-4 times from the inside to the outside, and then use a high-pressure water gun to rinse;

[0050]4) Put the rinsed product in the designated position, and use an air gun to dry it to remove moisture and achieve the effect of preliminary drying;

[0051] 5) In order to prevent the product from being oxidized in contact with air for a long time, the dried product is quickly put into the dryer for vacuum drying;

[0052] 6) After vacuum drying, ta...

Embodiment 2

[0054] The cleaning method of semi-finished tantalum threads in the production process of tantalum targets includes the following steps:

[0055] 1) Inject water into the ultrasonic wave to the specification line, add 50ml-100ml detergent, preheat to 80°C, put the tantalum threaded product into the ultrasonic wave and vibrate for 10 minutes;

[0056] 2) After vibrating for 10 minutes, take out the product in the ultrasonic wave, put it in the designated position, and apply 200-300ml of detergent evenly on the surface of the product;

[0057] 3) Repeatedly brush 3-4 times from the inside to the outside with a brush, and then rinse with a high-pressure water gun for 40 seconds;

[0058] 4) Put the rinsed product in the designated position, and use an air gun to dry it to remove moisture and achieve the effect of preliminary drying;

[0059] 5) In order to prevent oxidation of tantalum thread products in contact with air for a long time, put the dried products into a dryer for 3...

Embodiment 3

[0062] The cleaning method of semi-finished tantalum threads in the production process of tantalum targets includes the following steps:

[0063] 1) Inject water into the ultrasonic wave to the specification line, add 50ml-100ml detergent, preheat to 90°C, put the tantalum threaded product into the ultrasonic wave and vibrate for 4 minutes;

[0064] 2) After shaking for 4 minutes, take out the product in the ultrasonic wave, put it in the designated position, and apply 200-300ml of detergent evenly on the surface of the product;

[0065] 3) Use a brush to repeatedly brush 3-4 times from the inside to the outside, and then use a high-pressure water gun to rinse for 50 seconds;

[0066] 4) Put the rinsed product in the designated position, and use an air gun to dry it to remove moisture and achieve the effect of preliminary drying;

[0067] 5) In order to prevent oxidation of tantalum thread products in contact with air for a long time, put the dried products into the dryer for...

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PUM

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Abstract

The invention provides a cleaning method of a semi-finished product tantalum thread in a tantalum target production process. The method comprises following steps that firstly, the tantalum thread is subject to ultrasonic treatment for 3 to 10 min, and the surface is painted with a cleaning agent; and secondly, cleaning, blow drying and vacuum drying are carried out. According to the cleaning method, through treatment methods of ultrasonic waves, cleaning, vacuum drying and the like, comprehensive utilization is carried out, operation of the cleaning procedure of the tantalum target in the producing and manufacturing process is subject to fine design, smudge and oil dirt on the surface of the tantalum thread can be removed, the subsequent use of the tantalum target is improved, the reactionspeed of the tantalum target in the sputtering process is improved, the error rate is reduced, efficiency is improved, welding property of the tantalum target is improved, and therefore the cleaningmethod is simple in process, obvious in treatment effect and worth of wide applying and popularizing.

Description

technical field [0001] The invention relates to the field of production and processing of tantalum targets, in particular to a method for cleaning semi-finished tantalum threads in the production process of tantalum targets. Background technique [0002] PVD coating technology refers to the use of physical methods to vaporize the material source-solid or liquid surface into gaseous atoms, molecules or parts of ionization into ions, and through the low-pressure gas (or plasma) process, deposit a certain special function on the surface of the substrate. thin film technology. The main methods of physical vapor deposition are vacuum evaporation, sputtering coating, arc plasma plating, ion coating, and molecular beam epitaxy. Developed to the present, physical vapor deposition technology can not only deposit metal films, alloy films, but also deposit compounds, ceramics, semiconductors, polymer films, etc. The more commonly used method is sputtering coating technology. [0003...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/12B08B3/10B08B3/08B08B3/02B08B1/00C23C14/34F26B7/00
CPCF26B7/00C23C14/3407B08B3/02B08B3/08B08B3/10B08B3/12B08B1/12
Inventor 姚力军潘杰王学泽侯宇
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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