Medical titanium alloy surface composite film as well as preparation method and application thereof
A surface composite and titanium alloy technology, which is applied in the fields of pharmaceutical formula, medical science, metal material coating technology, etc., can solve the problems of interlayer cracking and weak bonding, etc., and achieve the effect of interlayer bonding.
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Embodiment 1
[0029] 1) Clean the titanium alloy substrate with deionized water, dry it and place it in a vacuum chamber, and make the vacuum degree of the vacuum chamber reach 5×10 -3 After Pa, argon gas was introduced, the negative bias voltage was 5600V, and the temperature was 450°C. + Bombardment cleans the substrate surface.
[0030] 2) Deposit TiN transition layer: vacuum degree is 5×10 -3 Pa, at a temperature of 300°C, nitrogen gas with a flow rate of 25mL / min is introduced into the vacuum chamber, and then argon gas with a flow rate of 100mL / min is introduced into the vacuum chamber, the negative bias voltage is 150V, and the pressure in the vacuum chamber is 0.5Pa; pure titanium target is used , the target power is 3kW, the substrate temperature is 220°C, the ion source power is 3kW, and the deposition time is 5min;
[0031] 3) Deposition of Ti 3 N 4 Transition layer: adjust the flow rate of the nitrogen gas fed into the vacuum chamber to 1.33 times the flow rate used in step ...
Embodiment 2
[0036] 1) Clean the titanium alloy substrate with deionized water, dry it and place it in a vacuum chamber, and make the vacuum degree of the vacuum chamber reach 5×10 -3 After Pa, argon gas was introduced, the negative bias voltage was 5600V, and the temperature was 450°C. + Bombardment cleans the substrate surface.
[0037] 2) Deposit TiN transition layer: vacuum degree is 5×10 -3 Pa, at a temperature of 300°C, nitrogen gas with a flow rate of 35mL / min is introduced into the vacuum chamber, and then argon gas with a flow rate of 80mL / min is introduced into the vacuum chamber, the negative bias voltage is 160V, and the pressure in the vacuum chamber is 0.5Pa; the pure titanium target is used , the target power is 2kW, the substrate temperature is 250°C, the ion source power is 3kW, and the deposition time is 15min;
[0038] 3) Deposition of Ti3 N 4 Transition layer: adjust the flow rate of the nitrogen gas fed into the vacuum chamber to 1.33 times the flow rate used in ste...
Embodiment 3
[0043] 1) Clean the titanium alloy substrate with deionized water, dry it and place it in a vacuum chamber, and make the vacuum degree of the vacuum chamber reach 5×10 -3 After Pa, argon gas was introduced, the negative bias voltage was 5600V, and the temperature was 450°C. + Bombardment cleans the substrate surface.
[0044] 2) Deposit TiN transition layer: vacuum degree is 5×10 -3 Pa, at a temperature of 300°C, nitrogen gas with a flow rate of 50mL / min is introduced into the vacuum chamber, and then argon gas with a flow rate of 60mL / min is introduced into the vacuum chamber, the negative bias voltage is 200V, and the pressure in the vacuum chamber is 1.0Pa; pure titanium target is used , the target power is 2kW, the substrate temperature is 300°C, the ion source power is 3kW, and the deposition time is 30min;
[0045] 3) Deposition of Ti 3 N 4 Transition layer: adjust the flow rate of the nitrogen gas fed into the vacuum chamber to 1.33 times the flow rate used in step ...
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