A method for preparing single-layer multilayer graphene pyroelectric detector by laser ablation
A multi-layer graphene and pyroelectric detector technology, which is applied in the manufacture/processing of thermoelectric devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as complex preparation processes, and achieve simple overall structure and detection spectrum range The effect of wide, unique electrical properties
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Embodiment 1
[0031] like figure 1 shown, the graphene monolayer multilayer pyroelectric detector fabricated by laser ablation, refer to Figure 2-4 , the preparation steps of the thermoelectric device are: growing an insulating medium layer 2 on the substrate material 1, transferring a multilayer graphene layer 3 on the insulating medium layer 2, and carrying out laser direct writing burning on the multilayer graphene layer 3 After the ablation, the multi-layer graphene layer 3 becomes a single-layer graphene layer 4.
[0032] A first metal electrode 5 is deposited on one end of the multi-layer graphene layer 3 that has not been ablated, and a second metal electrode is deposited on one end of the thin film from the multi-layer graphene layer 3 to the single-layer graphene layer 4 after laser ablation. electrode 6. Based on the characteristics of the multi-layer graphene film being thinned into a single-layer graphene film after laser ablation, a multi-layer-single-layer graphite heterost...
Embodiment 2
[0036] In this embodiment, the substrate material is flexible polyethylene naphthalate, the dielectric layer is a silicon nitride dielectric layer, and the thickness of the silicon nitride dielectric layer is 100 nm; the thickness of the multilayer graphene 3 is 20 nm.
[0037] During preparation, multi-layer graphene was obtained by a standard mechanical lift-off process, and then transferred to the silicon nitride dielectric layer, followed by ablation of the multi-layer graphene layer with a laser energy of 20 mW, and finally, by electron beam evaporation method, respectively. A layer of metal diaphragm is deposited on one end of the multi-layer graphene and one end of the single-layer graphene, and then a first metal electrode and a second metal electrode are formed by a peeling process. In this embodiment, the thickness of the first metal electrode and the second metal electrode are both 100 nm, and the materials are both aluminum. The rest are the same as in Example 1. ...
Embodiment 3
[0039] In this embodiment, the material of the substrate is polyimide, the dielectric layer is an aluminum oxide dielectric layer, and the thickness of the aluminum oxide dielectric layer is 200 nm; a multi-layer two-dimensional material layer is transferred on the dielectric layer, and the two-dimensional material The layer is a multilayer molybdenum disulfide film, and the thickness of the molybdenum disulfide layer is 16 nm.
[0040] During the preparation, the multilayer molybdenum disulfide thin film was prepared by a high temperature vacuum synthesis method, and then transferred to the alumina dielectric layer, and then the multilayer molybdenum disulfide thin film was irradiated by a laser, and the laser energy was 10 mW. Finally, a metal diaphragm is deposited on one end of the multi-layer molybdenum disulfide film 3 that has not been ablated and the single-layer molybdenum disulfide film that has been ablated by a thermal evaporation method, and then a first metal film...
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