Low-ESR cathode of tantalum electrolytic capacitor and preparation method for cathode
A technology for tantalum electrolytic capacitors and cathodes, which is applied to the cathode of low-ESR tantalum electrolytic capacitors and its preparation field. It can solve the problems of low filling rate, large bubbles, large ESR, etc., and achieve the effect of improving electrical performance
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[0023] The invention relates to a method for preparing a cathode of a low-ESR tantalum electrolytic capacitor, which comprises preparing a manganese dioxide layer on the surface of a tantalum block with a dielectric oxide film, and after the manganese dioxide layer is prepared on the surface of the tantalum block, the manganese dioxide After the surface of the layer is coated with a graphite layer and a silver paste layer, the finished cathode of the ESR tantalum electrolytic capacitor is obtained. The graphite layer, silver paste layer, and process processing are prior art, and will not be repeated here.
[0024] It should be noted that, in a preferred embodiment of the present invention, the tantalum block with a dielectric oxide film is produced by the following method: immerse the tantalum block in a phosphoric acid solution with a mass concentration of phosphoric acid of 0.01% to 0.08%, and apply 45V to Formation voltage of 55V generates Ta 2 o 5 The dielectric oxide fil...
Embodiment 1
[0054] 1) Select a tantalum block with a size of 1.7×3.4×3.5 (mm) to make a 16V47μF tantalum capacitor. After vacuum sintering, apply a formation voltage of 47V to a tantalum block in a phosphoric acid solution with a mass fraction of 0.03% to generate Ta 2 o 5 Dielectric oxide film, after heat treatment at 360°C, the obtained tantalum block with dielectric oxide film is changed from small to large according to the specific gravity, and the specific gravity in the manganese nitrate solution is d=1.07g / cm 3 、d=1.15g / cm 3 、d=1.25g / cm 3 、d=1.35g / cm 3 Immersion in the solution, a total of 12 times of immersion, while each immersion time 6 minutes. After each impregnation, the anode block was taken out and dried in an oven at 85°C for 6 minutes, and then thermally decomposed for 6 minutes at a temperature of 260°C, a water vapor pressure of 0.04MPa, and an oxygen mass percent concentration of 12%. Among them, every 4 times of decomposition, a supplementary forming process is pe...
Embodiment 2
[0063] 1) Select a tantalum block with a size of 3.0×5.2×5.8 (mm) to make a 20V330μF tantalum capacitor. After vacuum sintering, apply a formation voltage of 56V to a tantalum block in a phosphoric acid solution with a mass fraction of 0.03% to generate Ta 2 o 5 Dielectric oxide film, after heat treatment at 360°C, the obtained tantalum block with dielectric oxide film is changed from small to large according to the specific gravity, and the specific gravity in the manganese nitrate solution is d=1.07g / cm 3 、d=1.15g / cm3 、d=1.25g / cm 3 、d=1.35g / cm 3 Immersion in the solution, a total of 12 times of immersion, each immersion for 6 minutes. After each impregnation, take out the anode block and place it in an oven at 85°C to dry for 6 minutes, and then thermally decompose it for 6 minutes at a temperature of 270°C, a water vapor pressure of 0.03MPa, and an oxygen mass percent concentration of 12%. Do a supplementary forming process once at a time.
[0064] 2) Immerse the anode ...
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