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Preparation method and application of silicon carbide-based photocatalyst

A catalyst, silicon carbide technology, applied in the field of visible light photocatalyst preparation, can solve the problems of large-scale industrial application limitation, secondary pollution, etc.

Inactive Publication Date: 2019-03-12
SHANDONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, Cd is a heavy metal, and there is a certain risk of secondary pollution, and Pt is a precious metal, and its large-scale industrial application is subject to certain restrictions.

Method used

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  • Preparation method and application of silicon carbide-based photocatalyst
  • Preparation method and application of silicon carbide-based photocatalyst
  • Preparation method and application of silicon carbide-based photocatalyst

Examples

Experimental program
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Embodiment 1

[0025] (1) Preparation of pure SiC: Put the SiC powder in a muffle furnace, bake it at 700°C for 5 hours, and let it cool down to room temperature naturally to remove impurity carbon; seal it in 2% HF solution and soak it overnight to remove SiO 2 and other oxides; repeated centrifugal washing with deionized water 11 times to pH = 7, placed in a vacuum oven, and vacuum-dried at 60°C;

[0026] (2) MoS 2 Suspension: at room temperature, 0.1741gMoS 2 Place in 100mL deionized water, mix well to get MoS 2 suspension;

[0027] (3) Mixing: at room temperature, to MoS 2 Add 5.0 g of pure SiC, 0.05 g of GO and 2 drops of 1-butyl-3-methylimidole hexafluorophosphate ionic liquid to the suspension in sequence, and stir it ultrasonically for 10 hours to make it evenly mixed;

[0028] (4) Preparation of silicon carbide-based double hydrogen production photocatalytic material by hydrothermal synthesis: put the above ultrasonic solution in a 300mL high-temperature reactor, react at 220°C ...

Embodiment 2

[0030] This embodiment except step (2) MoS 2 0.4590gMoS 2 , others are the same as in Example 1 to obtain SGM-5 photocatalytic material; MoS 2 The mass percentage in the hydrothermal reaction system is 5% (calculated as molybdenum element).

Embodiment 3

[0032] This embodiment except step (2) MoS 2 0.7769g MoS 2 , others are the same as in Example 1 to obtain SGM-8 photocatalytic material; MoS 2 The mass percentage in the hydrothermal reaction system is 8% (calculated as molybdenum element).

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Abstract

The invention discloses a silicon carbide-based double-additive hydrogen producing photocatalyst and a preparation method thereof. The preparation method comprises the following steps of a, performingpretreatment on silicon carbide; b, by taking molybdenum disulfide as a raw material, preparing 8 wt% molybdenum disulfide suspension liquid of a whole hydrothermal reaction system; c, putting 100 mLof 8 wt% molybdenum disulfide suspension liquid in a beaker, sequentially adding silicon carbide (SiC), graphene oxide (GO) and two drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid, and performing ultrasonic stirring to enable the components to be uniformly mixed; and d, transferring the mixture into a high-temperature reaction kettle, performing reaction for 20 h at the temperature of 220 DEG C, then performing centrifugal washing until a pH value is 7, putting the product in a vacuum drying tank, performing vacuum drying for later use, and performing hydro-thermal synthesis to obtain the silicon carbide-based double-additive hydrogen producing photocatalyst. According to the preparation method provided by the invention, for the silicon carbide-based double-additivehydrogen producing photocatalyst prepared by utilizing the synergistic effect of GO-molybdenum disulfide (MoS2) double-additive catalyst, the performance of photocatalytically decomposing water with visible light to produce hydrogen is improved, and a certain foundation can be laid for subsequent efficient application of a visible light catalyst.

Description

technical field [0001] The invention relates to a preparation method of a visible light photocatalyst, in particular to a silicon carbide-based double hydrogen production photocatalyst and a preparation method thereof. Background technique [0002] At present, most of the known hydrogen-producing photocatalysts are based on TiO 2 Based on the modification, it is more in line with the requirements of visible light photocatalytic hydrogen production, and promotes the efficiency of hydrogen production. The catalyst has a certain catalytic effect, but the narrow bandgap semiconductor material is more in line with the requirements of ultraviolet photocatalytic hydrogen production. In view of the good response of SiC to visible light and the positions of its conduction band and valence band fully meet the requirements of photolysis of water, it is used for photocatalytic water splitting to produce hydrogen. However, there are some defects in itself that make it difficult to phot...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J27/224B01J35/10C01B3/04
CPCC01B3/042B01J27/224B01J35/33B01J35/61B01J35/39Y02E60/36
Inventor 张燕张玉琰郦雪李绘吕宪俊陈平胡术刚
Owner SHANDONG UNIV OF SCI & TECH
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