Device and process for absorbing and treating NOx, HF, HCl, caustic soda mist and inert tail gas

Abstract

The invention relates to the technical field of air pollution control and environmental protection, in particular to a device and process for absorbing and treating NOx, HF, HCl, caustic soda mist andinert tail gas, and relates to a device and process for washing,absorbing and adsorbingby three-level step-by-step treatment. Integrated process devices and process methods of added medicaments adsorption, alkali cleaning, packing separation and adsorption are carried out on tail gas exhausted from coal chemical industry, petrochemical industry, and new material industry production systems to meet emission standards of tail gas treatment. The device and process optimize the technological parameters and equipment arrangement of a whole system comprising a reduction washing tower, an alkali washing tower, an adsorption tower and the like of the medicaments, has the characteristics of safety, environmental protection, energy saving and the like compared with the prior art that has the disadvantages of incomplete treatment, high tail gas treatment energy consumption and single process flow, reduces equipment investment, saves power consumption and the like, and can effectively protect environment and prevent the air pollution caused by the emission of NOx, HF, HCl, caustic soda mist and inert tail gas.

Description

technical field [0001] The invention relates to the technical field of air pollutant VOC control and environmental protection, in particular to a device and process for absorbing and treating NOx, HF, HCl, caustic soda mist and inert tail gas. Background technique [0002] As we all know, polycrystalline silicon is the direct raw material for the production of monocrystalline silicon, and is the electronic information basic material for semiconductor devices such as contemporary artificial intelligence, automatic control, information processing, and photoelectric conversion. The NO emitted from the current polycrystalline and monocrystalline silicon production systems x , HF, HCl, caustic soda mist and other VOC exhaust gases, these gases are organic gases harmful to the human body, with complex components, corrosiveness, and serious pollution to the atmosphere. The components of the exhaust gas in this system are complex, and the emission state of the exhaust gas has the ch...

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Problems solved by technology

[0002] As we all know, polycrystalline silicon is the direct raw material for the production of monocrystalline silicon, and is the electronic information basic material for semiconductor devices such as contemporary artificial intelligence, automatic control, information processing, and photoelectric conversion. The NO emitted from the current polycrystalline and monocrystalline silicon production systems x , HF, HCl, caustic soda mist and other VOC exhaust gases, these gases are organic gases harmful to the human body, with complex components, corrosiveness, and serious pollution to the atmosphere

The components of the exhaust gas in this system are complex, and the emission state of the exhaust gas has the characteristics of instability, explosiveness, suddenness, corrosiveness, and large changes in the concentration of the exhaust gas. To achieve the purpose of treatment, such as pure water absorption process method, using pure water for washing and absorption, can absorb part of hydrogen fluoride and hydrogen chloride, but nitrogen oxides and caustic soda cannot be removed; adsorption process, use activated carbon and adsorbent for adsorption treatment, absorb Some hydrogen fluoride, hydrogen chloride, caustic soda, nitrogen oxides and inert gases cannot be removed; therefore, it is imminent to develop an absorption treatment device and process for NOx, HF, HCl, caustic soda mist and inert tail gas

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