Biosensing chip and preparation method and application thereof
A bio-sensing and chip technology, applied in the field of sensors, achieves strong adsorption efficiency, expands application scenarios, and is easy to achieve.
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[0036] Another aspect of the present invention provides a method for preparing the biosensor chip, comprising the steps of:
[0037] S01: Coating a layer of base film on one side of the prism;
[0038] S02: depositing a coupling layer on the base film;
[0039] S03: Finally, deposit a transfer layer on the surface of the coupling layer.
[0040] Specifically, in the step S01, a physical vapor deposition method may be used to vapor-deposit a metal thin film.
[0041] Specifically, in the step S02, a coupling layer may be deposited on the gold film by a plasma-enhanced chemical vapor deposition system.
[0042] Specifically, in the step S03, a transfer layer may be deposited on the surface of the coupling layer by chemical vapor deposition.
[0043] The invention utilizes the ultra-low plasmon loss characteristic of boron nitride to perform prism coupling test on the sensing chip. Since the two-dimensional structure material has the advantages of large surface area and many ...
Embodiment 1
[0045] The embodiment of the present invention provides a biosensor chip and a preparation method thereof.
[0046] The biosensor chip includes:
[0047] 48nm gold base film;
[0048] 450nm silica coupling layer;
[0049] 650nm hexagonal boron nitride thin film is passed to the layer.
[0050] Described preparation method comprises:
[0051] First, a metal film with a thickness of 48nm is evaporated on the SF11 or BK7 prism section by physical vapor deposition method;
[0052] Then silicon dioxide was deposited to a thickness of 450 nm on the gold film by a plasma enhanced chemical vapor deposition (PECVD) system.
[0053] Finally, a hexagonal boron nitride material with a thickness of 650 nm was deposited on the silicon dioxide surface by chemical vapor deposition (Chemical Vapor Deposition, CVD).
[0054] Example 1
[0055] The embodiment of the present invention provides a biosensor chip and a preparation method thereof.
[0056] The biosensor chip includes:
[0057...
Embodiment 2
[0068] The embodiment of the present invention provides a biosensor chip and a preparation method thereof.
[0069] The biosensor chip includes:
[0070] 45nm silver-based film;
[0071] 100nm silicon dioxide coupling layer;
[0072] 800nm hexagonal boron nitride thin film is passed to the layer.
[0073] Described preparation method comprises:
[0074] First, a metal film with a thickness of 40nm is evaporated on the SF11 or BK7 prism section by physical vapor deposition method;
[0075] Silicon dioxide was then deposited on the gold film with a thickness of 100 nm by a plasma enhanced chemical vapor deposition (PECVD) system.
[0076] Finally, a hexagonal boron nitride material with a thickness of 800 nm was deposited on the silicon dioxide surface by chemical vapor deposition (Chemical Vapor Deposition, CVD).
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