Barrier film and preparation method thereof, quantum dot film and preparation method thereof, electronic device

Abstract

The invention discloses a barrier film and a preparation method thereof, a quantum dot film and a preparation method thereof, and an electronic device. Wherein, the barrier film includes a base layer and a network-shaped primer layer arranged on the surface of the base layer. The primer layer forms a plurality of grids with openings, and each grid is filled with a barrier resin for blocking water vapor or oxygen. At least a portion of is not covered by barrier resin. A network-like primer layer is introduced on the base layer of the barrier film, and the barrier resin is filled in the grid formed by the primer layer, so that a barrier layer with alternating peeling force is obtained on the base layer, which greatly improves the peeling of the barrier film strength.

Description

technical field [0001] The present invention relates to quantum dot films and barrier films for quantum dot films. Background technique [0002] The particle size of quantum dots is generally between 1 and 10 nm. Since electrons and holes are quantum-confined, the continuous energy band structure becomes a discrete energy level structure with molecular characteristics, and can emit fluorescence after being excited. Quantum dots have excellent fluorescence characteristics such as wide excitation spectrum and continuous distribution, narrow and symmetrical emission spectrum, adjustable color, high photochemical stability, and long fluorescence lifetime. The size of quantum dots can be controlled by chemical synthesis to obtain spectra of different wavelengths, and the half-peak width can be controlled by controlling the uniformity of particle size to obtain monochromatic light with pure color. [0003] At present, the commercial application of quantum dots is mainly focused o...

AI Technical Summary

Problems solved by technology

However, there are still the following disadvantages in using the inorganic layer as a barrier: (1) In order to ensure the bendability of the barrier film, the inorganic layer is usually controlled below tens of nanometers, resulting in poor barrier effect; (2) using evaporation, magnetron sputtering The inorganic layer is laid by spraying or vacuum chemical deposition, the equipment investment cost is large, the process is relatively complicated, and the manufacturing cost is high; (3) pinholes may appear in the inorganic layer, resulting in poor local barrier properties, which in turn leads to the failure of quantum dots, resulting in Bad points; 4) The selection range of top coating materials with high binding force with inorganic materials is limited, and the adhesion force with most quantum dot glues is poor, so another layer of easy-to-adhesive layer needs to be coated, which increases the cost and leads to production line failure. Yield drops; (5) The traditional barrier film has the hidden danger of poor peel strength. Once the peel strength weakens, water and oxygen may penetrate into the quantum dot layer from the edge, resulting in the failure of the quantum dot and the increase of the invalid side

[0004] In order to overcome the shortcomings of inorganic barrier layers, organic barrier layers are also used to replace inorganic barrier layers in the prior art, but organic barrier layers usually have weak bonding strength with substrates, and organic barrier films also have the potential for easy peeling under high temperature and high humidity conditions. , while affecting the water and oxygen barrier effect of the barrier film, the invalid side of the quantum dot film side increases, which leads to the failure of the quantum dot film

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