Rapid Annealing Method for Fabricating Tunneling Oxygen Passivation Contact Structure
A contact structure, rapid annealing technology, applied in the direction of final product manufacturing, sustainable manufacturing/processing, climate sustainability, etc. The increase of the density of states on the surface of the sheet can improve the carrier migration performance, improve the surface passivation performance, and reduce the annealing time.
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Embodiment 1
[0036] Double-sided n-TOPCon passivation structure: n + poly-Si / SiO 2 / n c-Si / SiO 2 / n + poly-Si. The basic sample preparation process is as follows: silicon wafer RCA cleaning → hot 68% nitric acid growth ultra-thin oxide layer → PECVD double-sided deposition of phosphorus-doped amorphous silicon 100nm each → rapid annealing.
[0037] The rapid annealing process is:
[0038] (1) Place the sample to be annealed in the equipment, and in a nitrogen atmosphere, first raise the temperature to 200°C at a rate of 15°C / s, and keep it warm for 2 minutes;
[0039] (2) Raise the temperature to 500°C at a rate of 30°C / s and keep warm for 5 minutes;
[0040] (3) Raise the temperature to 800°C at a rate of 10°C / s and keep warm for 5 minutes;
[0041] (3) Cool down to 600°C in 2 minutes, and take out the sample.
[0042] Using an optical microscope to observe the surface morphology of the polysilicon film, such as Figure 4 As shown, it is confirmed that the membrane structure is co...
Embodiment 2
[0044] Double-sided n-TOPCon passivation structure: n + poly-Si / SiO 2 / n c-Si / SiO 2 / n + poly-Si. The basic sample preparation process is as follows: silicon wafer RCA cleaning → hot 68% nitric acid growth ultra-thin oxide layer → PECVD double-sided deposition of phosphorus-doped amorphous silicon 100nm each → rapid annealing.
[0045] The rapid annealing process is:
[0046] (1) Place the sample to be annealed in the equipment, and in an argon atmosphere, first raise the temperature to 200°C at a rate of 15°C / s, and keep it warm for 2 minutes;
[0047] (2) Raise the temperature to 300°C at a rate of 30°C / s and keep it warm for 1 minute; then raise the temperature to 400°C at a rate of 30°C / s and keep it warm for 1 minute; then raise the temperature to 500°C at a rate of 30°C / s and keep it warm 1 minute; then raise the temperature to 600°C at a rate of 30°C / s, and hold for 1 minute;
[0048] (3) Raise the temperature to 900°C at a rate of 10°C / s and keep it warm for 2 minu...
Embodiment 3
[0052] Double-sided n-TOPCon passivation structure: n + poly-Si / SiO 2 / n c-Si / SiO 2 / n + poly-Si. The basic sample preparation process is as follows: silicon wafer RCA cleaning → hot 68% nitric acid growth ultra-thin oxide layer → PECVD double-sided deposition of phosphorus-doped amorphous silicon 100nm each → rapid annealing.
[0053] The rapid annealing process is:
[0054] (1) Place the sample to be annealed in the equipment, and raise the temperature to 200°C at a rate of 15°C / s in an atmosphere of nitrogen-hydrogen mixture (hydrogen content 5%), and keep it warm for 2 minutes;
[0055] (2) Raise the temperature to 300°C at a rate of 30°C / s and keep it warm for 1 minute; then raise the temperature to 400°C at a rate of 30°C / s and keep it warm for 1 minute; then raise the temperature to 500°C at a rate of 30°C / s and keep it warm 1 minute; then raise the temperature to 600°C at a rate of 30°C / s, and hold for 1 minute;
[0056] (3) Raise the temperature to 700°C at a r...
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