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Graphene mask fabric and preparation method thereof

A technology of graphene surface and ene mask, which is applied in the direction of chemical instruments and methods, pharmaceutical formulations, rayon manufacturing, etc., can solve the problems of dust, weak adsorption capacity of cosmetics, poor antibacterial effect, etc., to promote cross-linking and reduce barrier , the effect of improving compatibility

Active Publication Date: 2019-10-18
杭州恒邦实业有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is: in order to solve the problem that the current common facial mask base cloth often adopts non-woven fabrics and bamboo charcoal materials, has weak adsorption capacity for dust and cosmetics left on the face, and has poor antibacterial effect, and proposes a graphene facial mask cloth and its preparation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Graphene mask fabric and preparation method thereof
  • Graphene mask fabric and preparation method thereof
  • Graphene mask fabric and preparation method thereof

Examples

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preparation example Construction

[0039] A method for preparing graphene mask cloth includes the following steps:

[0040] (1) Take the corn cob and smash it through a 100 mesh sieve in a pulverizer. The sieved material is collected and added with a mass fraction of 12% sodium carbonate solution at a mass ratio of 1:6~10. Stir at 400~700r / min at 30~45℃ Mix for 30~55min, filter, take the filter cake and wash 2~4 times, take the filter cake according to the mass ratio of 1:7~12, add 15% HCl solution and mix for 30~50min, suction filter, collect the filter residue in a microwave oven Treated with 400W power for 4-7min to obtain the processed material, according to mass parts, take 20-30 parts of processed material and 1~3 parts of FeCl 2 , 1~3 parts FeCl 3 , Mix 2-5 parts of potassium chloride and 150-200 parts of water in the reactor, stir at 40~55℃, 350~550r / min for 1~3h, ultrasonic treatment at 45~55kHz frequency for 12~20min, get ultrasound Treat the material and evaporate under reduced pressure to a constant we...

Embodiment 1

[0050] A method for preparing graphene mask cloth includes the following steps:

[0051] (1) Take the corncob and smash through a 100 mesh sieve in a pulverizer, collect the sieved material and add 12% sodium carbonate solution with a mass fraction of 1:6, stir and mix for 30 minutes at 30°C and 400r / min, filter, and take Wash the filter cake twice with water, take the filter cake and add 15% HCl solution with a mass fraction of 1:7 to mix and stir for 30 minutes, suction filter, collect the filter residue in a microwave oven and treat it with 400W power for 4 minutes to obtain the processed material, calculated by mass parts , Take 20 parts of processed material, 1 part of FeCl 2 , 1 part FeCl 3 , 2 parts of potassium chloride and 150 parts of water are mixed in the reaction kettle, stirred at 40°C at 350r / min for 1h, then ultrasonically treated at 45kHz frequency for 12min to obtain ultrasonic treatment material, and evaporated under reduced pressure to constant weight to obtain...

Embodiment 2

[0061] A method for preparing graphene mask cloth includes the following steps:

[0062] (1) Take the corncob and pulverize it through a 100-mesh sieve in a pulverizer, collect the sieved material and add 12% sodium carbonate solution at a mass ratio of 1:10, stir and mix at 700r / min for 55 minutes at 45°C, filter, and take The filter cake was washed 4 times with water, and the filter cake was added with a mass fraction of 15% HCl solution at a mass ratio of 1:12, mixed and stirred for 50 minutes, suction filtered, and the filter residue was collected in a microwave oven and treated with 400W power for 7 minutes to obtain the processed material, calculated by mass parts , Take 30 parts of processed material, 3 parts of FeCl 2 , 3 parts FeCl 3 , 5 parts of potassium chloride and 200 parts of water are mixed in the reaction kettle, stirred at 55°C at 550r / min for 3h, then ultrasonically treated at 55kHz frequency for 20min to obtain ultrasonic treatment material, and evaporated unde...

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Abstract

The invention discloses a graphene mask fabric and a preparation method thereof, belonging to the technical field of mask base fabrics. The biomass graphene mask fabric prepared by using the preparation method provided by the invention comprises an inner layer, a middle layer and an outer layer, wherein the inner layer is a liquid storage layer; the middle layer is a graphene fiber layer; and theouter layer is an anti-seepage layer. According to the invention, with natural corncob as a raw material, the graphene fiber layer with rich porous structure and ultrahigh adsorption force is preparedby adopting a group coordination and assembly carbon precipitation method; and the anti-seepage layer is constituted by chitosan fiber and polylactic acid. The graphene mask fabric provided by the invention solves the problems of weak adsorption ability to residual dust and cosmetics on a face part and poor bacteriostatic effect for a conventional mask base fabric.

Description

Technical field [0001] The invention belongs to the technical field of mask base cloths, and specifically relates to a graphene mask cloth and a preparation method thereof. Background technique [0002] At present, facial mask is an indispensable skin care and beauty product in people’s lives. It can temporarily isolate the face from external air pollution, promote skin pore expansion, increase skin oxygen content, and make the moisture and other beneficial ingredients in the mask penetrate the skin. The stratum corneum makes the skin moist and elastic. As the carrier of this process, the mask base cloth itself has been paid more and more attention to the functionality of the skin. However, most of the current mask base fabrics only serve as essence carriers, ignoring its functionality. Plant fiber as the base fabric of facial mask is a recent research hotspot in the field of cosmetics. Plant fiber has high conformability and air permeability, and has good toughness and water a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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IPC IPC(8): B32B9/00B32B9/04B32B27/02B32B27/30B32B27/36B32B33/00B32B37/06B32B37/10B32B38/00D01F9/12D01F8/10D01F8/14D01F8/18D01F1/10A61K8/02A61Q19/00
CPCA61K8/0212A61Q19/00B32B5/022B32B5/26B32B33/00B32B37/06B32B37/10B32B38/00B32B2262/106B32B2307/7145B32B2307/7265D01F1/10D01F8/10D01F8/14D01F8/18D01F9/12
Inventor 徐波
Owner 杭州恒邦实业有限公司
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