Composite magnetron sputtering preparation method for AlCrSiN/Mo self-lubricating film

A magnetron sputtering and self-lubricating technology, applied in sputtering plating, ion implantation plating, metal material coating process, etc., can solve the problems of high friction coefficient, difficulty in guaranteeing tool life, workpiece surface quality, and high cutting temperature Problems, achieve high temperature thermal stability, reduce friction coefficient and cutting heat, and achieve good bonding strength

Active Publication Date: 2019-11-15
TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
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  • Description
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  • Application Information

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Problems solved by technology

In the study, it was found that after adding Si element in the Cr-Al-N film, a-Si formed at the grain boundary of the Cr-Al-N solid solution 3 N 4 Phase, thus forming a mosaic composite structure, which has the characteristics of high hardness, high toughness and excellent thermal stability, suitable for the surface of cutting tools, but has the disadvantages of high friction coefficient and high cutting temperature, which makes it difficult to guarantee the life of the tool and the workpiece. Surface Quality

Method used

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  • Composite magnetron sputtering preparation method for AlCrSiN/Mo self-lubricating film
  • Composite magnetron sputtering preparation method for AlCrSiN/Mo self-lubricating film
  • Composite magnetron sputtering preparation method for AlCrSiN/Mo self-lubricating film

Examples

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Embodiment 1

[0039] In this example, the HiPIMS / Pulse DC composite magnetron sputtering system is used to make single crystal tungsten steel sheet (20mm×10mm×1.0mm), SUS304 stainless steel sheet (40mm×40mm×2.0mm) and cemented carbide substrate (35mm×35mm ×4.5mm) deposited AlCrSiN / Mo composite thin film. The film preparation process is as follows:

[0040] (1) All substrates were cleaned with ultrasonic cleaner in acetone and alcohol solution for 30 minutes respectively, and then cleaned with high-purity N 2 Blow dry, and then place it on the rotating rack facing the target in the vacuum chamber. figure 1 It is the target material distribution map of high power pulsed and pulsed DC magnetron sputtering. It can be seen from the figure that the AlCrSi target is loaded on the pulsed DC power supply, and the CrMo target is loaded on the HiPIMS (HighPower Impulse Magnetron Sputtering) high-power pulse power supply.

[0041] The rotational speed of the rotating frame is selected as 2.5r / min, a...

Embodiment 2

[0057] In this example, the HiPIMS / Pulse DC composite magnetron sputtering system was used to make single crystal Si sheets (40mm×40mm×0.67mm), SUS304 stainless steel sheets (40mm×40mm×2.0mm) and cemented carbide substrates (35mm×35mm× 4.5mm) AlCrSiN / Mo composite thin film was deposited on it. The film preparation process is as follows:

[0058] (1) All substrates were cleaned with ultrasonic cleaner in acetone and alcohol solution for 30 minutes respectively, and then cleaned with high-purity N 2 Blow dry, and then place it on the rotating rack facing the target in the vacuum chamber. The CrMo target is loaded on a pulsed DC power supply, and the AlCrSi target is loaded on a HiPIMS (High Power Impulse Magnetron Sputtering) high-power pulse power supply.

[0059] The rotational speed of the rotating frame is selected as 2.5r / min, and the base distances of the targets are 80mm (AlCrSi target) and 280mm (CrMo target) respectively. The working gas and reaction gas in the coati...

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Abstract

The invention discloses a composite magnetron sputtering preparation method for an AlCrSiN / Mo self-lubricating film and belongs to the technical field of film preparation. The AlCrSiN / Mo self-lubricating film is prepared on a base body through a high-power pulse magnetron sputtering technology and a pulse direct current magnetron coating technology. The preparation process comprises the steps thatbias voltage is reduced to -50 V--150 V, N2 flow is 50 sccm-150 sccm, Ar flow is 50 sccm-250 sccm, the total flow of N2 and Ar is 300 sccm, the deposition intensity of pressure is 1.0 Pa-2.5 Pa, theCrMo target sputtering power is 0.1 Kw-0.9 Kw, and the AlCrSi target power is 0.2 kW-1.5 kW. The prepared AlCrSiN / Mo self-lubricating film is high in hardness, good in tenacity and excellent in anti-attrition character, the friction between a cutter and chip can be remarkably reduced, and relatively good chemical stability and a shear susceptible lubrication character are achieved.

Description

technical field [0001] The invention relates to the technical field of film and its preparation, in particular to a compound magnetron sputtering preparation method of an AlCrSiN / Mo self-lubricating film. Background technique [0002] The rapid development of modern manufacturing industry has higher and higher requirements for thin-film cutting tools, while hard thin-film has high hardness and thermal stability, and is widely used in the processing of metal parts and molds. The gradual development of the film from binary to diversified can effectively prolong the service life of cutting tools, especially when the composite film is doped with self-lubricating elements, it can effectively reduce the generation of cutting heat, improve the machining accuracy of the workpiece surface, and then improve the cutting efficiency of the tool . [0003] Under high-speed or dry cutting conditions, the surface of binary TiN and Cr N films is prone to oxidation failure, which limits thei...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/02C23C14/06
CPCC23C14/0036C23C14/022C23C14/024C23C14/0641C23C14/0688C23C14/3485C23C14/352
Inventor 王铁钢蒙德强刘艳梅阎兵尹照星许人仁
Owner TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
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