Preparing method and application of cobalt tantalum zirconium alloy target material

A zirconium alloy and target technology, which is applied to the preparation of cobalt-tantalum-zirconium alloy targets, can solve the problems of coarse grains, uneven texture, substandard magnetic permeability, etc., and achieve uniform internal structure, increased nucleation points, The effect of reducing the anisotropy field and coercivity
CN110735068AActive Publication Date: 2020-01-31CENT SOUTH UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
CENT SOUTH UNIV
Publication Date
2020-01-31

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Abstract

The invention discloses a preparing method and application of a cobalt tantalum zirconium alloy target material, and belongs to the technical field of preparation of special materials. The preparing method comprises the steps of component design, high-vacuum vertical sintering and high-vacuum electron beam melting, three-dimensional isothermal hot forging cogging, angle-varying controlled rollingand the like. In this way, the organization structure of the alloy and the performance of the target material are controlled, and the high-quality cobalt tantalum zirconium alloy target material is prepared. The oxygen content of the cobalt tantalum zirconium alloy target material is smaller than or equal to 15 ppm, the average grain size of the cobalt tantalum zirconium alloy target material is 5-20 micrometers, the phase distribution of the target material is uniform, the magnetic permeability is larger than 40%, and the heterogeneity of magnetic permeability is smaller than 2%. By means ofthe designed process, the oxygen content, organization structure heterogeneity and magnetic performance of the finished product target material can be effectively controlled, and a raw material guarantee is provided for sputtering high-quality thin films by means of the preparing method.
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Description

technical field

[0001] The invention belongs to the technical field of preparation of special materials, and in particular relates to a preparation method and application of a cobalt-tantalum-zirconium alloy target. Background technique

[0002] Cobalt-based alloy thin film materials have the characteristics of high magnetic permeability, high saturation magnetization, high resistivity, high cut-off frequency, low coercivity, etc., and are ideal raw materials for micro-inductance components and magnetic recording components. Cobalt-tantalum-zirconium alloy is an important soft magnetic material with good magnetization properties, and is one of the important raw materials for magnetic recording materials in the new generation of information technology industry. However, due to its high magnetic permeability, in the process of magnetron sputtering, severe magnetic shielding makes the magnetic field passing through the surface of the target less, making it difficult for magnetr...

Claims

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