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Preparation system and method of electronic-grade carbon tetrafluoride

A carbon tetrafluoride and preparation system technology, applied in chemical instruments and methods, halogenated hydrocarbon preparation, organic chemistry, etc., can solve the problems of low purity of carbon tetrafluoride gas, high process requirements, and unsuitable for large-scale use. , to achieve the effect of less impurities, high product purity, and reduced maintenance rate

Active Publication Date: 2020-04-21
FUJIAN DEER TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This technology has been improved on the basis of the previous technology, and a double vertical reactor is designed. Under the mode of the two-stage reactor, the utilization rate of fluorine gas is improved, but the purity of carbon tetrafluoride gas is still low. Shortcomings
CN 101863734 B "A Purification Method for Carbon Tetrafluoride" discloses a method for purifying carbon tetrafluoride by using refrigeration vacuum, flash evaporation and adsorption, which can increase the purity from 80% to 99.9995%. High requirements, not suitable for large-scale use

Method used

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  • Preparation system and method of electronic-grade carbon tetrafluoride
  • Preparation system and method of electronic-grade carbon tetrafluoride
  • Preparation system and method of electronic-grade carbon tetrafluoride

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preparation example Construction

[0073] The preparation system of electronic grade carbon tetrafluoride provided by the present invention includes a fluorine gas source, a reaction device and a purification system. The fluorine gas source is sealed and connected to the reaction device, and the reaction device is sealed and connected to the purification system.

[0074] The fluorine gas source includes an electrolytic cell, a cryogenic dust collector 1 , a condenser 2 and a fluorine gas buffer tank 3 .

[0075] Among them, the electrolytic cell has an automatic system, and the feeding method is liquid level interlocking automatic feeding.

[0076] Wherein, the bottom end of the condenser is provided with a hydrogen fluoride discharging device.

[0077] The reaction device includes a carbon reactor 4 and a dust removal device 5, wherein the carbon reactor also includes a secondary reactor.

[0078] The purification system includes a washing system, an adsorption system and a rectification system. The washing ...

Embodiment 1

[0080] S1. Preparation of fluorine gas: the electrolytic cell automatically produces fluorine gas. After passing through the low-temperature dust collector and condenser, it reaches the fluorine buffer tank;

[0081] Among them, the temperature of the electrolytic cell is controlled at 80-95°C, the acidity is controlled at 40-42%, and the liquid level is interlocked to automatically add hydrogen fluoride and evenly feed, which greatly reduces the excessive addition of hydrogen fluoride. The gas passes through the cryogenic dust collector 1, and the temperature of the dust collector is controlled at 4°C. After the dust and electrolyte in the gas are removed, it enters the condenser 2, and the temperature of the condenser is controlled at -60°C. There is a hydrogen fluoride discharge device at the bottom, which can realize automatic Unloading, recovering hydrogen fluoride for reuse, greatly reduces the cost, and can increase the purity of fluorine gas to more than 95%. The outl...

Embodiment 2

[0101] S1. Preparation of fluorine gas: the electrolytic cell automatically produces fluorine gas. After passing through the low-temperature dust collector and condenser, it reaches the fluorine buffer tank;

[0102] Among them, the temperature of the electrolytic cell is controlled at 95-100°C, the acidity is controlled at 42%, the liquid level is interlocked to automatically add hydrogen fluoride, and the material is evenly added, which greatly reduces the excessive addition of hydrogen fluoride. The gas passes through the cryogenic dust collector 1, and the temperature of the dust collector is controlled at 3°C. After the dust and electrolyte in the gas are removed, it enters the condenser 2, and the temperature of the condenser is controlled at -80°C. There is a hydrogen fluoride discharge device at the bottom, which can realize automatic Unloading, recovering hydrogen fluoride for reuse, greatly reduces the cost, and can increase the purity of fluorine gas to more than 95...

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Abstract

The invention provides a preparation system of electronic-grade carbon tetrafluoride. The system comprises a fluorine gas source, a reaction device and a purification system, wherein the fluorine gassource is hermetically connected with the reaction device; and the reaction device is hermetically connected with the purification system; the fluorine gas source comprises an electrolytic cell, a low-temperature dust remover 1, a condenser 2 and a fluorine gas buffer tank 3; the electrolytic cell is provided with an automatic system; the feeding mode is liquid level interlocking automatic feeding; a hydrogen fluoride emptying device is arranged at the bottom end of the condenser; the reaction device comprises a carbon reactor and a dust removal device; and the carbon reactor further comprisesa secondary reactor. The invention further provides a preparation method of the electronic-grade carbon tetrafluoride. By using the above system in preparing the carbon tetrafluoride, the fluorine gas utilization rate is 98% or above.

Description

technical field [0001] The invention relates to the technical field of carbon tetrafluoride production, in particular to a preparation system and method for electronic grade carbon tetrafluoride. Background technique [0002] Carbon tetrafluoride (CF 4 ) is currently the most widely used plasma etching gas in the microelectronics industry. It is widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass, and tungsten. It is used for surface cleaning of electronic devices, production of solar cells, There are also numerous applications in laser technology, cryogenic refrigeration, gas insulation, leak detection agents, attitude control of space rockets, detergents in printed circuit production, lubricants, and brake fluids. Due to its strong chemical stability, CF 4 It can also be used in metal smelting and plastic industries, etc. [0003] There are many methods for preparing carbon tetrafluoride, but basical...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C19/08C07C17/007C07C17/38C07C17/383C07C17/389C07C17/395C25B1/24C25B15/00C25B15/02
CPCC07C17/007C07C17/38C07C17/383C07C17/395C07C17/389C25B1/245C25B15/02C25B15/00C07C19/08
Inventor 曾熙陈施华赖金香李嘉磊华小林张朝春黄华华
Owner FUJIAN DEER TECH CORP
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