Molybdenum-aluminum compatible etching solution and etching method

Abstract

The invention discloses a molybdenum-aluminum compatible etching solution. The etching solution is prepared from 60%-68% of phosphoric acid, 2.5%-3% of nitric acid, 19%-25% of acetic acid, 2%-5% of chloric acid, 2%-10% of surfactant, 0.8%-1.2% of metal inhibitors, 2%-5% of auxiliary agent and the balance water; and the metal inhibitor comprises at least one of molybdate, sodium methylbenzotriazoleand dimercaptothiodiazole disodium salt. The invention further discloses an etching method. According to the molybdenum-aluminum compatible etching solution, the chloric acid is added, and the etching rate of the molybdenum aluminum is controlled; and the metal inhibitor is added, the ionization balance of the phosphate ion is controlled, and the etching rate of the metal molybdenum is further reduced. The etching method is simple in process, easy to operate and higher in efficiency.

Description

technical field [0001] The invention relates to the technical field of etching solution, in particular to a molybdenum-aluminum compatible etching solution and an etching method. Background technique [0002] In recent years, the liquid crystal display industry has developed rapidly, and the products tend to be large-scale, high-quality, and high-functional. While people's demand for liquid crystal displays continues to increase, higher requirements are placed on product quality and picture accuracy. [0003] In the field of TFT-LCD or LED panels, the aluminum-molybdenum multilayer structure has gradually become the mainstream technology. The technical difficulty of the aluminum-molybdenum etching solution is that the electrochemical properties of aluminum and molybdenum are greatly different, and the oxidation ability is different, that is, there is a big difference in the etching rate. . In actual production, it is often an etching solution that corresponds to multiple m...

AI Technical Summary

Problems solved by technology

In actual production, one kind of etching solution is often corresponding to multiple metal film layers at the same time. After the etching is completed, the corresponding slope angle may sometimes be abnormal. For example, the etching rate of the upper metal molybdenum is too fast, resulting in macro defects and subsequent processes. It will produce corresponding optical defects or cause residues in the back layer, which will affect product quality

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