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A kind of ultra-slippery metal/hydrogen-containing carbon composite film and preparation method thereof

A carbon thin film and carbon composite technology, which is applied in the field of solid lubrication and tribology, can solve the problems of harsh super-slip conditions, difficult engineering applications, and large environmental dependence, so as to improve the bonding force of the film, increase the service life, and facilitate engineering applications Effect

Active Publication Date: 2021-11-19
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Later, the ultra-smoothness of double-walled carbon nanotubes was discovered ( Nature Nanotechnology, 2013, 8(12):912-916 ), Zheng Quanshui and Wei Fei et al. further researched, using centimeter-scale carbon nanotubes to expand the super-lubricating scale from the micron scale to the centimeter scale ( Nano Lett.20161621367- 1374; Phys. Rev. Lett. 97, 025501 ), but the conditions for achieving super-slip are harsh, and it is still super-slip on the microscopic scale
However, since the preparation of large-area single-crystal graphite on the macro scale cannot be realized, and it is highly dependent on the environment, it is difficult to achieve engineering applications based on graphene and carbon nanotubes.

Method used

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  • A kind of ultra-slippery metal/hydrogen-containing carbon composite film and preparation method thereof
  • A kind of ultra-slippery metal/hydrogen-containing carbon composite film and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0026] (1) Clean the stainless steel substrate with water-based cleaning solution and hydrocarbon cleaning solution in an ultrasonic cleaning tank to remove oil, rust and pollutants, then dry it with nitrogen, and put it into a coating vacuum chamber;

[0027] (2) Pump the vacuum system to 2.0×10 through the mechanical pump, Roots pump and molecular pump in sequence -3 Pa and below, turn on the hollow cathode ion source, adjust the current to 400A, and the bias voltage to 500; pass in argon gas, keep the pressure at 1Pa, and bombard and clean for 200 minutes to further remove the substrate surface pollutants;

[0028] (3) Turn on the magnetron sputtering target (the target is Cr metal), adjust the peak current to 200A, the bias voltage to 300 V, adjust the argon gas to 0.5Pa, and deposit for 20 minutes; feed 15% nitrogen and 35% methane ( Compared with argon), adjust the current to 15A, bias to 300V, adjust the argon to 0.5, deposit for 40 minutes, and obtain a metal carbonitr...

Embodiment 2

[0033] (1) Clean the mold steel substrate with water-based cleaning solution and hydrocarbon cleaning solution in an ultrasonic cleaning tank to remove oil stains, rust spots and pollutants, then dry it with nitrogen, and place it in a coating vacuum chamber;

[0034] (2) Pump the vacuum system to 2.0×10 through the mechanical pump, Roots pump and molecular pump in sequence -3 Pa and below, turn on the hollow cathode ion source, adjust the current to 200A, and the bias voltage to 800V. Introduce argon gas, keep the air pressure at 5Pa, and bombard and clean for 30 minutes to further remove pollutants on the sample or substrate surface;

[0035] (3) Turn on the magnetron sputtering target (the target is Ti), adjust the peak current to 200A, the bias voltage to 300-500V, adjust the argon gas to 1.5Pa, deposit for 40 minutes; feed 10% nitrogen, 25-35% Methane (compared with argon), adjust the current 0.5-15A, bias 300-500V, adjust the argon to 0.5-1.5Pa, deposit for 40-60 minute...

Embodiment 3

[0040] (1) Clean the silicon wafer substrate with water-based cleaning solution and hydrocarbon cleaning solution in an ultrasonic cleaning tank to remove oil, rust and pollutants, then dry it with nitrogen, and put it into a coating vacuum chamber;

[0041] (2) Pump the vacuum system to 2.0×10 through the mechanical pump, Roots pump and molecular pump in sequence -3 Pa and below, turn on the hollow cathode ion source, adjust the current to 300A, and the bias voltage to 600V. Introduce argon gas, keep the air pressure at 3Pa, and bombard and clean for 30 minutes to further remove pollutants on the sample or substrate surface;

[0042] (3) Turn on the magnetron sputtering target (the target is Ti), adjust the peak current to 200A, the bias voltage to 300-400V, adjust the argon gas to 1Pa, and deposit for 30 minutes; Argon gas comparison), adjust the current 6A, bias voltage 500V, adjust the argon gas to 1.5Pa, deposit for 40 minutes, and obtain a metal carbonitride transition ...

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Abstract

The invention relates to a metal / hydrogen-carbon composite film with ultra-slip properties, including a hydrogen-containing carbon film deposited on the surface of a substrate or a component and a metal film (gold, silver, copper, etc.) deposited on the surface of a hydrogen-containing carbon film. Among them, the hydrogen-containing carbon film with a hydrogen content of 15-28% in the carbon film has a thickness of 800nm, and the thickness of the metal film is ≤100nm. In the present invention, the target hydrogen-containing carbon film modulated by plasma chemical vapor deposition, magnetron sputtering, etc., and then loaded with metal by means of high-power micro-pulse magnetron sputtering or evaporation plating, obtains a super-smooth gold / hydrogen-containing carbon composite film . During the friction process, the metal can catalyze the amorphous hydrogen-containing carbon to form an ordered multi-layer graphene structure, and the incommensurate contact of the multi-layer graphene can realize super-slip in the macro-scale atmospheric environment, inert atmosphere and vacuum. , therefore, it is expected to realize the engineering application of superslip technology under cross-environmental conditions.

Description

technical field [0001] The invention relates to the preparation of a hydrogen-containing carbon composite film, in particular to a super-slip performance metal / hydrogen-containing carbon composite film and a preparation method thereof, belonging to the fields of solid lubrication and tribology. Background technique [0002] Friction accompanies the origin of life and the development of human society. In the 21st century, friction and lubrication have become an inseparable part of the development of human civilization and technological progress. About 1 / 3~1 / 2 of the primary energy used in the world is consumed by friction, and 80% of the vulnerable parts of mechanical products are scrapped and replaced due to excessive wear. Wear is not only the loss and failure of materials, but also the waste of energy and the emission of pollutants caused by friction are also very serious problems. It has been reported that 23% of the energy consumed in industrialized countries is due to ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/18C23C14/24C23C14/35C23C16/26C23C16/515C23C28/00
CPCC23C14/0036C23C14/0605C23C14/0664C23C14/18C23C14/185C23C14/221C23C14/24C23C14/3485C23C14/352C23C16/26C23C16/515C23C28/322C23C28/34
Inventor 张斌贾倩张俊彦高凯雄张兴凯
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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